{"title":"An optically triggered double heterostructure linear bilateral phototransistor","authors":"S. Knight, L. Dawson, V. Keramidas, M. Spencer","doi":"10.1109/IEDM.1977.189292","DOIUrl":null,"url":null,"abstract":"We describe a double heterostructure phototransistor. Such a device potentially offers the important properties of high blocking voltage for both polarities of applied bias, high gain for both polarities of applied bias, and linear current-voltage characteristic through the zero bias point. Thus this device has many of the valuable properties of a normally OFF metallic switch. Experiments with n-Ga1-xAlxAs, p-Ga, n-Ga1-xAlxAs structures demonstrated bilateral gain of 180 and a blocking voltage of ±10 volts in one wafer with a 2.1 µm thick GaAs base, and bilateral gain greater than 3000 with blocking voltage of ±2.6 volts in a wafer with 0.3 µm thick GaAs base.","PeriodicalId":218912,"journal":{"name":"1977 International Electron Devices Meeting","volume":"58 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"1977 International Electron Devices Meeting","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1109/IEDM.1977.189292","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}
引用次数: 0
Abstract
We describe a double heterostructure phototransistor. Such a device potentially offers the important properties of high blocking voltage for both polarities of applied bias, high gain for both polarities of applied bias, and linear current-voltage characteristic through the zero bias point. Thus this device has many of the valuable properties of a normally OFF metallic switch. Experiments with n-Ga1-xAlxAs, p-Ga, n-Ga1-xAlxAs structures demonstrated bilateral gain of 180 and a blocking voltage of ±10 volts in one wafer with a 2.1 µm thick GaAs base, and bilateral gain greater than 3000 with blocking voltage of ±2.6 volts in a wafer with 0.3 µm thick GaAs base.