2008 International Students and Young Scientists Workshop - Photonics and Microsystems最新文献

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Towards the limits of thick-film resistors' miniaturization 走向厚膜电阻器小型化的极限
T. Józenków, D. Nowak
{"title":"Towards the limits of thick-film resistors' miniaturization","authors":"T. Józenków, D. Nowak","doi":"10.1109/STYSW.2008.5164136","DOIUrl":"https://doi.org/10.1109/STYSW.2008.5164136","url":null,"abstract":"This paper presents results of investigations devoted to miniaturization of thick-film resistors with the aid of laser cutting. The investigations were aimed at miniaturization of two resistor dimensions, namely length and width. Test structures were based on various combination of conductive and resistive inks deposited on Al2O3, or LTCC substrates. Resistors made in standard screen printing process after being fired were patterned using laser beam in order to minimize their planar dimensions to tenths of millimeter and below. Prepared samples were subjected to number of electrical tests and some characteristic parameters, like temperature coefficient of resistance (TCR) or pulse durability were calculated based on these measurements. Test samples were also exposed to long-term thermal ageing. The received parameters were compared to those exhibited by resistors with standard dimensions in order to evaluate differences in characteristics and to determine the current miniaturization limits of such components.","PeriodicalId":206334,"journal":{"name":"2008 International Students and Young Scientists Workshop - Photonics and Microsystems","volume":"48 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122416341","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Pressure assisted polymer removal from glass optical fibres 压力辅助从玻璃光纤中去除聚合物
M. Sobocinski, R. Tadaszak, L. Golonka
{"title":"Pressure assisted polymer removal from glass optical fibres","authors":"M. Sobocinski, R. Tadaszak, L. Golonka","doi":"10.1109/STYSW.2008.5164149","DOIUrl":"https://doi.org/10.1109/STYSW.2008.5164149","url":null,"abstract":"Standard commercial glass based optical fibers are being covered with protective polymer coatings which need to be removed in some processes i.e. before welding. In this paper a novel, pressure based technique of polymer removal from optical fiber has been presented in which the optical fiber is placed between two polymer foils and two PCBs (Printed Circuit Board), and then high pressure is applied. Various pressure conditions have been tested resulting in flawless bare fiber up to 120 bars. Stripping effect has been observed as low as 10 Bars. This method is excellent for quick removal of relatively large areas of polymer for i.e. integration of the fiber optics with LTCC.","PeriodicalId":206334,"journal":{"name":"2008 International Students and Young Scientists Workshop - Photonics and Microsystems","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122053280","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
A fast recorder for changes of a resistance during joint failure in electronics 电子学中接头故障时电阻变化的快速记录仪
K. Urbanski, P. Matkowski, R. Zawierta
{"title":"A fast recorder for changes of a resistance during joint failure in electronics","authors":"K. Urbanski, P. Matkowski, R. Zawierta","doi":"10.1109/STYSW.2008.5164151","DOIUrl":"https://doi.org/10.1109/STYSW.2008.5164151","url":null,"abstract":"A main goal for this publication is a demonstration of a device and an algorithm designed for thorough examination of resistance changes of joints during accelerated tests. Even during accelerated tests it takes long time to observe failure of the joint-up to couple of weeks. However, it is important to measure resistance changes using high frequencies (up to 100 MSPS). It is also important to build a systems which measures many channels simultaneously. In practice, it is impossible to use general-purpose data acquisition devices due to very high amounts of data produced (up to 200 MB/s for single channel, which is over 15 TB per day). It is also difficult to implement user-defined algorithms for on-board event detection using such devices. A solution proposed in this paper is the FPGA-based device with user definable event detector VHDL algorithm. An FPGA together with fast ADC continuously acquires the data and stores it in internal memory in cyclic buffers. After failure detection the content of the buffer is send to the PC for further analysis. Such events occur rarely-in fact, when a permanent failure occurs, it is just single data packet. Such packet contains a values of resistance just before, during and after joint crack.","PeriodicalId":206334,"journal":{"name":"2008 International Students and Young Scientists Workshop - Photonics and Microsystems","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132064183","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Investigation of electrical and optical properties of TiO2:Pd, TiO2:(Eu,Pd) and TiO2:(Tb,Pd) thin films TiO2:Pd、TiO2:(Eu,Pd)和TiO2:(Tb,Pd)薄膜的电学和光学性质研究
K. Sieradzka, J. Domaradzki, D. Kaczmarek, B. Michalec
