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Journal of The Vacuum Society of Japan最新文献

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Expectation to Vacuum Nano-electronics 对真空纳米电子学的期望
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.2
H. Mimura
{"title":"Expectation to Vacuum Nano-electronics","authors":"H. Mimura","doi":"10.3131/JVSJ2.60.2","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.2","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"49 1","pages":"2-7"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88785980","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
真空計測における Japan Calibration Service System：計量法に基づく校正事業者登録制度（JCSS）への取り組み，「誤差」から「トレーサビリティー」と「不確かさ」へ 真空测量的Japan Calibration Service System:致力于基于计量法的校正经营者注册制度(JCSS)，从“误差”到“可追溯”和“不确定性”
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/jvsj2.60.182
隆英 堀, 秀樹 吉澤, 智成 田中
{"title":"真空計測における Japan Calibration Service System：計量法に基づく校正事業者登録制度（JCSS）への取り組み，「誤差」から「トレーサビリティー」と「不確かさ」へ","authors":"隆英 堀, 秀樹 吉澤, 智成 田中","doi":"10.3131/jvsj2.60.182","DOIUrl":"https://doi.org/10.3131/jvsj2.60.182","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"13 1","pages":"182-186"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87410694","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
真空技術者資格認定試験の問題解説(5);真空技術者資格認定試験の問題解説(5);Guidance for the Vacuum Engineer Examination (5) 真空技术者资格认定试験の问题解说(5);真空技术者资格认定试験の问题解说(5);Guidance for the Vacuum Engineer Examination (5)
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/jvsj2.60.279
Kazue Takahashi
{"title":"真空技術者資格認定試験の問題解説(5);真空技術者資格認定試験の問題解説(5);Guidance for the Vacuum Engineer Examination (5)","authors":"Kazue Takahashi","doi":"10.3131/jvsj2.60.279","DOIUrl":"https://doi.org/10.3131/jvsj2.60.279","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"93 1","pages":"279-282"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"84760650","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
走査トンネル顕微鏡を用いた単層酸化グラフェンのナノスケール観察;走査トンネル顕微鏡を用いた単層酸化グラフェンのナノスケール観察;Nanoscale Observation of a Single Graphene Oxide layer Using Scanning Tunneling Microscopy 利用扫描隧道显微镜对单层氧化石墨烯进行纳米级观察;利用扫描隧道显微镜对单层氧化石墨烯进行纳米级观察;Nanoscale Observation of a Single Graphene Oxide layer Using Scanning Tunneling Microscopy
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.495
S. Katano, Tao Wei, Takumi Sasajima, Y. Uehara
{"title":"走査トンネル顕微鏡を用いた単層酸化グラフェンのナノスケール観察;走査トンネル顕微鏡を用いた単層酸化グラフェンのナノスケール観察;Nanoscale Observation of a Single Graphene Oxide layer Using Scanning Tunneling Microscopy","authors":"S. Katano, Tao Wei, Takumi Sasajima, Y. Uehara","doi":"10.3131/JVSJ2.60.495","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.495","url":null,"abstract":"Nano-scale structures of a single graphene oxide (GO) layer deposited on Au(111) covered with the octanethiolate self-assembled monolayer (C8S-SAM) have been investigated by scanning tunneling microscopy (STM). Using a spin-coating method, we found that GO ‰akes are isolated and are dispersed on the C8S-SAM/Au(111) surface whereas these are likely to pile up on the bare Au(111) surface. Furthermore, the C8S-SAM formed on Au(111) enables us to deposit GO keeping the surface clean even if we prepared the sample in the atmosphere. By using the C8S-SAM/Au(111) substrate, we succeeded in observing an STM image of the unreduced GO. The STM image of a single GO layer exhibits the grain-like structure having the range in height from 0.6 to 1.1 nm. The biasdependent STM study indicated that the STM image of GO is stably and reproducibly obtained at the voltage where the density of states of GO exists.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"9 1","pages":"495-498"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80437556","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Influence of Space Charge on the Relative Sensitivity Coefficient of a Triode Gauge 空间电荷对三极管计相对灵敏度系数的影响
