Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.)最新文献_第7页

Nano-fabrication dependent quality factor in photonic crystal slab biosensors 光子晶体板型生物传感器中纳米制造依赖的质量因子

Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.) Pub Date : 2010-10-01 DOI: 10.1109/ISOT.2010.5687333

H. Akhavan, M. El-Beheiry, O. Levi

{"title":"Nano-fabrication dependent quality factor in photonic crystal slab biosensors","authors":"H. Akhavan, M. El-Beheiry, O. Levi","doi":"10.1109/ISOT.2010.5687333","DOIUrl":"https://doi.org/10.1109/ISOT.2010.5687333","url":null,"abstract":"Photonic crystal slabs (PCS) are attractive for label-fr ee optical bio-sensors inside micro-fluidic portable diagnostic systems due to their high sensitivity and easy coupling to external radiation. Obtaining high quality factor (Q) values for the guided resonances in these index-of-refraction PCS biosensors is crucial for high sensitivity. Non-ideal fabrication of the hole array in the PCS due to electron beam writing, pattern transfer, and reactive ion etching (RIE) steps will result in imperfect circular hole shapes, and non vertical hole profile that can reduce the Q values. We evaluate the effect of nano-fabrication on the quality factor of guided resonances in PCS biosensors and investigate the potential limitations on sensitivity with current fabrication technologies in a realistic PCS biosensor due to fabrication errors. Spectral broadening of the guided resonances (lower Q values) is found for the fundamental guided resonance modes but no significant changes were observed in higher order guided resonances. These fin dings are consistent with reduced bio-sensing sensitivity in higher order modes due to reduced field overlap with the analyte in side the micro-fluidic channels.","PeriodicalId":91154,"journal":{"name":"Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.)","volume":"142 1","pages":"1-4"},"PeriodicalIF":0.0,"publicationDate":"2010-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"87566958","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 5

Resolution enhancement by time-multiplexed acquisition of sub-pixel shifted images employing a Spatial Light Modulator 利用空间光调制器对亚像素位移图像进行时复用采集以增强分辨率

Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.) Pub Date : 2010-10-01 DOI: 10.1109/ISOT.2010.5687353

Alexander Hildebrand, C. Falldorf, C. von Kopylow, R. Bergmann

{"title":"Resolution enhancement by time-multiplexed acquisition of sub-pixel shifted images employing a Spatial Light Modulator","authors":"Alexander Hildebrand, C. Falldorf, C. von Kopylow, R. Bergmann","doi":"10.1109/ISOT.2010.5687353","DOIUrl":"https://doi.org/10.1109/ISOT.2010.5687353","url":null,"abstract":"We present an opto-electronic sub-pixel shifting method for resolution enhancement in monochromatic imaging. It is based on a Spatial Light Modulator (SLM) in the Fourier domain of a 4f-configuration. The SLM is used to modulate the incident light with the transfer function of a lateral subpixel shift. Therefore, a set of laterally shifted representations of the wave field incident on the 4f-setup can be generated in the corresponding camera domain. By numerically combining these images a high resolution image can be calculated. The use of an SLM as a wave field shifting device promises fast and flexible subpixel shifting with a high reproducibility. Exemplarily the method will be introduced for the case of monochromatic imaging, although it can easily be adopted to holography, phase shifting interferometry or other optical measurement techniques. The theoretical analysis includes modeling of the sampling process and the resolution enhancement approach as well as the effects associated with using an SLM as the shifting device. Furthermore the technical limits arising from the pixel pitch and pixel size of the sensor and the SLM are investigated. Finally the feasibility of the presented method is verified experimentally.","PeriodicalId":91154,"journal":{"name":"Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.)","volume":"42 1","pages":"1-6"},"PeriodicalIF":0.0,"publicationDate":"2010-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"76175679","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 5

Modeling stereo measurement error by considering camera vibration 考虑摄像机振动的立体测量误差建模

Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.) Pub Date : 2010-10-01 DOI: 10.1109/ISOT.2010.5687347

S. Okazaki, Takayuki Tanaka, S. Kaneko, H. Takauji, N. Kochi, M. Yamada

{"title":"Modeling stereo measurement error by considering camera vibration","authors":"S. Okazaki, Takayuki Tanaka, S. Kaneko, H. Takauji, N. Kochi, M. Yamada","doi":"10.1109/ISOT.2010.5687347","DOIUrl":"https://doi.org/10.1109/ISOT.2010.5687347","url":null,"abstract":"Camera vibration in recorded video is a problem with both handheld and stationary devices that vibrate due to wind and other external forces. To facilitate the development of a robust stereo system that is immune to such camera vibration, this study aims to study establishes an error model for a stereo measurement system by considering camera vibration. In stereo measurements, we approximate the distribution of measurement error in images as a uniform distribution. Given this approximation, parameters of the distribution of measurement error are mean value μ and standard deviation σ, whereas amplitude A and frequency F are parameters of camera vibration. To verify the relationship between these parameters, we performed experiments using a vibration testing system. Results indicated that the vibration did not affect the mean value μ. We also found a positive correlation between standard deviation σ and amplitude A as well as a negative correlation between standard deviation σ and frequency F. Based on these findings, we estimate the parameters of measurement error by the camera vibration parameters and establish our proposed error model.","PeriodicalId":91154,"journal":{"name":"Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.)","volume":"74 1","pages":"1-6"},"PeriodicalIF":0.0,"publicationDate":"2010-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79699516","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2