{"title":"Investigation of electrical and optical properties of TiO2:Pd, TiO2:(Eu,Pd) and TiO2:(Tb,Pd) thin films","authors":"K. Sieradzka, J. Domaradzki, D. Kaczmarek, B. Michalec","doi":"10.1109/STYSW.2008.5164147","DOIUrl":"https://doi.org/10.1109/STYSW.2008.5164147","url":null,"abstract":"Integration of electronics and photonics causes greater requirement for development of electrical and optical activated thin films for a new field of application known as transparent electronics. One of the key materials which is necessary for production of functional elements in transparent electronics devices are transparent oxides semiconductors (TOSs). The TOSs can be applied in many practical applications, for example as electrodes in liquid crystal displays or as a coatings in smart windows, optical devices, solar cells etc. In this work subject of research are the thin films fabricated based on TiO2 as a matrix with particular dopants (Pd, Eu, Tb). The thin films were prepared by modified high-energy magnetron sputtering method and deposited on various substrates. The electrical and optical properties of the samples were characterized by means of optical transmission spectroscopy, thermoelectrical and current to voltage (I-V) measurements. It has been shown that incorporation of selected dopants into TiO2 matrix allows us to obtain the thin films with resistivity of about 60 Omegacm in the room temperature, good transparency, equal to 50% and desired type of electrical conduction p TiO2:(Tb, Pd) or n TiO2:(Eu, Pd) in the room temperature.","PeriodicalId":206334,"journal":{"name":"2008 International Students and Young Scientists Workshop - Photonics and Microsystems","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131763892","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Demultiplexer for WDM over POF in prism-spectrometer configuration 棱镜-光谱仪配置中用于波分复用的POF解复用器
D. Lutz, M. Haupt, U. Fischer
{"title":"Demultiplexer for WDM over POF in prism-spectrometer configuration","authors":"D. Lutz, M. Haupt, U. Fischer","doi":"10.1109/STYSW.2008.5164140","DOIUrl":"https://doi.org/10.1109/STYSW.2008.5164140","url":null,"abstract":"Polymer Optical Fibres (POFs) show clear advantages compared to copper and/or glass fibres. In essence, POFs are inexpensive, space-saving and not susceptible to electromagnetic interference. Thus, the usage of POFs have become a reasonable alternative in short distance data communication. Today, POFs are applied in a wide number of applications due to these specific advantages. These applications include automotive communication systems and In-House-Networking. The current transfer mode system via POF is based only on one channel (or rather on one wavelength), making the usable bandwidth the limiting factor of this technology. One potential solution to expand the usable bandwidth of POF-based systems is wavelength division multiplexing (WDM). Because of the attenuation behaviour of POF, the only transmission window is situated in the visible spectrum. The solution proposed in this paper makes it possible to transfer several signals on different wavelengths through a single polymeric fibre. In order to separate the transmitted signals, special separators - called demultiplexers - are utilized. These demultiplexers are realized by employing the principle of the prism-spectrometer. Thus, the signals transmitted over different wavelengths will not be refracted equally strong. In the set-up described in this paper, the light emitted by the polymeric fibre is collimated by an off-axis parabolic mirror and then broken up by a prism, making it possible to restore the data originally transmitted via each wavelength-channel.","PeriodicalId":206334,"journal":{"name":"2008 International Students and Young Scientists Workshop - Photonics and Microsystems","volume":"30 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129547520","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Susceptibility of solder masks on solderballing and webbing in wave soldering 波峰焊中焊膜对球化和带化的敏感性
B. Platek, S. Tesarski
{"title":"Susceptibility of solder masks on solderballing and webbing in wave soldering","authors":"B. Platek, S. Tesarski","doi":"10.1109/STYSW.2008.5164144","DOIUrl":"https://doi.org/10.1109/STYSW.2008.5164144","url":null,"abstract":"The goal of current paper is to investigate the impact of lead-free solders, solder masks and fluxes based on water on solderballing and webbing in wave soldering. Two tests for susceptibility of solder mask on solderballing and webbing (test I - solder float method and test II - wetting balance method) and one test for flux solids are presented.","PeriodicalId":206334,"journal":{"name":"2008 International Students and Young Scientists Workshop - Photonics and Microsystems","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132681841","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
NiCrSi-Ag contacts on SiC for elevated temperatures SiC上的NiCrSi-Ag触点用于高温
K. Krówka
{"title":"NiCrSi-Ag contacts on SiC for elevated temperatures","authors":"K. Krówka","doi":"10.1109/STYSW.2008.5164137","DOIUrl":"https://doi.org/10.1109/STYSW.2008.5164137","url":null,"abstract":"Silicon carbide is one of the most promising materials for high temperature electronics. Nowadays there is a demand for devices which could work in harsh environment conditions, both for sensors applications and everyday electronics, because of no need for cooling systems. Wide band-gap semiconductors seem to be ideal for this field of electronics. However stable and good quality ohmic contacts for those materials are still a major problem because of width of the band gap, but also role of surface states and interface reactions. In this paper thin film contact systems NiCrSi-Ag for SiC:Zr is presented. The main concern is an electrical behavior after temperature treatment up to 900 K and changes in structure of contact. An analysis of damages in contacts is an important problem, as it helps in improving the technology and the conception of structure. Additionally there are discussed possibilities of future improvements. Finding a way of forming effective, stable contacts for high temperature applications will have consequences for all wide band-gap semiconductors applications.","PeriodicalId":206334,"journal":{"name":"2008 International Students and Young Scientists Workshop - Photonics and Microsystems","volume":"6 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131023188","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Deposition of reactive and non-reactive metals on titanium dioxide - Chromium and cobalt 活性和非活性金属在二氧化钛上的沉积-铬和钴
