SPIE Optical Systems Design最新文献

Simulation of laser radar tooling ball measurements: focus dependence 激光雷达工装球测量的仿真:焦点依赖性

SPIE Optical Systems Design Pub Date : 2015-10-15 DOI: 10.1117/12.2191766

Daniel G. Smith, A. Slotwinski, Thomas W. Hedges

引用次数: 0

Fluorescence and multilayer structure of the scorpion cuticle 蝎子角质层的荧光和多层结构

SPIE Optical Systems Design Pub Date : 2015-10-07 DOI: 10.1117/12.2191224

Yu‐Jen Chen, Pei-Ju Chiu, Cheng-chung Lee

引用次数: 2

Performance of silicon immersed gratings: measurement, analysis, and modeling 硅浸没光栅的性能:测量、分析和建模

SPIE Optical Systems Design Pub Date : 2015-10-07 DOI: 10.1117/12.2191266

M. Rodenhuis, P. Tol, T. Coppens, P. Laubert, A. V. van Amerongen

{"title":"Performance of silicon immersed gratings: measurement, analysis, and modeling","authors":"M. Rodenhuis, P. Tol, T. Coppens, P. Laubert, A. V. van Amerongen","doi":"10.1117/12.2191266","DOIUrl":"https://doi.org/10.1117/12.2191266","url":null,"abstract":"The use of Immersed Gratings offers advantages for both space- and ground-based spectrographs. As diffraction takes place inside the high-index medium, the optical path difference and angular dispersion are boosted proportionally, thereby allowing a smaller grating area and a smaller spectrometer size. Short-wave infrared (SWIR) spectroscopy is used in space-based monitoring of greenhouse and pollution gases in the Earth atmosphere. On the extremely large telescopes currently under development, mid-infrared high-resolution spectrographs will, among other things, be used to characterize exo-planet atmospheres. At infrared wavelengths, Silicon is transparent. This means that production methods used in the semiconductor industry can be applied to the fabrication of immersed gratings. Using such methods, we have designed and built immersed gratings for both space- and ground-based instruments, examples being the TROPOMI instrument for the European Space Agency Sentinel-5 precursor mission, Sentinel-5 (ESA) and the METIS (Mid-infrared E-ELT Imager and Spectrograph) instrument for the European Extremely Large Telescope. Three key parameters govern the performance of such gratings: The efficiency, the level of scattered light and the wavefront error induced. In this paper we describe how we can optimize these parameters during the design and manufacturing phase. We focus on the tools and methods used to measure the actual performance realized and present the results. In this paper, the bread-board model (BBM) immersed grating developed for the SWIR-1 channel of Sentinel-5 is used to illustrate this process. Stringent requirements were specified for this grating for the three performance criteria. We will show that –with some margin– the performance requirements have all been met.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"109 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117190035","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 10

High reflecting dielectric mirror coatings deposited with plasma assisted reactive magnetron sputtering 等离子体辅助反应磁控溅射制备高反射介质反射镜涂层

SPIE Optical Systems Design Pub Date : 2015-10-07 DOI: 10.1117/12.2191350

H. Hagedorn, J. Pistner

{"title":"High reflecting dielectric mirror coatings deposited with plasma assisted reactive magnetron sputtering","authors":"H. Hagedorn, J. Pistner","doi":"10.1117/12.2191350","DOIUrl":"https://doi.org/10.1117/12.2191350","url":null,"abstract":"Manufacturing all dielectric mirror coating with reflectivity values of more than 99.99 % is still a challenge to achieve. Losses caused either be transmittance, absorption or scattering have to be maintained well below 100ppm. Increasing the layer number for minimizing the transmittance losses usually increases the scattering by the growth of the roughness. High energy processes are required to minimize or avoid this behavior, but which are a challenge for avoiding unwanted contamination and interface absorption due to unwanted sputtering. As high energy process we used for the preparation of high reflecting dielectric mirrors plasma assisted reactive magnetron sputtering with a Helios 800 system. The machine was equipped with 3 cathode position for low and high index materials. We used metallic tantalum and hafnium targets for the preparation of the high index, silicon and silica targets for the low index. Metallic targets were powered with mid frequency, whereas the quartz target was sputtered by RF. As substrate we used either super polished fused silica or standard silicon wafer. The optical properties of the substrates we characterized by CRD, Laser calorimetry and spectrophotometric measurements. All combination allowed us to reach reflectivity values above 99.99%, with total deficit levels as low as 36ppm.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123631768","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Multispectral thin film coating on infrared detector 红外探测器上的多光谱薄膜涂层

SPIE Optical Systems Design Pub Date : 2015-10-06 DOI: 10.1117/12.2190981

Meihdi Oussalah, F. Pradal, B. Portier, D. Mouricaud, H. Sik, J. Fleury, P. Laprat

引用次数: 3

Conversion of radius of curvature to power (and vice versa) 曲率半径到功率的转换(反之亦然)

SPIE Optical Systems Design Pub Date : 2015-10-05 DOI: 10.1117/12.2191400

S. Wickenhagen, K. Endo, U. Fuchs, R. Youngworth, S. Kiontke

{"title":"Conversion of radius of curvature to power (and vice versa)","authors":"S. Wickenhagen, K. Endo, U. Fuchs, R. Youngworth, S. Kiontke","doi":"10.1117/12.2191400","DOIUrl":"https://doi.org/10.1117/12.2191400","url":null,"abstract":"Manufacturing optical components relies on good measurements and specifications. One of the most precise measurements routinely required is the form accuracy. In practice, form deviation from the ideal surface is effectively low frequency errors, where the form error most often accounts for no more than a few undulations across a surface. These types of errors are measured in a variety of ways including interferometry and tactile methods like profilometry, with the latter often being employed for aspheres and general surface shapes such as freeforms. This paper provides a basis for a correct description of power and radius of curvature tolerances, including best practices and calculating the power value with respect to the radius deviation (and vice versa) of the surface form. A consistent definition of the sagitta is presented, along with different cases in manufacturing that are of interest to fabricators and designers. The results make clear how the definitions and results should be documented, for all measurement setups. Relationships between power and radius of curvature are shown that allow specifying the preferred metric based on final accuracy and measurement method. Results shown include all necessary equations for conversion to give optical designers and manufacturers a consistent and robust basis for decision-making. The paper also gives guidance on preferred methods for different scenarios for surface types, accuracy required, and metrology methods employed.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116741239","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Process control in optical fabrication 光学制造过程控制

SPIE Optical Systems Design Pub Date : 2015-10-05 DOI: 10.1117/12.2191881

O. Faehnle

引用次数: 0

Metamaterials and optical filtering functions: a review 超材料与光学滤波功能综述

SPIE Optical Systems Design Pub Date : 2015-10-02 DOI: 10.1117/12.2192073

M. Lequime, C. Amra

引用次数: 0

Comparison of modelling techniques for multimode fibers and its application to VCSEL source coupling 多模光纤建模技术的比较及其在VCSEL源耦合中的应用

SPIE Optical Systems Design Pub Date : 2015-10-02 DOI: 10.1117/12.2192425

Huiying Zhong, Site Zhang, Rui Shi, C. Hellmann, F. Wyrowski