The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)最新文献

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Nanoscaled biological gated field effect transistors for cytogenetic analysis 用于细胞遗传学分析的纳米生物门控场效应晶体管
Dorota Kwasny, M. Dimaki, K. B. Andersen, A. Zulfiqar, Z. Tümer, W. Svendsen
{"title":"Nanoscaled biological gated field effect transistors for cytogenetic analysis","authors":"Dorota Kwasny, M. Dimaki, K. B. Andersen, A. Zulfiqar, Z. Tümer, W. Svendsen","doi":"10.1109/NEMS.2014.6908775","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908775","url":null,"abstract":"Cytogenetic analysis is the study of chromosome structure and function, and is often used in cancer diagnosis, as many chromosome abnormalities are linked to the onset of cancer. A novel label free detection method for chromosomal translocation analysis using nanoscaled field effect transistors (FET) is presented here. The FET is gated by the hybridization of the target DNA on the semiconducting nanowire. The results show an extreme sensitivity to the hybridization process, so that the hybridization and dehybridisation can be followed in real time. The nanoscaled FET is made of polysilicon using standard UV lithography enabling batch processing of the sensors.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"1 1","pages":"130-134"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91170897","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
A resonant MEMS magnetic field sensor with electromagnetic induction sensing 一种具有电磁感应感应的谐振式MEMS磁场传感器
Dehui Xu, Guoqiang Wu, B. Xiong, Yuelin Wang
{"title":"A resonant MEMS magnetic field sensor with electromagnetic induction sensing","authors":"Dehui Xu, Guoqiang Wu, B. Xiong, Yuelin Wang","doi":"10.1109/NEMS.2014.6908778","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908778","url":null,"abstract":"In this paper, we propose a novel magnetic field sensor, which exploits capacitive driving and electromagnetic induction sensing to detect the external magnetic field. The capacitive driving reduces the power dissipation and the electromagnetic induction sensing makes the output signal with high linearity. The measurement results verify that the sensitivity can be increased by increasing the sensing coil number. However, the sensitivity was found not in linear direct proportion to the sensing coil number. The measured sensitivity (S) for the sensor with double layer coil and that with single layer coil are 3.5 μV/mT and 2.1 μV/mT, respectively.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"65 1","pages":"143-146"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90119928","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Reduction of machining motion error of an aspheric surface coordinate measuring machine by a new error compensation method 一种新的误差补偿方法减小非球面三坐标测量机的加工运动误差
Xiang Wei, Bing Li, Lijiao Jia, Zhuangde Jiang, Lei Chen
{"title":"Reduction of machining motion error of an aspheric surface coordinate measuring machine by a new error compensation method","authors":"Xiang Wei, Bing Li, Lijiao Jia, Zhuangde Jiang, Lei Chen","doi":"10.1109/NEMS.2014.6908767","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908767","url":null,"abstract":"This paper suggests a new method to reduce the machine motion errors of a 2-dimension aspheric surface measuring. Using the laser interferometer to measure the site error of each point instead of the position error, straightness error and yaw and pitch error. Through error compensation of the new method, the simulation results and verification experiments showed that the site errors agree well within less than 5μm in the whole space. The new mathematical model, the calibration method and the data analysis method are described in detail in the paper.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"19 1","pages":"93-96"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87481349","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Printed low temperature metal oxide thin film transistors 印刷低温金属氧化物薄膜晶体管
Zheng Chen, Xinzhou Wu, T. Zhou, Z. Cui
{"title":"Printed low temperature metal oxide thin film transistors","authors":"Zheng Chen, Xinzhou Wu, T. Zhou, Z. Cui","doi":"10.1109/NEMS.2014.6908841","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908841","url":null,"abstract":"Thin film transistors (TFT) were constructed by inkjet printing of indium oxide semiconductor, which were annealed at the temperature of 200-300°C. Good morphology of printed indium oxide films was achieved and the printed thin film transistors exhibited acceptable performances above 250°C of annealing temperature. Furthermore, electron mobility in excess of 0.5cm2/Vs was obtained at processed temperature of 200°C through additional vacuum annealing.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"8 1","pages":"422-425"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90137924","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Development of catalytic etching using dual materials 双材料催化蚀刻技术的发展
