Nanocontact Printing of Aminosilane for Bio-Device Fabrications

Nanocontact printing using hydrogen silsesquioxane (HSQ) soft stamps is studied for nanobio device fabrications in this work. The stamps with designed linewidth 80-200 nm were fabricated by low-dose e-beam lithography on HSQ films. The contact printing technique by using aminosilane as the ink on O2 plasma treated HSQ/Si substrates was developed. The plasma treatment, stamping force and stamping time were manipulated, and afterwards the transferred patterns were examined by the utilization of atomic force microscope and scanning electron microscope. Experimental results demonstrate that the nano-features on the HSQ stamps can be successfully transferred onto the substrates and passed a 3M tape peeling test under specific conditions in the range of 100-200 W O2 plasma treatment for 30 s. Nanolines with printed linewidth 97-205 nm were obtained. The nanopatterning of an antibody affinipure goat anti-mouse IgG(H+L) was also demonstrated onto the transferred aminosilane pattern surfaces for biodevice fabrication.