Sputtering Deposited Ta/Si Multilayer Soft X-Ray Mirrors

Abstract

Tantalum/Silicon multilayers to be used as normal-incidence mirrors for 234A X-ray have been fabricated using plane magnetron sputtering system. The test and evaluation of characterizations have been given by Small Angle Diffraction with Cu-Ka radiation, Transmission Electron Microscopy and Auger Electron Spectrooscopy.