Proceeding of Progress in Plasma Processing of Materials, 2001最新文献_第3页

ITEMIZED DETERMINATION OF THE CHEMICAL BALANCE IN A PLASMA REACTOR 等离子体反应器中化学平衡的逐项测定

Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.1030

M. Gonnord, F. Genêt, K. Coulibaly, S. Robert, J. Amouroux

引用次数: 0

INVESTIGATION ON OPERATING CONDITIONS AND EFFICIENCY OPTIMIZATION OF RF-RF HYBRID PLASMA TORCHES rf-rf混合等离子体炬工作条件及效率优化研究

Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.470

D. Bernardi, V. Colombo, G. Coppa, E. Ghedini, A. Mentrelli

引用次数: 1

A new low pressure plasma nitriding and PVD coating duplex treatment of HSS substrates 一种新型低压等离子体渗氮和PVD涂层复合处理高速钢基体

Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.740

G. Nayal, A. Ehiasarian, K. Macak, R. New, W. Münz, I. J. Smith

{"title":"A new low pressure plasma nitriding and PVD coating duplex treatment of HSS substrates","authors":"G. Nayal, A. Ehiasarian, K. Macak, R. New, W. Münz, I. J. Smith","doi":"10.1615/itppc-2000.740","DOIUrl":"https://doi.org/10.1615/itppc-2000.740","url":null,"abstract":"In situ duplex plasma nitriding and PVD coating was performed using the combined steered arc unbalanced magnetron production scale unit (Hauzer HTC 1000/ABS). The processing procedure customary used was modified and further steps relating to the new plasma nitriding were added. In particular the total pressure during nitriding was reduced from 2-5 mbar, which is typical for pulse plasma nitriding process, to 5-10x10(-3) mbar. To enhance ionisation to a sufficiently high level the available four magnetrons were ignited at a low power level (0.5 W/cm(2)). Furthermore, electromagnetic coils were used to generate a closed magnetic field situation, thus, reducing the loss of electrons to the chamber walls. Using the duplex plasma nitriding (treatment time 30min.) and PVD treatment, 3 microns thick TiAlCrYN coatings were deposited onto flat HSS coupons. Scratch test results showed a substantial enhancement of the critical load (L-C > 80 N) compared to un-nitrided coated samples (Lc similar to 50 N). It is important to note that these high adhesion values have been obtained only when the thin build-up in carbon near the surface, which was generated during the plasma nitriding step, was etched away by metal ion etching with Cr+ directly prior to coating.","PeriodicalId":220021,"journal":{"name":"Proceeding of Progress in Plasma Processing of Materials, 2001","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123551076","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

NUMERICAL CALCULATION OF LAMINAR FLOWS IN PLASMATRONS 等离子体中层流的数值计算

Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.400

O. Sinkevich, S. Chikunov, V. V. Glazkov, É. Isakaev, A. G. Khachaturova

引用次数: 0

RADIATIVE TRANSFER IN LTE N2-O2 PLASMA FROM 300K TO 20000K lte n2-o2等离子体从300k到20000k的辐射传输

Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.590

S. Chauveau, P. Riviere, Christine Deron, A. Soufiani, M. Perrin

引用次数: 0

MODELING OF THE PLASMA SPRAY PROCESS: FROM POWDER INJECTION TO COATING FORMATION 等离子喷涂过程的建模:从粉末喷射到涂层形成

Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/HIGHTEMPMATPROC.V5.I1.50

G. Mariaux, P. Fauchais, A. Vardelle, B. Pateyron

引用次数: 17

THE CONTROL OF RAILWAY WHEEL MATERIAL PROPERTIES USING NITROGEN PLASMATRON 氮等离子体对铁路车轮材料性能的控制

Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.960

S.V. Antipovsky, M. V. Illichev, É. Isakaev, P. Ivanov, A. Tyuftyaev, V.M. Amelin, A. Troitsky, A. Yablonsky, G. A. Filippov

引用次数: 0

SYNTHESIS OF THIN FILMS WITH CONTROLLED ABSORPTION BY JET INDUCTIVE COUPLED RF PLASMA TORCH 用射流感应耦合射频等离子体炬合成可控吸收薄膜

Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.720

I. A. Abdullin, R. T. Galiaoutdinov, N. Kashapov

引用次数: 0

A Thermal Analysis of Surface Quality Obtained With Plasma Arc Cutting 等离子弧切割表面质量的热分析

Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.880

H. Valetoux, M. El Ganaoui, J. Coudert, P. Fauchais

引用次数: 0

INVESTIGATION OF PROPAGATION OF PERTURBATIONS IN THERMAL DC ARC PLASMA JET 热直流电弧等离子体射流中微扰的传播研究

Proceeding of Progress in Plasma Processing of Materials, 2001 Pub Date : 1900-01-01 DOI: 10.1615/itppc-2000.300

M. Hrabovsky, V. Kopecký, P. Macura

引用次数: 0