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Fresenius' Journal of Analytical Chemistry最新文献

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Characterization of crystal faces of polycrystalline HFCVD diamond films by STM/STS 多晶HFCVD金刚石薄膜晶面的STM/STS表征
Fresenius' Journal of Analytical Chemistry Pub Date : 1997-05-21 DOI: 10.1007/S002160050422
R.-J. Schirach, B. Kolbesen, D. Aderhold, F. Comes
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引用次数: 6
Corrosion behaviour of coated materials 涂层材料的腐蚀行为
Fresenius' Journal of Analytical Chemistry Pub Date : 1997-05-21 DOI: 10.1007/S002160050408
G. Pajonk, H. Steffens
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引用次数: 3
Investigation of the synthesis and internal structure of protective oxide layers on high-purity chromium with SIMS scanning techniques 用SIMS扫描技术研究高纯铬表面氧化保护层的合成及其内部结构
Fresenius' Journal of Analytical Chemistry Pub Date : 1997-05-21 DOI: 10.1007/S002160050392
C. Brunner, H. Hutter, K. Piplits, P. Wilhartitz, R. Stroosnijder, M. Grasserbauer
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引用次数: 6
Characterisation of pure or coated metal surfaces with streaming potential measurements 用流动电位测量纯金属或涂覆金属表面的特性
Fresenius' Journal of Analytical Chemistry Pub Date : 1997-05-21 DOI: 10.1007/S002160050399
C. Bellmann, A. Opfermann, H. Jacobasch, H. Adler
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引用次数: 12
Investigation of water diffusion into quartz using ion beam analysis techniques 用离子束分析技术研究水在石英中的扩散
Fresenius' Journal of Analytical Chemistry Pub Date : 1997-05-21 DOI: 10.1007/S002160050388
O. Dersch, A. Zouine, F. Rauch, J. Ericson
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引用次数: 12
Characterization of interfaces of alumina – high alloyed steels by SST and AES depth profiling 用SST和AES深度分析表征氧化铝高合金钢的界面
Fresenius' Journal of Analytical Chemistry Pub Date : 1997-05-21 DOI: 10.1007/S002160050417
A. van den Berg, M. Smithers, V. Haanappel
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引用次数: 0
Characterization of rhenium-silicon thin films 铼硅薄膜的表征
Fresenius' Journal of Analytical Chemistry Pub Date : 1997-05-21 DOI: 10.1007/S002160050419
J. Thomas, J. Schumann, W. Pitschke
{"title":"Characterization of rhenium-silicon thin films","authors":"J. Thomas, J. Schumann, W. Pitschke","doi":"10.1007/S002160050419","DOIUrl":"https://doi.org/10.1007/S002160050419","url":null,"abstract":"","PeriodicalId":12375,"journal":{"name":"Fresenius' Journal of Analytical Chemistry","volume":"48 1","pages":"325-328"},"PeriodicalIF":0.0,"publicationDate":"1997-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82315849","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Low energy ion bombardment of Ti and TiNx films Ti和TiNx薄膜的低能离子轰击
Fresenius' Journal of Analytical Chemistry Pub Date : 1997-05-21 DOI: 10.1007/S002160050405
C. Eggs, H. Wulff, R. Hippler
{"title":"Low energy ion bombardment of Ti and TiNx films","authors":"C. Eggs, H. Wulff, R. Hippler","doi":"10.1007/S002160050405","DOIUrl":"https://doi.org/10.1007/S002160050405","url":null,"abstract":"","PeriodicalId":12375,"journal":{"name":"Fresenius' Journal of Analytical Chemistry","volume":"41 22 1","pages":"275-277"},"PeriodicalIF":0.0,"publicationDate":"1997-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89264761","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Density and Young’s modulus of thin TiO2 films TiO2薄膜的密度和杨氏模量
Fresenius' Journal of Analytical Chemistry Pub Date : 1997-05-21 DOI: 10.1007/S002160050409
O. Anderson, C. Ottermann, R. Kuschnereit, P. Hess, K. Bange
{"title":"Density and Young’s modulus of thin TiO2 films","authors":"O. Anderson, C. Ottermann, R. Kuschnereit, P. Hess, K. Bange","doi":"10.1007/S002160050409","DOIUrl":"https://doi.org/10.1007/S002160050409","url":null,"abstract":"","PeriodicalId":12375,"journal":{"name":"Fresenius' Journal of Analytical Chemistry","volume":"28 1","pages":"290-293"},"PeriodicalIF":0.0,"publicationDate":"1997-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"74594007","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 33
Examination of organosilicon impregnating mixtures by static SIMS and diffuse reflectance FT-IR 用静态SIMS和漫反射FT-IR检测有机硅浸渍混合物
Fresenius' Journal of Analytical Chemistry Pub Date : 1997-05-21 DOI: 10.1007/S002160050404
C. Bruchertseifer, K. Stoppek-Langner, J. Grobe, M. Deimel, A. Benninghoven
{"title":"Examination of organosilicon impregnating mixtures by static SIMS and diffuse reflectance FT-IR","authors":"C. Bruchertseifer, K. Stoppek-Langner, J. Grobe, M. Deimel, A. Benninghoven","doi":"10.1007/S002160050404","DOIUrl":"https://doi.org/10.1007/S002160050404","url":null,"abstract":"","PeriodicalId":12375,"journal":{"name":"Fresenius' Journal of Analytical Chemistry","volume":"7 1","pages":"273-274"},"PeriodicalIF":0.0,"publicationDate":"1997-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73472261","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
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