Adaptive color enhancement based on multi-scaled Retinex using local contrast of the input image 基于多尺度Retinex的自适应色彩增强，利用输入图像的局部对比度

Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.) Pub Date : 2010-10-01 DOI: 10.1109/ISOT.2010.5687343

In-Su Jang, Ho-Gun Ha, Tae-Hyoung Lee, Yeong-Ho Ha

{"title":"Adaptive color enhancement based on multi-scaled Retinex using local contrast of the input image","authors":"In-Su Jang, Ho-Gun Ha, Tae-Hyoung Lee, Yeong-Ho Ha","doi":"10.1109/ISOT.2010.5687343","DOIUrl":"https://doi.org/10.1109/ISOT.2010.5687343","url":null,"abstract":"Methods of contrast enhancement and color correction are currently among the most active fields in imaging research. The tone curve or histogram of an image is generally used to improve contrast and detail, even though this is often unsatisfactory because the intensity and chromaticity of the illumination vary with geometric position. This has led to the development of the multi-scaled Retinex algorithm in which the in fluence of non-uniform illumination is reduced by partitioning the original image using local average images that are estimated ba sed on Gaussian filtering. However, this algorithm produces color distortion because of the dominant chromaticity of the illumination. To solve this problem, this study introduces a new color correction method for digital images inspired by the multi-scale Retinex algorithm. The method includes selecting appropriate parameters for the Gaussian filters because this is the most important factor in reducing the artifacts introduced by the conventional multi-scale Retinex algorithm. Measures of visual contrast and halo are used to check the condition of artifacts for different values of the Gaussian parameters. The illuminant component is estimated to correct its chromaticity. A saturation compensation method based on preserving the chroma ratio is also used to compensate for the possible lack of saturation resulting from the modified multi-scale Retinex model.","PeriodicalId":91154,"journal":{"name":"Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.)","volume":"76 1","pages":"1-6"},"PeriodicalIF":0.0,"publicationDate":"2010-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75945653","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 29

Research on the model of spectral BRDF for space target surface material 空间目标表面材料光谱BRDF模型研究

Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.) Pub Date : 2010-10-01 DOI: 10.1109/ISOT.2010.5687369

Cheng-ming Sun, Yan Yuan, Xiu-bao Zhang, Qian Wang, Zhiliang Zhou

引用次数: 5

Measurement and compensation of deformations in coordinate measurement arm 三坐标测量臂的变形测量与补偿

Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.) Pub Date : 2010-10-01 DOI: 10.1109/ISOT.2010.5687319

M. Vrhovec, I. Kovac, M. Munih

引用次数: 9

A dual wafer prealigner and a multiple level structure 一种双晶圆预对准器及多层结构

Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.) Pub Date : 2010-10-01 DOI: 10.1109/ISOT.2010.5687323

HyungTae Kim, Sungbok Kang, Youngjune Cho

引用次数: 0

Liquid crystal lens with two divided and double circularly hole-patterned electrodes 液晶透镜具有两个分割和双圆孔图案电极

Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.) Pub Date : 2010-10-01 DOI: 10.1109/ISOT.2010.5687393

M. Kawamura, H. Goto

引用次数: 3

Saturation avoidance by adaptive fringe projection in phase-shifting 3D surface-shape measurement 相移三维面形测量中自适应条纹投影的饱和避免

Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.) Pub Date : 2010-10-01 DOI: 10.1109/ISOT.2010.5687390

C. Waddington, J. Kofman

{"title":"Saturation avoidance by adaptive fringe projection in phase-shifting 3D surface-shape measurement","authors":"C. Waddington, J. Kofman","doi":"10.1109/ISOT.2010.5687390","DOIUrl":"https://doi.org/10.1109/ISOT.2010.5687390","url":null,"abstract":"Fringe-pattern projection systems are capable of non-contacting 3D surface full-field measurement with high accuracy. However, the systems are prone to intensity saturation and low signal-to-noise ratio (SNR) when measuring objects with a large range of reflectivity across the surface. Intensity saturation occurs when the light intensity directed to the camera exceeds the maximum intensity quantization level. A low SNR occurs when there is a low intensity modulation compared to the amount of noise in the image. Saturation and low SNR can result in significant measurement error. This paper presents a method for saturation avoidance during object-surface measurement, by adaptively adjusting the projected fringe-pattern intensities, through the maximum input gray level (MIGL). A high SNR can be maintained while avoiding saturation by combining the intensities from phase-shifted images captured at different MIGL, into a set of composite phase-shifted images. In measurement of a black and white checkerboard at different depths, the newly developed method reduced errors by an average 0.25 mm compared to the highest accuracy measurement using a uniform MIGL.","PeriodicalId":91154,"journal":{"name":"Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.)","volume":"42 1","pages":"1-4"},"PeriodicalIF":0.0,"publicationDate":"2010-10-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"77640994","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 33

Thermal diffusion simulations for photothermal oscillators 光热振荡器的热扩散模拟

Optomechatronic Technologies (ISOT), 2010 International Symposium on : 25-27 Oct. 2010 : [Toronto, ON]. International Symposium on Optomechatronic Technologies (2010 : Toronto, Ont.) Pub Date : 2010-10-01 DOI: 10.1109/ISOT.2010.5687335

Kotomi Kawakami, H. Okamura, A. Mitani

引用次数: 0