{"title":"Directly light-fired thyristors with high di/dt capability","authors":"V. Temple","doi":"10.1109/IEDM.1977.189148","DOIUrl":"https://doi.org/10.1109/IEDM.1977.189148","url":null,"abstract":"A 1200V 100A directly light triggered thyristor suitable for invertor application has been developed. A new amplifying gate design with a second amplifying stage was used in achieving a factor of 50 increase in gate sensitivity without any loss in dV/dt capability and only a small (less than a factor of two) reduction in device di/dt rating, despite a ten times smaller initial turn-on line length. In all, three versions were made with gate threshold currents down to 2ma and dV/dt capabilities to 1000V/µ second. All three types had 60Hz di/dt capabilities of about 250A/µsecond at 125° TJand turn-off times of approximately 25µ seconds. The new light sensitive amplifying gate stage design features a gate thyristor region with extending arms for high gate sensitivity, the inner portion of which is only large enough to accomodate initial on-region spreading during the short on time of the gate stage. The arms increase gate sensitivity while contributing very little to the overall dV/dt current. The turn-on speed can be accounted for by most of the inner region being turned on by the photo-gate pulse. Like regular electrically fired thyristors, a gate over-drive factor is important. With these devices an over-drive factor of about 10 is needed for high di/dt turn-on.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"22 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117234772","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"The thin film polycrystalline solar cell program in the U.S.A.","authors":"D. Feucht","doi":"10.1109/IEDM.1977.189208","DOIUrl":"https://doi.org/10.1109/IEDM.1977.189208","url":null,"abstract":"The objective of the thin film polycrystalline solar cell work in the U.S.A. is to develop thin film materials which have potential for achieving thin film array efficiencies of greater than 10% at a price of $100-300/kWe. A variety of thin film materials and technologies are presently being researched to determine their potential for solar cell conversion and low cost fabrication. The materials being investigated include CdS, GaAs, Si, amorphous Si, InP, CdTe, Zn3P2, ZnSiAs, and Cu2O. Homojunction, heterojunction, Schottky barrier and conductive oxides are being studied as collection barriers for efficient solar cell conversion. The variety of solar cell research areas will be reviewed describing the technologies being pursued, the results obtained, and the important problems or issues to be resolved.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"194 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115517361","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Computer aided design of TWTs","authors":"W. Harman","doi":"10.1109/IEDM.1977.189281","DOIUrl":"https://doi.org/10.1109/IEDM.1977.189281","url":null,"abstract":"This paper will discuss some of the broader aspects of the use of computers in the design of modern traveling wave tubes. It will touch upon the philosophy of using computers as an aid to design, point out the extent to which computers are currently being used, and will present some examples of the kinds of design information that can be generated.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"61 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115274435","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Low temperature threshold behavior of depletion mode devices—Characterization and simulation","authors":"F. Gaensslen, R. Jaeger, J.J. Walker","doi":"10.1109/IEDM.1977.189307","DOIUrl":"https://doi.org/10.1109/IEDM.1977.189307","url":null,"abstract":"INTRODUCTION The changes in threshold voltage characteristics observed between room and liquid nitrogen temperature for depletion and enhancement mode MOS devices are fundamentally different. As described elsewhere (I), the enhancement mode threshold voltage is not affected by carrier freezeout; it shows only an increase in magnitude due to temperature dependent parameter changes combined with an essentially unaltered substrate sensitivity. Actual measurements of depletion mode devices, however, show a significantly different temperature dependency. With decreasing temperature, the negative threshold voltage shift, usually achieved by a shallow donor implantation within an n-channel technology, is reduced as is the substrate sensitivity. Both changes can be accounted for by freezeout within the shallow, compensated, n-type surface layer.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130778596","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"An optically triggered double heterostructure linear bilateral phototransistor","authors":"S. Knight, L. Dawson, V. Keramidas, M. Spencer","doi":"10.1109/IEDM.1977.189292","DOIUrl":"https://doi.org/10.1109/IEDM.1977.189292","url":null,"abstract":"We describe a double heterostructure phototransistor. Such a device potentially offers the important properties of high blocking voltage for both polarities of applied bias, high gain for both polarities of applied bias, and linear current-voltage characteristic through the zero bias point. Thus this device has many of the valuable properties of a normally OFF metallic switch. Experiments with n-Ga1-xAlxAs, p-Ga, n-Ga1-xAlxAs structures demonstrated bilateral gain of 180 and a blocking voltage of ±10 volts in one wafer with a 2.1 µm thick GaAs base, and bilateral gain greater than 3000 with blocking voltage of ±2.6 volts in a wafer with 0.3 µm thick GaAs base.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"58 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126541432","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Nara, T. Ishii, H. Ikegawa, S. Mitsui, K. Shirahata
