Physics of X-Ray Multilayer Structures最新文献_第8页

Dual Ion Beam Assisted Deposition for Multilayer Production 用于多层生产的双离子束辅助沉积

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.mc.5

J. Pedulla, A. Bartos, R. Deslattes

引用次数: 0

A Stochastic Model for Multilayer Growth 多层生长的随机模型

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.mc.9

D. Stearns

{"title":"A Stochastic Model for Multilayer Growth","authors":"D. Stearns","doi":"10.1364/pxrayms.1994.mc.9","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.mc.9","url":null,"abstract":"The majority of work in the theory of thin film growth has been directed at studying two extreme regimes of the problem. On the one hand, there have been numerous investigations of heteroepitaxial growth of thin films under near-equilibrium conditions. At the other extreme, there has been interest in the morphology of films grown under highly nonequilibrium conditions where the surface mobility of the adatoms is severely limited, resulting in strong shadowing effects and nonlinear columnar growth modes. It has been found, however, that the best conditions for producing x-ray multilayer structures correspond to an intermediate regime, that being far from equilibrium but under sufficiently energetic conditions to promote layer formation. Although of considerable technical importance, there has been little theoretical attention paid to this intermediate regime. Experimentally, this growth regime is realized by bombarding the surface during deposition with a primary or secondary flux of energetic particles, such as is achieved in ion-assisted evaporation or sputtering at low pressures. Under these conditions the deposited layers are usually amorphous or nanocrystalline and the root-mean-square (rms) roughness of the interfaces can be maintained to < 5 Å throughout the multilayer, a condition required for good x-ray optical performance. In this paper we present a simple linearized, stochastic model for the growth of multilayer structures in this moderately energetic regime.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131316178","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

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Multilayer Structures in Synchrotron Radiation Research and other Applications 多层结构在同步辐射研究中的应用

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.thc.1

J. Underwood

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Diffuse x-ray scattering measurements from multilayers 多层的漫射x射线散射测量

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.wc.2

R. Schlatmann, J. Shindler, J. Verhoeven

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Physical Optics of X-Ray Multilayer Structures x射线多层结构的物理光学

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1992.ma1

E. Spiller

引用次数: 0

Determination of surface roughness of silicon wafers using soft-x-ray scattering* 用软x射线散射法测定硅片表面粗糙度*

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.tub.3

J. Mackay, C. Teichert, D. Savage, M. Lagally, P. Wagner

{"title":"Determination of surface roughness of silicon wafers using soft-x-ray scattering*","authors":"J. Mackay, C. Teichert, D. Savage, M. Lagally, P. Wagner","doi":"10.1364/pxrayms.1994.tub.3","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.tub.3","url":null,"abstract":"Characterization of the morphology of polished surfaces, particularly on the nanoscale, has become increasingly important for a wide range of technologies. One method that is sensitive to roughness on this scale is hard x-ray scattering. However, the technique has limitations because measurements must be performed at grazing incidence to obtain sufficient signal. These limitations can be partly overcome by using soft x rays. In this study, we use soft-x-ray scattering to examine the morphology of Si wafers before and after the final chemical polishing step used in wafer fabrication. We use transverse (rocking) scans to map the diffuse intensity distribution normal to the surface. Both sample preparations yield a two-component profile, an instrument limited peak in the specular direction and broad diffuse component, suggesting a roughness with a long-wavelength cutoff. The samples that did not receive the final polishing step showed much greater diffuse intensity, indicating that they are much rougher. The soft-x-ray measurements are in qualitative agreement with optical scatter measurements. Results will be compared with atomic force microscopy measurements and discussed in terms of the band pass of the respective measurements. Efforts will be made to compare the rms roughness and the power spectral density extracted from these techniques.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134589050","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

X-Ray Ellipsometry: A Surface Sensitive Technique to Characterize Thin Films and Layered Materials x射线椭偏仪:一种表征薄膜和层状材料的表面敏感技术

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.tuc.9

E. Ziegler, D. Doublet

{"title":"X-Ray Ellipsometry: A Surface Sensitive Technique to Characterize Thin Films and Layered Materials","authors":"E. Ziegler, D. Doublet","doi":"10.1364/pxrayms.1994.tuc.9","DOIUrl":"https://doi.org/10.1364/pxrayms.1994.tuc.9","url":null,"abstract":"As polarization sensitive experiments are an important trend in x-ray physics nowadays, a strong demand has arised for producing various polarization states and for measuring them, therefore, calling for polarizers for the x-ray domain. Intense x-ray sources exist or are under development; such as the ones produced by a laser plasma or by synchrotron radiation. In the latter case, the radiation is essentially linearly polarized on axis with an electric field parallel to the plane of the electron. If another state of polarization is desirable one can use either quarter and half wave plates[1] or exotic insertion devices, such as a crossed undulator[2], a planar/ helical undulator,[3] or an asymmetric wiggler. It is always important to know the amount of unpolarized light that is present. Quarter and half wave plates can be made of perfect crystals[4] and have effectively been used at energies higher than 7 keV[5]. In the soft x-ray region the property of phase retardation between s and p components were recently proven for multilayers both in the reflection[7,8] and the transmission[6][10] geometries. However, an upper energy limit of application seems to be about 400 eV when accounting for the minimum d-spacing that can be produced at present without sacrifying the multilayer performance. Other authors[7] have mentioned the carbon K-edge as an upper limit because of an increase in the absorption contribution.","PeriodicalId":164371,"journal":{"name":"Physics of X-Ray Multilayer Structures","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1900-01-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132540396","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Observation of Phase Separation in Fe/C Multilayers. Fe/C多层膜相分离的观察。

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.mc.3

A. D. Akhsaklialyan, Y. Blyakhman, S. A. Gusev, N. I. Polushkin, N. Salashchenko

引用次数: 0

Image Quality and Scattering by Multilayer X-Ray Mirrors and its Implication for the Fabrication of Diffraction Limited Large X-Ray Optics 多层x射线反射镜的成像质量和散射特性及其对衍射受限大型x射线光学器件制造的启示

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1992.pd4

E. Spiller, D. Stearns

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Multilayered Diffractive Optics for X-Ray Focusing: Experimental results (1-10 keV) and theoretical predictions using dynamical theory. 用于x射线聚焦的多层衍射光学:实验结果(1-10 keV)和使用动力学理论的理论预测。

Physics of X-Ray Multilayer Structures Pub Date : 1900-01-01 DOI: 10.1364/pxrayms.1994.wc.10

P. Chevailier, P. Dhez, A. Erko, M. Ifdir, F. Legrand, A. Mirone, G. Soulli

引用次数: 0