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Proceeding of Progress in Plasma Processing of Materials, 2001最新文献

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PLASMA METALLURGY - STATES OF THE ART, PROBLEMS AND FUTURE 等离子冶金技术的现状、问题和未来
Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/HIGHTEMPMATPROC.V5.I1.10
M. Mihovsky
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引用次数: 2
CONTINUOUS EMISSION MONITORING OF METALS IN FLUE GASES BY ICP-OES: EFFECT OF GASEOUS MATRIX AND OPERATING CONDITIONS ON THE SPECTRAL INTERFERENCES 用icp-oes连续监测烟气中金属的排放:气体基质和操作条件对光谱干扰的影响
Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.70
S. Hassaine, C. Trassy
{"title":"CONTINUOUS EMISSION MONITORING OF METALS IN FLUE GASES BY ICP-OES: EFFECT OF GASEOUS MATRIX AND OPERATING CONDITIONS ON THE SPECTRAL INTERFERENCES","authors":"S. Hassaine, C. Trassy","doi":"10.1615/itppc-2000.70","DOIUrl":"https://doi.org/10.1615/itppc-2000.70","url":null,"abstract":"","PeriodicalId":220021,"journal":{"name":"Proceeding of Progress in Plasma Processing of Materials, 2001","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130773303","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
DIGITAL SYSTEM BASED ON CCD CAMERA FOR PARTICLES VELOCITY AND TEMPERATURE MONITORING IN THERMAL SPRAYING 基于CCD相机的热喷涂颗粒速度和温度监测数字系统
Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.170
M. Ignatiev, I. Smurov, V. Senchenko
{"title":"DIGITAL SYSTEM BASED ON CCD CAMERA FOR PARTICLES VELOCITY AND TEMPERATURE MONITORING IN THERMAL SPRAYING","authors":"M. Ignatiev, I. Smurov, V. Senchenko","doi":"10.1615/itppc-2000.170","DOIUrl":"https://doi.org/10.1615/itppc-2000.170","url":null,"abstract":"","PeriodicalId":220021,"journal":{"name":"Proceeding of Progress in Plasma Processing of Materials, 2001","volume":"226 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131663553","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
NUMERICAL MODELING OF RF-RF HYBRID PLASMA TORCHES AND PARAMETRIC STUDY FOR VARIOUS GEOMETRIC, FLOW AND ELECTRIC CONFIGURATIONS rf-rf混合等离子体炬的数值模拟及各种几何、流动和电结构的参数化研究
Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.440
D. Bernardi, V. Colombo, G. Coppa, E. Ghedini, A. Mentrelli
{"title":"NUMERICAL MODELING OF RF-RF HYBRID PLASMA TORCHES AND PARAMETRIC STUDY FOR VARIOUS GEOMETRIC, FLOW AND ELECTRIC CONFIGURATIONS","authors":"D. Bernardi, V. Colombo, G. Coppa, E. Ghedini, A. Mentrelli","doi":"10.1615/itppc-2000.440","DOIUrl":"https://doi.org/10.1615/itppc-2000.440","url":null,"abstract":"","PeriodicalId":220021,"journal":{"name":"Proceeding of Progress in Plasma Processing of Materials, 2001","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129624721","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
EQUILIBRIUM AND NON-EQUILIBRIUM PHENOMENA IN ARCS AND TORCHES 电弧和火炬中的平衡和非平衡现象
Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/hightempmatproc.v4.i4.60
J. van der Mullen
{"title":"EQUILIBRIUM AND NON-EQUILIBRIUM PHENOMENA IN ARCS AND TORCHES","authors":"J. van der Mullen","doi":"10.1615/hightempmatproc.v4.i4.60","DOIUrl":"https://doi.org/10.1615/hightempmatproc.v4.i4.60","url":null,"abstract":"","PeriodicalId":220021,"journal":{"name":"Proceeding of Progress in Plasma Processing of Materials, 2001","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123179487","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
MAIN GUIDELINES FOR PRODUCING HIGH NITROGEN STEELS USING THERMAL PLASMA 热等离子体生产高氮钢的主要指南
Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.940
J. Siwka
{"title":"MAIN GUIDELINES FOR PRODUCING HIGH NITROGEN STEELS USING THERMAL PLASMA","authors":"J. Siwka","doi":"10.1615/itppc-2000.940","DOIUrl":"https://doi.org/10.1615/itppc-2000.940","url":null,"abstract":"","PeriodicalId":220021,"journal":{"name":"Proceeding of Progress in Plasma Processing of Materials, 2001","volume":"46 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121564767","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
STUDY OF FLOW FIELD TOPOLOGY IN AN ICP TORCH BY SURFACE PRESSURE MEASUREMENTS AND NUMERICAL CALCULATIONS 用表面压力测量和数值计算研究icp炬的流场拓扑结构
Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.330
O. Chazot
{"title":"STUDY OF FLOW FIELD TOPOLOGY IN AN ICP TORCH BY SURFACE PRESSURE MEASUREMENTS AND NUMERICAL CALCULATIONS","authors":"O. Chazot","doi":"10.1615/itppc-2000.330","DOIUrl":"https://doi.org/10.1615/itppc-2000.330","url":null,"abstract":"","PeriodicalId":220021,"journal":{"name":"Proceeding of Progress in Plasma Processing of Materials, 2001","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122978478","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
INDUSTRIAL APPLICATIONS WITH THE ATMOSPHERE AND TEMPERATURE CONTROLLED PLASMA SPRAYING PROCESS 工业应用具有气氛和温度控制的等离子喷涂工艺
Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/HIGHTEMPMATPROC.V5.I1.40
E. Meillot, L. Bianchi, E. Roussel, A. Freslon
{"title":"INDUSTRIAL APPLICATIONS WITH THE ATMOSPHERE AND TEMPERATURE CONTROLLED PLASMA SPRAYING PROCESS","authors":"E. Meillot, L. Bianchi, E. Roussel, A. Freslon","doi":"10.1615/HIGHTEMPMATPROC.V5.I1.40","DOIUrl":"https://doi.org/10.1615/HIGHTEMPMATPROC.V5.I1.40","url":null,"abstract":"","PeriodicalId":220021,"journal":{"name":"Proceeding of Progress in Plasma Processing of Materials, 2001","volume":"67 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115307227","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
STUDY OF VARIOUS PARAMETERS INFLUENCING THE TREATMENT OF SILICON PARTICLES IN A R.F. PLASMA FLOW 影响射频等离子体流中硅颗粒处理的各种参数的研究
Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.480
F. Bourg, F. Krayem, E. Francke, S. V. Dresvin, D. Morvan, J. Amouroux
{"title":"STUDY OF VARIOUS PARAMETERS INFLUENCING THE TREATMENT OF SILICON PARTICLES IN A R.F. PLASMA FLOW","authors":"F. Bourg, F. Krayem, E. Francke, S. V. Dresvin, D. Morvan, J. Amouroux","doi":"10.1615/itppc-2000.480","DOIUrl":"https://doi.org/10.1615/itppc-2000.480","url":null,"abstract":"","PeriodicalId":220021,"journal":{"name":"Proceeding of Progress in Plasma Processing of Materials, 2001","volume":"27 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121053549","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
OPTICAL DIAGNOSTIC TECHNIQUES FOR A THERMAL RF DISCHARGE USED FOR PLASMA FLASH EVAPORATION 用于等离子体闪光蒸发的热射频放电的光学诊断技术
Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.90
P. Buchner, H. Schubert, J. Uhlenbusch, M. Weiss
{"title":"OPTICAL DIAGNOSTIC TECHNIQUES FOR A THERMAL RF DISCHARGE USED FOR PLASMA FLASH EVAPORATION","authors":"P. Buchner, H. Schubert, J. Uhlenbusch, M. Weiss","doi":"10.1615/itppc-2000.90","DOIUrl":"https://doi.org/10.1615/itppc-2000.90","url":null,"abstract":"","PeriodicalId":220021,"journal":{"name":"Proceeding of Progress in Plasma Processing of Materials, 2001","volume":"738 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123856458","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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