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Physics of X-Ray Multilayer Structures最新文献

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Determination of X-ray indices of refraction by interferometry 干涉法测定x射线折射率
Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.tha.4
J. Svatos, D. Joyeux, F. Polack, D. Phalippou
{"title":"Determination of X-ray indices of refraction by interferometry","authors":"J. Svatos, D. Joyeux, F. Polack, D. Phalippou","doi":"10.1364/pxrayms.1994.tha.4","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.tha.4","url":null,"abstract":"As well known, the propagation of an electromagnetic field inside matter is described by the complex index of refraction n = 1-δ+iβ, where δ and β account respectively for phase retardation and absorption. δ and β are related by the Kramers-Kronig relationships, which theoretically, permits calculating δ(λ) from experimental determination of β(λ) [1]. Practically, however, the method gives questionable results near absorption edges, mainly because only discrete absorption data can be obtained in a finite wavelength range and some assumptions on the material structure must be introduced. More direct methods exist, based on reflectivity measurements [2-5]. Again, assumptions on the material structure must be introduced, which makes the results questionable near absorption edges. In all cases, the influence of β significantly limits the accuracy of the determination of δ. In addition, it is often found that the index values depends strongly on the conditions of deposition of materials. Such methods, which often make use of composite stacks, are therefore not well adapted.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132546871","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Broad-band focusing of hard x-rays using a supermirror
Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.wc.9
P. Høghøj, E. Ziegler, J. Susini, A. Freund, Karsten Dan Joensen, P. Gorenstein
{"title":"Broad-band focusing of hard x-rays using a supermirror","authors":"P. Høghøj, E. Ziegler, J. Susini, A. Freund, Karsten Dan Joensen, P. Gorenstein","doi":"10.1364/pxrayms.1994.wc.9","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.wc.9","url":null,"abstract":"Until recently, the use of reflective optics at short wavelengths was limited by the low critical angles of minor materials. Single coating mirrors are impractical for energies above ~ 40 keV, because the approximate relation E[keV]· ·θ [mrad] ≤ √ 80 · Z, (where θ is the incidence angle and Z is the atomic number of the mirror material) must be fulfilled. For neutrons the use of graded d-spacing multilayers, so-called supermirrors, has helped to considerably increase the usable angles and has facilitated the construction of flux concentrators at energies where single coatings do not perform well1,2,3. We have previously reported on supermirrors for high energy x-rays4,5. For energies above 40 keV and away from absorption edges, supermirrors show significant reflectivity out to E[keV]· θ[mrad] ≤ 6.2·103/dmin[Å], where dmin is the minimum period of the supermirror. In this summary we describe the first focusing of a high energy polychromatic x-ray beam with a W/Si supermirror.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124841298","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
A Facility for the Measurement of the Soft X-ray Reflectivity Spectrum of XUV and Soft X-ray Mirrors 一种测量XUV和软x射线反射镜软x射线反射率谱的装置
Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.tuc.2
P. Villoresi, E. Jannitti, P. Nicolosi, M. Perin, G. Tondello
{"title":"A Facility for the Measurement of the Soft X-ray Reflectivity Spectrum of XUV and Soft X-ray Mirrors","authors":"P. Villoresi, E. Jannitti, P. Nicolosi, M. Perin, G. Tondello","doi":"10.1364/pxrayms.1994.tuc.2","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.tuc.2","url":null,"abstract":"The spectrally resolved reflectivity coefficient of multilayer mirrors is measured in the EUV-soft X-ray spectral region. A laser produced plasma (LPP) acts as a bright source of continuous spectrum radiation, and it is used to light the multilayer mirror under test. The reflected rays are collected by a grazing incidence toroidal mirror and focused in the entrance slit of a grazing incidence spectrograph, where the spectrum is detected. The ratio of such spectrum with that obtained with the direct collection of the LPP spectrum, corrected for the higher diffraction orders contributions, is the spectrum of the absolute reflectivity coefficient for the mirror[1].","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121661150","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Imaging Cross Section Of X-ray Multilayer By STM 多层x射线STM成像截面
Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.wc.5
Qi Wang, L. Knight, J. Thorne
{"title":"Imaging Cross Section Of X-ray Multilayer By STM","authors":"Qi Wang, L. Knight, J. Thorne","doi":"10.1364/pxrayms.1994.wc.5","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.wc.5","url":null,"abstract":"Cross section information is important in the study of x-ray multilayers. The traditional technique in this area is TEM. One of the limitations for TEM method is that the image is not from the surface of the sample but over an average of 10-20 nm in depth. STM, on the other hand, is a surface-sensitive technique. Comparing with TEM, STM has another advantage that STM is capable of obtaining information about the electronic structure of the materials. Like TEM, STM can also provide images with atomic lateral resolution. Potentially, STM is a very powerful tool in the study of x-ray multilayer.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"42 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133780296","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Thin-Film Multilayer X-Ray Waveguide--A New Element of X-Ray Technic 薄膜多层x射线波导——x射线技术的新元素
Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.tuc.3
Yaroslav A. Konstantinov, Y. Dudchik, F. Komarov
{"title":"Thin-Film Multilayer X-Ray Waveguide--A New Element of X-Ray Technic","authors":"Yaroslav A. Konstantinov, Y. Dudchik, F. Komarov","doi":"10.1364/pxrayms.1994.tuc.3","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.tuc.3","url":null,"abstract":"The use of nanometer scale multilayers structures for optics of hard X-radiation is discussed.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129084880","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Sputtering Deposited Ta/Si Multilayer Soft X-Ray Mirrors 溅射沉积Ta/Si多层软x射线反射镜
Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1992.mc6
Shao Jianda, Fan Zhengxiu
{"title":"Sputtering Deposited Ta/Si Multilayer Soft X-Ray Mirrors","authors":"Shao Jianda, Fan Zhengxiu","doi":"10.1364/pxrayms.1992.mc6","DOIUrl":"https://doi.org/10.1364/pxrayms.1992.mc6","url":null,"abstract":"Tantalum/Silicon multilayers to be used as normal-incidence mirrors for 234A X-ray have been fabricated using plane magnetron sputtering system. The test and evaluation of characterizations have been given by Small Angle Diffraction with Cu-Ka radiation, Transmission Electron Microscopy and Auger Electron Spectrooscopy.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128444060","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
In Situ Growth Studies of Nanometer Thin-film Multilayers using Grazing X-ray Reflectivity and Ellipsometry 利用掠射x射线反射率和椭偏法原位生长纳米多层薄膜
Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.mb.3
E. Lüken, E. Ziegler, P. Høghøj, A. Freund, E. Gerdau, A. Fontaine
{"title":"In Situ Growth Studies of Nanometer Thin-film Multilayers using Grazing X-ray Reflectivity and Ellipsometry","authors":"E. Lüken, E. Ziegler, P. Høghøj, A. Freund, E. Gerdau, A. Fontaine","doi":"10.1364/pxrayms.1994.mb.3","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.mb.3","url":null,"abstract":"Multilayer-based X-ray optical components call for structures made of smooth and uniform layers with an abrupt interface as well as a high thickness repeatability over many layers. A wide bandpass high energy x-ray reflector illustrates this extreme case where one needs an in-depth graded period multilayer with several hundreds of layers [1]. Thus, in situ characterization techniques are essential to detect thickness fluctuations and are moreover very helpful to optimize the layers. This is the purpose of the two different methods described: grazing X-ray reflectance and optical ellipsometry.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129171482","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Computer Simulation and Field Visualization in Diffraction Optics 衍射光学中的计算机模拟与场可视化
Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.tuc.5
A. Popov, Yuri V. Kopylov, A. Vinogradov