Mao-Jung Huang, N. Chu, Chun-Ming Chang, M. Shiao, C. Hsiao
{"title":"Development of catalytic etching using dual materials","authors":"Mao-Jung Huang, N. Chu, Chun-Ming Chang, M. Shiao, C. Hsiao","doi":"10.1109/NEMS.2014.6908872","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908872","url":null,"abstract":"In this study we presents an effective and simple process for forming multi-level vertical structures on a (100) silicon wafer. The dual materials including gold and platinum was employed as catalytic material in the etching process. We employed an etchant solution consisting of 4.6 M hydrofluoric acid, 0.44 M hydrogen peroxide, and isopropyl alcohol to produce microstructures at an etching rate of 0.294 μm/min and 0.648 μm/min during only gold (Au) and platinum (Pt) film, respectively. For the catalytic etching process with 10 nm-thick Au and Pt, the etching rate yield from Au film was increased to that generated from the etching process with single Pt film. In the meantime, the etching structure under Pt film became not obvious in the dual materials etching process. For the sample with 10 nm Au and 11 nm Pt, the significant etching produced on both Au and Pt region.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"24 1","pages":"551-554"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79109212","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Position determination of a ball grid array by automated optical inspection method 用自动光学检测方法确定球栅阵列的位置
Yi-Chuan Lin, Kerwin Wang
{"title":"Position determination of a ball grid array by automated optical inspection method","authors":"Yi-Chuan Lin, Kerwin Wang","doi":"10.1109/NEMS.2014.6908768","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908768","url":null,"abstract":"This paper introduces a novel automated optical inspection (AOI) method to measure the positions and diameters of micro-solder balls of a ball grid array (BGA). The method is focused on the refinement of optical configuration, image acquisition platform design to improve the time efficiency of AOI. We use a white LED ring as a light source. It is combined with the platform. The system can perform multiple image processing and object detection steps to locate the center of each ball. This paper also presents two methods to estimate the diameters of the balls. A dummy BGA, consists of misaligned solder balls, are assembled to a conductive substrate to evaluate the platform. Test result shows that the platform is capable of performing continuous image acquisition of a 15fps, 640 × 480, 8-bite grayscale video.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"1 1","pages":"97-101"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88072820","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Nucleus extraction from cells by optical-induced cell lysis on a continuous flow platform 连续流平台上光诱导细胞裂解提取细胞核
Shi Huang, Lien-Yu Hung, Gwo-Bin Lee
{"title":"Nucleus extraction from cells by optical-induced cell lysis on a continuous flow platform","authors":"Shi Huang, Lien-Yu Hung, Gwo-Bin Lee","doi":"10.1109/NEMS.2014.6908844","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908844","url":null,"abstract":"Nucleus extraction from cells is essential for a variety of biomedical applications. In this study, we have developed a microfluidic platform integrated with optical-induced dielectrophoresis (ODEP) and optical-induced cell lysis (OICL) techniques combined with a hydrodynamic focusing module for continuous single cell membrane lysis and nucleus extraction. This OICL chip was formed with indium-tin-oxide (ITO) glass and a photoconductive (amorphous silicon, a-Si) layer. The light was illuminated on a-Si to induce a non-uniform electric field, which then generated a transmembrane potential across the cell membrane, thus causing the disruption of cell membrane without damaging the nucleus. Therefore, we could use an optical-induced non-uniform electric field to continuously and selectively lyse the cell membrane and then collect the nucleus by using the ODEP force using different light patterns. These techniques may become a promising method for molecular cytogenetic investigations and nucleus transfer.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"34 1","pages":"436-439"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88162255","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