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/jvsj2.60.490
Shigemi Suginuma, M. Hirata, T. Kobata
{"title":"Influence of Space Charge on the Relative Sensitivity Coefficient of a Triode Gauge","authors":"Shigemi Suginuma, M. Hirata, T. Kobata","doi":"10.3131/jvsj2.60.490","DOIUrl":"https://doi.org/10.3131/jvsj2.60.490","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"37 1","pages":"490-494"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73223757","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
電子線照射装置の工業利用への展開;電子線照射装置の工業利用への展開;Expansion of Industrial Use of Electron Beam Processing System 电子射线照射设备在工业中的应用;电子射线照射设备在工业中的应用;Industrial Use of Electron Beam Processing System
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.64
Yasuyuki Okumura
{"title":"電子線照射装置の工業利用への展開;電子線照射装置の工業利用への展開;Expansion of Industrial Use of Electron Beam Processing System","authors":"Yasuyuki Okumura","doi":"10.3131/JVSJ2.60.64","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.64","url":null,"abstract":"電子線照射装置は電子を高真空中で高電圧により加速させ た後,加速電子を大気中に取り出すもので,高電圧技術, ビーム工学技術,そして高真空技術の複合技術で構成される 装置である.この加速電子を物質に当てることで加速電子が もつエネルギーを物質に与え,様々な反応を引き起こす.通 常の化学反応で用いる熱エネルギーと比較してエネルギー利 用率が高く,反応促進剤などの添加剤不要,かつ低温で効果 が得られる.また電子線は放射線の一種であるが,電源の ON/OFF で放射線の発生を制御できるなど,取り扱いが容 易で安全性が高い.そして単位時間あたりの材料に与えるエ ネルギーは,同様の現象を起こすことができるガンマ線と比 較すると桁違いに大きい.そのため連続生産性が高く工業用 途に好適な装置といえる1). 電子線照射技術は放射線劣化の研究からはじまり,1952 年にチャールスビー教授がポリエチレンの電子線架橋を発見 した後,様々な産業分野で利用されることとなった.近年で は電子線照射装置の改良改善が進むとともに,電子線照射に 適した素材が開発されるなど,工業利用,技術開発が活発に 行われている.本稿では電子線照射装置の工業利用や,研究 開発が進められている照射技術の概要や利点,用途を紹介す る.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"10 1","pages":"64-67"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81195284","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Evacuation Process for a Long Pipe using ‘Horikoshi-Model’ 基于“堀越模型”的长管道疏散过程
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/jvsj2.60.228
O. Okada
{"title":"Evacuation Process for a Long Pipe using ‘Horikoshi-Model’","authors":"O. Okada","doi":"10.3131/jvsj2.60.228","DOIUrl":"https://doi.org/10.3131/jvsj2.60.228","url":null,"abstract":"水分子は吸着性の分子で,真空装置の排気過程で重要な役 割をすることは,真空技術において良く知られている.その 吸着性の分子の振る舞いを具体的に記述するモデルとして 「堀越モデル」1)があるが,残念ながら良く知られているとは 言えない.それには,いろいろな歴史的な事情が絡んでいる と思うが,ここでは次の点を指摘しておきたい.第一には, 日本における最も著名な真空の教科書は,今でも,熊谷らに よる「真空の物理と応用」2)であるが,この教科書が出版さ れたのは1970年で,堀越はこの本の共著者の一人である が,堀越モデルはまだ提案されていなかったので,記述され ていない.1970年以降,日本の真空教科書は,この教科書 に基づき,その後の真空技術の進歩を付け加える形で記述さ れてきているように見える.私は,堀越モデルは付け加えら れるべきであった,と考えるが,どういうわけか堀越モデル について日本の教科書には殆ど記述されていない.第二に, 「堀越モデル」が日本発のモデルであるためか,あるいは微 妙な解釈の違いのためか,やはり理由は私には良く解らない が,外国の真空の教科書にも,殆ど堀越モデルの記述がない ようである.第三に,堀越モデルは,本人によって,「真空 排気とガス放出」3)に詳しい解説がなされている.しかしな がら,その解説では,簡単のためと思われるが,吸着分子の 付着係数を 1 としている.そのため,分子の振る舞いが現 実離れしており,このモデルが実際の現象に適用できるよう に感じられない.堀越自身が,このモデルを,単に考え方を 説明するためのものでしかなく,現実的なものであると思っ ていなかった可能性がある. 堀越モデルによって,実際の排気が記述できる場合がある ことは,最近になって報告されている4).また,排気におけ る準平衡状態の成立にこのモデルが必要であることは,松田 によって指摘されている5).武安らは排気曲線の解析により 吸着密度分布を導くことができることを報告している6)が, これを理解するためにも堀越モデルは基本的である.堀越モ デルの重要性は増していると思う. ここでは,堀越モデルで,特に滞在時間が長い場合を詳細 に述べ,排気曲線にどのような特徴がなぜ現れるか説明す る.それをもとに,長い配管の排気になぜ長時間必要である かを考察する.またビルドアップにこのモデルを拡張する. これにより,吸着性の分子の真空中の振る舞いの理解に,堀 越モデルが大切であることを述べる.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"39 1","pages":"228-233"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81252958","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Problem-Solving Exercise for Basic Understanding of Vacuum Science and Technology (1) 真空科学与技术基础知识解题练习(1)