{"title":"Computer Simulation and Field Visualization in Diffraction Optics","authors":"A. Popov, Yuri V. Kopylov, A. Vinogradov","doi":"10.1364/pxrayms.1994.tuc.5","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.tuc.5","url":null,"abstract":"We describe numerical modeling of the wave fields produced by complex quasioptic elements. The parabolic equation method and exact transparency boundary conditions are used in the computational algorithm. The computer code provides global field visualization using color graphics.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"37 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125265860","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The correlation between reflectance and surface roughness of multilayer X-ray optics 多层x射线光学系统反射率与表面粗糙度的关系
Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.wb.2
D. Windt, W. Waskiewicz, J. Griffith
{"title":"The correlation between reflectance and surface roughness of multilayer X-ray optics","authors":"D. Windt, W. Waskiewicz, J. Griffith","doi":"10.1364/pxrayms.1994.wb.2","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.wb.2","url":null,"abstract":"High-efficiency, normal-incidence X-ray multilayer mirrors are now being used for a variety of practical applications. Among these is Extreme Ultraviolet (EUV) lithography. A practical EUV lithography printing tool may include as many as seven normal-incidence multilayer reflections, so it is imperative that the mirror substrates be fabricated with low surface roughness in order to achieve high reflectance, and consequently high system throughput (wafers/hour.) In order to develop the necessary techniques to fabricate such mirrors, it is first necessary to accurately quantify the surface finish requirements of the mirror substrates, and to then identify the surface finish metrology tools that can be used by the manufacturer during the substrate fabrication process. To this end, we have examined correlations between direct surface finish measurement techniques and normal-incidence, soft X-ray reflectance measurements of highly-polished X-ray multilayer mirrors.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"46 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121123405","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
ATTAINMENT OF PHASE EQUILBRIUM IN MULTILAYERS 多层材料相平衡的实现
Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.wa.4
Y. Pershin, E. A. Bugaev, I. Kopilets, S. Yulin, I. Kozhevnikov
{"title":"ATTAINMENT OF PHASE EQUILBRIUM IN MULTILAYERS","authors":"Y. Pershin, E. A. Bugaev, I. Kopilets, S. Yulin, I. Kozhevnikov","doi":"10.1364/pxrayms.1994.wa.4","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.wa.4","url":null,"abstract":"Structural, phase and chemical stabilities of multilayers Mo-Si, MOSi2- Si, W-Si, WSi2-Si, Cr-Sc, W-Sc, Mo-B4C, Mo−(B+C), Mo2B5-B4C, Cr3C2-C, TiC-C, Ti-Be and others were studied in 300-1100°C temperature range by small-angle and large-angle X-ray diffraction scattering and electron microscopy methods. The structural instability (crystallization of amorphous Si, C, MOSi2, WSi2, MoC, MoB2, Mo2B5, B and Cr3 C2 and recrystal-lization of polycrystal Mo, W, Sc, MoSi2, WSi2, Mo2B5 and MoC layers) as well as the phase instability (transformation of MoSi2 lattice from hexagonal to tetragonal modification) are responsible for the degradation of multilayers due to the development of the interface roughness and mechanical stresses. The chemical instability (formation of MoSi2 and WSi2 silicides at interfaces of Mo-Si and W-Si multilayers, Mo2C and MoC carbides and MoB2 and Mo2B5 borides in Mo-(B+C) multilayers, TiBe12 in Ti-Be ones) influences critically chemical composition profile, layer thicknesses and a period of multilayers. Formation of chemical compounds accompanied by an amorphization of polycrystal layers (growth of amorphous Mo2C and MoC carbides instead of polycrystal Mo at about 450 °C and the subsequent substitution of polycrystal molybdenum carbides on amorphous borides MoB2 and Mo2B5 at 700-800 °C in Mo-(B+C) multilayers) promotes the smoothening of interfaces. This effect of the chemical instability can be used for an improving of the X-ray reflectivity of multilayers.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125517776","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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