High performance thread-based CE-EC system with variable volume injection capability and 3D detection electrodes 高性能螺纹CE-EC系统,具有可变体积注射能力和3D检测电极
Yuan-Yuan Yang, Yi-Chi Wei, Che-Hsin Lin
{"title":"High performance thread-based CE-EC system with variable volume injection capability and 3D detection electrodes","authors":"Yuan-Yuan Yang, Yi-Chi Wei, Che-Hsin Lin","doi":"10.1109/NEMS.2014.6908857","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908857","url":null,"abstract":"This study develops a high-performance thread-based microfluidic device with variable volume injection capability and 3-dimensional (3D) detection electrodes for capillary electrophoresis electrochemical (CE-EC) detection of biosamples. PMMA substrate with concave 3D electrodes produced with the hot-embossing method is used to enhance the sensing performance of the CEEC system. Results show that the chip with 3D sensing electrodes exhibits around 10-fold current response than that obtained using the chip with conventional 2D sensing electrodes for detecting 6.25 μM K3Fe (CN)6. In addition, the developed thread-based microfluidic system is capable of injecting variable sample volumes into the separation thread simply by winding different turns of the injection thread on the separation thread. The developed concave-shaped three-dimensional electrode provides a simple and low-cost method for thread-based CEEC applications.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"257 1","pages":"494-497"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75638638","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Design and fabrication of micro hot-wire flow sensor using 0.35μm CMOS MEMS technology 基于0.35μm CMOS MEMS技术的微型热线流量传感器的设计与制造
Z. Miao, C. Chao, Y. Chiu, Chia-Wei Lin, Yi-Kuen Lee
{"title":"Design and fabrication of micro hot-wire flow sensor using 0.35μm CMOS MEMS technology","authors":"Z. Miao, C. Chao, Y. Chiu, Chia-Wei Lin, Yi-Kuen Lee","doi":"10.1109/NEMS.2014.6908810","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908810","url":null,"abstract":"MEMS sensors are promising for Energy Efficient Building (EeB) because of the potential low cost and low power consumption. Various flow sensors based on MEMS technology have been fabricated. In this work, we designed and fabricated a polysilicon micro hot-wire flow sensor using a commercial 0.35μm 2P4M CMOS technology followed by post-CMOS processing. A post-CMOS MEMS process for a 1.5mm×1.5mm sensor chip using Deep Reactive Ion Etch (DRIE) and spray coating was utilized to finish the fabrication. The fabricated flow sensor was characterized at different flow rates. The fabricated sensor with a dimension of 300μm×2μm×3.76μm demonstrated a sensitivity of 23.87 mV/(m/s) and power consumption of 0.79 mW at Uin =5m/s. The experiment results were consistent with the theoretical prediction and the best results showed an average error of only 5%.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"52 1","pages":"289-293"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76427431","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Cellular behaviors on chemically/physically modified SiO2 surfaces 化学/物理改性SiO2表面上的细胞行为
Chung-Yao Yang, Amarendra Kumar, J. Yeh, Y. Yang
{"title":"Cellular behaviors on chemically/physically modified SiO2 surfaces","authors":"Chung-Yao Yang, Amarendra Kumar, J. Yeh, Y. Yang","doi":"10.1109/NEMS.2014.6908897","DOIUrl":"https://doi.org/10.1109/NEMS.2014.6908897","url":null,"abstract":"This paper describe an easy-to-handle approach to probe cellular behaviors via using silicon dioxide nanotextures with various functional groups. The silicon dioxide nanotextures were performed through using metal assisted chemical etching and wet oxidation. The pitch of nanotextures can be adjusted by controlling etching durations. The results showed that cells preferred to spread out on nanotextures with longer pitch rather than on nanotextures with shorter pitch. In addition, cells also preferred to adhere on planar surface rather than on nanotextured surface. We believe, this study can help us to get more insights of cell biology and biomedical-relevant researches.","PeriodicalId":22566,"journal":{"name":"The 9th IEEE International Conference on Nano/Micro Engineered and Molecular Systems (NEMS)","volume":"29 1","pages":"655-659"},"PeriodicalIF":0.0,"publicationDate":"2014-04-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78947490","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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