用icp-oes连续监测烟气中金属的排放:气体基质和操作条件对光谱干扰的影响

{"title":"用icp-oes连续监测烟气中金属的排放:气体基质和操作条件对光谱干扰的影响","authors":"S. Hassaine, C. Trassy","doi":"10.1615/itppc-2000.70","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":220021,"journal":{"name":"Proceeding of Progress in Plasma Processing of Materials, 2001","volume":"6 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"CONTINUOUS EMISSION MONITORING OF METALS IN FLUE GASES BY ICP-OES: EFFECT OF GASEOUS MATRIX AND OPERATING CONDITIONS ON THE SPECTRAL INTERFERENCES\",\"authors\":\"S. Hassaine, C. Trassy\",\"doi\":\"10.1615/itppc-2000.70\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":220021,\"journal\":{\"name\":\"Proceeding of Progress in Plasma Processing of Materials, 2001\",\"volume\":\"6 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"1900-01-01\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Proceeding of Progress in Plasma Processing of Materials, 2001\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1615/itppc-2000.70\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Proceeding of Progress in Plasma Processing of Materials, 2001","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1615/itppc-2000.70","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}