SPIE Optical Systems Design最新文献_第2页

Tunable structural color inspired by Papilio blumei butterfly 可调结构颜色的灵感来自凤蝶蓝蝴蝶

SPIE Optical Systems Design Pub Date : 2015-10-02 DOI: 10.1117/12.2190756

Cheng-chung Lee, Mei-ling Lo

引用次数: 0

Advanced femtosecond laser coatings raise damage thresholds 先进的飞秒激光涂层提高了损伤阈值

SPIE Optical Systems Design Pub Date : 2015-10-02 DOI: 10.1117/12.2191225

H. Becker, D. Tonova, M. Sundermann, L. Jensen, M. Gyamfi, D. Ristau, M. Mende

{"title":"Advanced femtosecond laser coatings raise damage thresholds","authors":"H. Becker, D. Tonova, M. Sundermann, L. Jensen, M. Gyamfi, D. Ristau, M. Mende","doi":"10.1117/12.2191225","DOIUrl":"https://doi.org/10.1117/12.2191225","url":null,"abstract":"Advanced optical thin film design is the key to increase laser durability significantly: either by optimizing the electric field distribution within the coating, or by multi-index or rugate designs. Both ways may be even combined. The electric field distribution within a thin film stack was optimized to avoid peak intensities in critical layers using refractive index engineering and/or layer thickness grading. Femtosecond laser mirrors and dichroics for 780 nm and 390 nm were designed, realized and characterized. Here we present LIDT measurements of electric field optimized mirrors and dichroics, which are almost a factor of three higher compared to standard coating designs. At 780 nm a LIDT of 1.49 J/cm2 has been achieved and at 390 nm 0.58 J/cm2. With the exception of Al2O3, all investigated coating materials show a proportional dependence of the LIDT with electric field maximum, as expected by theory. For Al2O3 based systems the electrical field penetrates deep into the layer stack, a high number of interfaces are involved and interface effects probably limit the achievable LIDT. A similar effect was observed for rugate designs. To exclude such interface effects from the LIDT measurement, a special AR design was developed, which is practically equal for all high index materials. Here a LIDT above substrate damage threshold of 1.7 J/cm2 was achieved.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127119683","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 3

Large-scale analytical Fourier transform of photomask layouts using graphics processing units 使用图形处理单元的光掩模布局的大规模解析傅立叶变换

SPIE Optical Systems Design Pub Date : 2015-10-02 DOI: 10.1117/12.2192040

J. A. Sakamoto

{"title":"Large-scale analytical Fourier transform of photomask layouts using graphics processing units","authors":"J. A. Sakamoto","doi":"10.1117/12.2192040","DOIUrl":"https://doi.org/10.1117/12.2192040","url":null,"abstract":"Compensation of lens-heating effects during the exposure scan in an optical lithographic system requires knowledge of the heating profile in the pupil of the projection lens. A necessary component in the accurate estimation of this profile is the total integrated distribution of light, relying on the squared modulus of the Fourier transform (FT) of the photomask layout for individual process layers. Requiring a layout representation in pixelated image format, the most common approach is to compute the FT numerically via the fast Fourier transform (FFT). However, the file size for a standard 26- mm×33-mm mask with 5-nm pixels is an overwhelming 137 TB in single precision; the data importing process alone, prior to FFT computation, can render this method highly impractical. A more feasible solution is to handle layout data in a highly compact format with vertex locations of mask features (polygons), which correspond to elements in an integrated circuit, as well as pattern symmetries and repetitions (e.g., GDSII format). Provided the polygons can decompose into shapes for which analytical FT expressions are possible, the analytical approach dramatically reduces computation time and alleviates the burden of importing extensive mask data. Algorithms have been developed for importing and interpreting hierarchical layout data and computing the analytical FT on a graphics processing unit (GPU) for rapid parallel processing, not assuming incoherent imaging. Testing was performed on the active layer of a 392- μm×297-μm virtual chip test structure with 43 substructures distributed over six hierarchical levels. The factor of improvement in the analytical versus numerical approach for importing layout data, performing CPU-GPU memory transfers, and executing the FT on a single NVIDIA Tesla K20X GPU was 1.6×104, 4.9×103, and 3.8×103, respectively. Various ideas for algorithm enhancements will be discussed.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"51 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-10-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121561522","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Tolerancing the impact of mid-spatial frequency surface errors of lenses on distortion and image homogeneity 容忍中频透镜表面误差对畸变和图像均匀性的影响

