红外和紫外飞秒脉冲辐照单层光学薄膜的能量沉积及损伤机理分析

Dam-be Douti, L. Gallais, C. Hecquet, T. Begou, J. Lumeau, M. Commandré
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引用次数: 1

摘要

本文报道了采用磁控溅射、离子辅助沉积和离子镀三种方法制备的不同厚度光学薄膜的亚皮秒激光损伤,并将其提交给镱激光(1030和343nm)的一、三次谐波单次照射。利用自由电子激发的单速率方程方法,结合电场的时空分布计算,研究了吸收能量的空间密度分布,并评估了其描述损伤现象的能力,特别是损伤阈值和形态(损伤直径、烧蚀深度)。比较了不同薄膜厚度和不同辐照条件下的激光损伤阈值。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Analysis of energy deposition and damage mechanisms in single layer optical thin films irradiated by IR and UV femtosecond pulses
We report on the sub-picosecond laser-induced damage of optical thin films of different thickness made by Magnetron sputtering, Ion assisted deposition and Ion plating, and submitted to single irradiation of the first and the third harmonics of an Ytterbium laser (1030 and 343nm). Using a single rate equation approach for free electron excitation coupled with calculation of the spatial and temporal distribution of the electric field, we investigate numerically the spatial density distribution of the absorbed energy and evaluate its capacity to describe damage phenomena especially damage threshold and morphologies (damage diameter, ablation deepness). Laser-induced damage thresholds are compared for different film thicknesses and different irradiation conditions.
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