高功率脉冲磁控溅射制备碳薄膜的表征

Journal of The Vacuum Society of Japan Pub Date : 2017-01-01 DOI:10.3131/JVSJ2.60.341

Norio Nawachi, K. Itoh, Yosuke Isagi, Yoshiaki Yoshida, K. Okamoto, T. Nakatani

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引用次数: 0

摘要

表征碳薄膜由高功率脉冲磁控溅射Norio NAWACHI1,伊藤Koichi1,Yosuke ISAGI1,吉田2义明Keishi OKAMOTO2和Tatsuyuki NAKATANI31西部地区工业研究中心,广岛县技术研究所,2101 Agaminami Kure-shi,广岛7370004,日本2丰雄先进技术有限公司有限公司5338 Ujina-higashi, Minami-ku, Hiroshima-shi,广岛7348501,日本3技术研究所,冈山理工学大学，1日本冈山市北区立台町1号7000005

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Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering

Characterization of Carbon Thin Films Prepared by High Power Impulse Magnetron Sputtering Norio NAWACHI1, Koichi ITOH1, Yosuke ISAGI1, Yoshiaki YOSHIDA2, Keishi OKAMOTO2 and Tatsuyuki NAKATANI3 1West Region Industrial Research Center, Hiroshima Prefectural Technology Research Institute, 2101 Agaminami, Kure-shi, Hiroshima 7370004, Japan 2Toyo Advanced Technologies Co., Ltd., 5338 Ujina-higashi, Minami-ku, Hiroshima-shi, Hiroshima 7348501, Japan 3Research Institute of Technology, Okayama University of Science, 11 Ridai-cho, Kita-ku, Okayama-shi, Okayama 7000005, Japan

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Journal of The Vacuum Society of Japan

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