SPIE Optical Systems Design Pub Date : 2015-09-30 DOI: 10.1117/12.2191261

K. Achilles, K. Uhlendorf, D. Ochse

引用次数: 4

Effects of temperature variations on the performance of a space imaging system baffle 温度变化对空间成像系统挡板性能的影响

SPIE Optical Systems Design Pub Date : 2015-09-30 DOI: 10.1117/12.2191496

J. Haghshenas, Behzad Mohasel Afshari

引用次数: 2

A cross-polarized freeform illumination design for glare reduction in fruit quality inspection 一种用于水果质量检测中减少眩光的交叉偏振自由照明设计

SPIE Optical Systems Design Pub Date : 2015-09-28 DOI: 10.1117/12.2193858

Janos C. Keresztes, R. J. Koshel, R. Chipman, J. Stover, W. Saeys

{"title":"A cross-polarized freeform illumination design for glare reduction in fruit quality inspection","authors":"Janos C. Keresztes, R. J. Koshel, R. Chipman, J. Stover, W. Saeys","doi":"10.1117/12.2193858","DOIUrl":"https://doi.org/10.1117/12.2193858","url":null,"abstract":"Common illumination systems in short wave infrared (SWIR) hyperspectral imaging (HSI) include direct or indirect tungsten halogen lights. While direct lights provide more radiation onto the samples than dome setups, thus being more energy efficient, the acquired images often suffer from specular reflections and gloss. Glare artifacts in images increase variability in the data limiting the accuracy of machine vision algorithms for defect detection and quality inspection, or even providing false positives. Although domes are known to provide a near Lambertian illumination and glare free images, glossy regions and heterogeneities may remain in the data in practice. More particularly, in the field of fruit and vegetable quality inspection, due to their waxy surface, it remains challenging to design an efficient realistic lighting system. This paper suggests a new approach to optimize the illumination of fruit and vegetables based on measurements of the bidirectional reflectance distribution function (BRDF), shape and Stokes parameters. From these measured values, a BRDF model is loaded into ray-tracing software for realistic illumination engineering in order to determine the most suitable illumination scheme. This concept is applied to apples and a cross polarizer (CP) with freeform optics (FO) optical configuration is proposed, which allows the FO to be optimized to maximize uniformity in the field of view of the imager and removes the parallel polarized gloss on the apples. The performance of this CP illumination system was determined experimentally for a set of apples. This cross polarized (CP) illumination system provided a uniformity (U) of 92% and an efficiency (ν) of 90%, while U = 87% and ν = 14% for an ideal dome configuration when illuminating a rectangular target. The simulated imaged apples with assigned optical properties performed better with CP (U=80%) than when using a dome (U=73%) by 7%. Finally, the sensitivity of the design for the light positioning and spectral tolerance are investigated.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"36 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115018544","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2

The measurement of an aspherical mirror by three-dimensional nanoprofiler 用三维纳米剖面仪测量非球面反射镜