S. Muller, D. Schmeißer
{"title":"Deposition of reactive and non-reactive metals on titanium dioxide - Chromium and cobalt","authors":"S. Muller, D. Schmeißer","doi":"10.1109/STYSW.2008.5164143","DOIUrl":"https://doi.org/10.1109/STYSW.2008.5164143","url":null,"abstract":"The deposition of chromium and cobalt on TiO2 substrates is analyzed in a comparative study using synchrotron based photoelectron spectroscopy methods. Upon deposition of chromium the electronic structure of the TiO2 substrate is modified. The substrate is reduced while the deposited Cr becomes oxidized. Two states are observed to appear within the electronic gap and their distinct character of either Cr 3d or Ti 3d is revealed by Resonant Photoelectron Spectroscopy (ResPES). When a Cr thickness of 1.3 ML is reached, metallic Titanium is observed as well as metallic chromium. The properties of cobalt deposited on TiO2 differ from that behaviour. The reaction is only observed during the very first steps of the Co growth. Only some of the deposited Co is oxidized to Co2+ while metallic Co is the dominating component. From thermodynamic considerations a 2-dimensional growth mode for the reactive metal (chromium) is concluded while in contrast to this, cobalt is considered to have a 3-dimensional cluster growth mode corresponding to its character as non-reactive metal.","PeriodicalId":206334,"journal":{"name":"2008 International Students and Young Scientists Workshop - Photonics and Microsystems","volume":"32 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129816490","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Fabrication, luminescent properties and possible photonics application of Eu:Y2O3 nanoparticles Eu:Y2O3纳米颗粒的制备、发光特性及可能的光子学应用
P. Psuja, D. Hreniak, W. Stręk
{"title":"Fabrication, luminescent properties and possible photonics application of Eu:Y2O3 nanoparticles","authors":"P. Psuja, D. Hreniak, W. Stręk","doi":"10.1109/STYSW.2008.5164146","DOIUrl":"https://doi.org/10.1109/STYSW.2008.5164146","url":null,"abstract":"The Eu3+ doped yttria nanoparticles were synthesized by modified Pechini method. Different values of sintering temperature were applied during synthesis process. XRD patterns were taken to examine the structure and estimate the average grains size of obtained nanocrystals. The photoluminescence of obtained powders was measured. Then powders were electrophoretically deposited on ITO-glass slides. Cathodoluminescent spectra of deposited layers were taken and compared. Also the luminescent decay times for 5D0rarr7F2 were recorded. The influence of sintering temperature on cathodoluminescent and photoluminescent properties of europium doped Y2O3 nanocrystallites and possible application of obtained material will be discussed.","PeriodicalId":206334,"journal":{"name":"2008 International Students and Young Scientists Workshop - Photonics and Microsystems","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132180278","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
An analysis of VOC-free fluxes and lead-free solders application in a manual SMD soldering 无挥发性有机化合物焊剂和无铅焊剂在手工SMD焊接中的应用分析
S. Tesarski, K. Urbanski, B. Platek
{"title":"An analysis of VOC-free fluxes and lead-free solders application in a manual SMD soldering","authors":"S. Tesarski, K. Urbanski, B. Platek","doi":"10.1109/STYSW.2008.5164150","DOIUrl":"https://doi.org/10.1109/STYSW.2008.5164150","url":null,"abstract":"The overview of electronic assembly publications shows that almost all authors concentrate on mass-scale (industrial) lead-free soldering. On the contrary there are almost no publications concerning possibility of manual soldering using lead-free solders and VOC-free fluxes. Manual soldering of SMD is widely used during PCB prototyping, especially at home or academic laboratories. European Union directive RoHS forbids to use in electrical and electronic equipment hazardous materials such as lead (Pb), mercury (Hg), cadmium (Cd), hexavalent chromium (Cr6+), PBBs (polybrominated biphenyls) and PBDEs (polybrominated diphenys ethers). The practice shows that in manual soldering SnPb solder and rosin is commonly used, damaging health of people who use it. The aim of this study is to check possibility of ldquodomestic userdquo of lead-free solders and VOC-free fluxes. The test will be held using different lead-free solders, VOC-free fluxes and various soldering conditions. SMD passive elements will be used for the tests due to its susceptibility for overheating (usage of lead-free solders enforces higher temperatures). The test will evaluate visual assessment of joint quality, analysis of PCB damage and degradation of passive elements parameters after manual soldering.","PeriodicalId":206334,"journal":{"name":"2008 International Students and Young Scientists Workshop - Photonics and Microsystems","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2008-06-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134020335","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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