{"title":"High performance Ni-Pd/GaAs Schottky barrier mixer diodes made by electroplating","authors":"A. Nara, T. Ishii, H. Ikegawa, S. Mitsui, K. Shirahata","doi":"10.1109/IEDM.1977.189260","DOIUrl":"https://doi.org/10.1109/IEDM.1977.189260","url":null,"abstract":"Electroplating Ni-Pd binary alloy on GaAs, high cutoff and high reliability Schottky barrier mixer diodes for SHF reciever systems have been developed. This electroplating technique enables to form Schottky barrier without stray capacitance due to overlay and without increase of series resistance due to oxidation and contamination of the GaAs surface and thereby to realize high cutoff frequency more than 2000 GHz (DC). The Ni-Pd/GaAs Schottky barrier is also very stable. For instance MITF of 7.5 × 107hours has been deduced at 60°C, which is three orders of magnitude longer than the conventional Ni/GaAs Schottky barrier's. Using this mixer diode in a SHF downconverter, conversion loss as low as 2.9 dB and system noise figure as low as 4.3 dB have been obtained with a 200 MHz width at 12 GHz.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122904016","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
W. Holton, W. C. Scott, W.G. Manns, D. F. Weirauch, M. Namordi, F. Doerbeck, R. Pitts, K.H. Surtani, R. Gooch, J. E. Gunther
{"title":"Design, fabrication, and performance of a flat tube display","authors":"W. Holton, W. C. Scott, W.G. Manns, D. F. Weirauch, M. Namordi, F. Doerbeck, R. Pitts, K.H. Surtani, R. Gooch, J. E. Gunther","doi":"10.1109/IEDM.1977.189167","DOIUrl":"https://doi.org/10.1109/IEDM.1977.189167","url":null,"abstract":"A thin profile (two-inch depth) digitally addressed cathodoluminescent display has been developed which is capable of presenting 1920 alphanumeric 5 × 9 dot matrix characters at a spot brightness of 500 ft-L. Multilevel addressing techniques permit greatly reduced pinout (108 addressing levels for the A/N display versus 590 levels on equivalent plasma matrix display). Gray scale is achievable by pulse width modulation, and color is achievable by using a patterned phosphor faceplate.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114488514","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
S. Ohba, M. Aoki, M. Nakai, K. Uchiumi, N. Tsunefuka, M. Kubo, M. Fujita
{"title":"A 1024 element linear CCD sensor with a new photodiode structure","authors":"S. Ohba, M. Aoki, M. Nakai, K. Uchiumi, N. Tsunefuka, M. Kubo, M. Fujita","doi":"10.1109/IEDM.1977.189313","DOIUrl":"https://doi.org/10.1109/IEDM.1977.189313","url":null,"abstract":"Recently, interest in silicon sensors has been increasing for facsimile reader, optical character recognition and other page scanning applications, because of its reliability and low cost. There are two types of Si imaging sensors, an MOS sensor( 1,2) and a CCD sensor(3,4). The linear MOS sensor consists of MOS shift registers and a p-n junction diode array. This type of device offers advantages of low dark current and high blue sensitivity. However, it continues to suffer from signal non-uniformity caused by threshold voltage variations in shift registers. On the other hand, the CCD linear sensor features large output signals and high packing density. However, this device has not been put into practical use because of signal non-uniformity induced by variations in poly-Si photo gate thickness. A novel 1024 element linear CCD sensor, w7131, has been developed. This provides a new photodiode structure, which combines the advantages of the CCD sensor and the MOS sensor, and eliminates the nonuniformity of the earlier devices.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116077215","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Absolute parameter measurements using the self-detection mode of Gunn oscillators","authors":"M. Lakshminarayana, L. Partain","doi":"10.1109/IEDM.1977.189174","DOIUrl":"https://doi.org/10.1109/IEDM.1977.189174","url":null,"abstract":"A first order theoretical model for the load detection mechanism of Gunn Oscillators has been developed that predicts the load variation induced shift in dc current-voltage characteristics, agreeing with the experimental results for dielectric samples. The possibility of accurate measurements of physical properties of materials has been demonstrated by the experimental technique and the theoretical model.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123893118","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"A K-band GaAs FET with 2.5 dB noise figure at 18 GHz","authors":"W. Hooper, J.R. Anderson, H. Cooke, M. Omori","doi":"10.1109/IEDM.1977.189333","DOIUrl":"https://doi.org/10.1109/IEDM.1977.189333","url":null,"abstract":"Low Noise GaAs FETs were fabricated on an active layer produced by implantation into a semi-insulating substrate. Silicon was implanted at relatively low energy to give a very shallow, steep profile. The extremely low noise figure was achieved as a result of the high mobility near pinchoff and fabrication optimization. With the high mobility at the interface, transconductance remains high down to Idsless than 10% of Idss. Two half micron gate length geometries were used with gate widths of 150 and 300 microns. The best noise figure obtained from the 150 micron gate device to date is 2.75 dB. The 2.5 dB noise figure with associated gain of 7 dB at 18 GHz was obtained from the 300 micron gate device. The device characterization and optimization will be discussed.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121873177","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}