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/jvsj2.60.201
K. Shibata
{"title":"Problem-Solving Exercise for Basic Understanding of Vacuum Science and Technology (1)","authors":"K. Shibata","doi":"10.3131/jvsj2.60.201","DOIUrl":"https://doi.org/10.3131/jvsj2.60.201","url":null,"abstract":"","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"92 1","pages":"201-211"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87383390","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Detection System for KeV Proton Beam Scattered from an ESD-surface with Monolayer Pits of Alkali Halide Crystal 碱性卤化物晶体静电放电表面散射KeV质子束的探测系统
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.153
Y. Fukazawa, Ryoki Nakagawa, Y. Susuki
{"title":"Detection System for KeV Proton Beam Scattered from an ESD-surface with Monolayer Pits of Alkali Halide Crystal","authors":"Y. Fukazawa, Ryoki Nakagawa, Y. Susuki","doi":"10.3131/JVSJ2.60.153","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.153","url":null,"abstract":"To observe specular oscillations in ion-surface scattering originating from layer-by-layer desorption of an electron stimulated desorbed (ESD) surface, a 15 keV proton beam was impinged on the surface with an angle of incidence less than 1°. We prepared an experimental system to examine the scattering yields of re‰ecting protons by conveniently employing a ‰uorescent screen to view scattering yields (scattering patterns) and a commercial digital camera for yield measurements. Because the present energy of the proton beam was too low to illuminate the screen, a micro-channel plate was inserted in front of the screen. Measurements with electron irradiation show obvious damping specular oscillations; the widths of angular distributions of scattered protons simultaneously oscillated with increasing electron ‰uence. From the measured periods of the oscillations, the ESD rates of thermal desorption from KBr(001) at 1.5 keV electrons irradiation were obtained for sample temperatures.","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"89 1","pages":"153-157"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87413282","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering 高功率脉冲磁控溅射制备碳薄膜的表征
Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI: 10.3131/JVSJ2.60.341
Norio Nawachi, K. Itoh, Yosuke Isagi, Yoshiaki Yoshida, K. Okamoto, T. Nakatani
{"title":"Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering","authors":"Norio Nawachi, K. Itoh, Yosuke Isagi, Yoshiaki Yoshida, K. Okamoto, T. Nakatani","doi":"10.3131/JVSJ2.60.341","DOIUrl":"https://doi.org/10.3131/JVSJ2.60.341","url":null,"abstract":"Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering Norio NAWACHI1, Koichi ITOH1, Yosuke ISAGI1, Yoshiaki YOSHIDA2, Keishi OKAMOTO2 and Tatsuyuki NAKATANI3 1West Region Industrial Research Center, Hiroshima Prefectural Technology Research Institute, 2101 Agaminami, Kure-shi, Hiroshima 7370004, Japan 2Toyo Advanced Technologies Co., Ltd., 5338 Ujina-higashi, Minami-ku, Hiroshima-shi, Hiroshima 7348501, Japan 3Research Institute of Technology, Okayama University of Science, 11 Ridai-cho, Kita-ku, Okayama-shi, Okayama 7000005, Japan","PeriodicalId":17344,"journal":{"name":"Journal of The Vacuum Society of Japan","volume":"48 1","pages":"341-345"},"PeriodicalIF":0.0,"publicationDate":"2017-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90053893","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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