SPIE Optical Systems Design Pub Date : 2015-09-28 DOI: 10.1117/12.2191040

Y. Tokuta, K. Okita, K. Okuda, T. Kitayama, M. Nakano, S. Nakatani, R. Kudo, K. Yamamura, K. Endo

{"title":"The measurement of an aspherical mirror by three-dimensional nanoprofiler","authors":"Y. Tokuta, K. Okita, K. Okuda, T. Kitayama, M. Nakano, S. Nakatani, R. Kudo, K. Yamamura, K. Endo","doi":"10.1117/12.2191040","DOIUrl":"https://doi.org/10.1117/12.2191040","url":null,"abstract":"Aspherical optical elements with high accuracy are important in several fields such as third-generation synchrotron radiation and extreme-ultraviolet lithography. Then the demand of measurement method for aspherical or free-form surface with nanometer resolution is rising. Our purpose is to develop a non-contact profiler to measure free-form surfaces directly with repeatability of figure error of less than 1 nm PV. To achieve this purpose we have developed three-dimensional Nanoprofiler which traces normal vectors of sample surface. The measurement principle is based on the straightness of LASER light and the accuracy of a rotational goniometer. This machine consists of four rotational stages, one translational stage and optical head which has the quadrant photodiode (QPD) and LASER head at optically equal position. In this measurement method, we conform the incident light beam to reflect the beam by controlling five stages and determine the normal vectors and the coordinates of the surface from signal of goniometers, translational stage and QPD. We can obtain three-dimensional figure from the normal vectors and the coordinates by a reconstruction algorithm. To evaluate performance of this machine we measure a concave aspherical mirror ten times. From ten results we calculate measurement repeatability, and we evaluate measurement uncertainty to compare the result with that measured by an interferometer. In consequence, the repeatability of measurement was 2.90 nm (σ) and the difference between the two profiles was ±20 nm. We conclude that the two profiles was correspondent considering systematic errors of each machine.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"33 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115329080","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Frits Zernike and microlithography Frits Zernike和微光刻

SPIE Optical Systems Design Pub Date : 2015-09-25 DOI: 10.1117/12.2191129

D. M. Williamson

引用次数: 2

The absolute radiometric calibration facility ARCF 2.0 at TNO TNO的绝对辐射校正设施arcf2.0

SPIE Optical Systems Design Pub Date : 2015-09-24 DOI: 10.1117/12.2191595

B. Gür, G. Otter, R. Jansen, J. Groote-Schaarsberg, S. Brinkers

引用次数: 0

Mechanical design implementation and mathematical considerations for ultra precise diamond turning of multiple freeform mirrors on a common substrate 在同一基底上加工多个自由曲面镜的超精密金刚石车削的机械设计实现和数学考虑

SPIE Optical Systems Design Pub Date : 2015-09-24 DOI: 10.1117/12.2191043

J. Hartung, M. Beier, T. Peschel, A. Gebhardt, S. Risse

{"title":"Mechanical design implementation and mathematical considerations for ultra precise diamond turning of multiple freeform mirrors on a common substrate","authors":"J. Hartung, M. Beier, T. Peschel, A. Gebhardt, S. Risse","doi":"10.1117/12.2191043","DOIUrl":"https://doi.org/10.1117/12.2191043","url":null,"abstract":"For optical systems consisting of metal (in general freeform) mirrors there exist several diamond turning fabrication approaches. These are distuingished by the effort in manufacturing and integration of the later system. The more work one puts into the manufacturing stage the less complicated is the alignment and integration afterwards. For example the most degrees of freedom have to be aligned in integration phase if every mirror of the system is fabricated as a single optical component. For a three mirror anastigmat with three freeform mirrors the degrees of freedom sum up to 18. Therefore the mirror fabrication itself is more or less easy, but the integration is very difficult. There are three major parts in the design and manufacturing process chain to be considered for tackling this integration problem. At the first position in the process chain there is the optical design occuring. At this stage a negotiation between manufacturing and design could improve manufacturability because of more possible integration approaches. The second stage is the mechanical design. Here the appropriate manufacturing approach is already chosen, but may be revisited due to incompatiblities with, e.g., stress specifications. The third level is the manufacturing stage. Here are different clamping approaches and fabrication methods possible. The current article will focus on an approach (\"snap-together\") where two mirrors are fabricated on one substrate and therefore a reduction of the number of degrees of freedom to be aligned are reduced to six. This improves the amount of time needed for the system integration significantly in contrast to a single mirror fabrication.","PeriodicalId":212434,"journal":{"name":"SPIE Optical Systems Design","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-09-24","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131192190","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 9