Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII最新文献_第6页

Versatile multilayered all-polymer metasurfaces on optical fiber apex 光纤顶点上的多功能多层全聚合物元表面

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII Pub Date : 2024-03-13 DOI: 10.1117/12.3002285

Moohyuk Kim, Nu-Ri Park, Aran Yu, Jin Tae Kim, Minseok Jeon, Seung-Woo Jeon, Sang-Wook Han, Myung-Ki Kim

引用次数: 0

Advanced illumination quality improvement of micro lens array diffuser by randomizing shape error 通过随机化形状误差提高微型透镜阵列扩散器的先进照明质量

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII Pub Date : 2024-03-13 DOI: 10.1117/12.3001192

Toshiki Hamatani, Yukinobu Nishio, Tomohito Kuwagaito, Seiichiro Kitagawa

引用次数: 0

Enhancement of simulation and design for ideal overlay with target asymmetry using COMSOL multiphysics 利用 COMSOL 多物理场增强对目标不对称的理想叠加的模拟和设计

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII Pub Date : 2024-03-13 DOI: 10.1117/12.3001644

Doogyu Lee, H. Baac

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Non-destructive multi-parameter investigation of nanoimprinted structures 纳米压印结构的非破坏性多参数研究

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII Pub Date : 2024-03-13 DOI: 10.1117/12.2692650

Selina Burkert, Lukas Schwörer, Tim Schubert, David Stein, Andreas Heinrich

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Photoactivated reversible deactivation radical polymerization for 3D direct laser writing 用于三维直接激光写入的光激活可逆失活自由基聚合技术

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII Pub Date : 2024-03-13 DOI: 10.1117/12.3000219

Arnaud Spangenberg

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Ultralight, nontoxic, energy-saving plasmonic structural color paint 超轻、无毒、节能的等离子结构色漆

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII Pub Date : 2024-03-13 DOI: 10.1117/12.3004191

Pablo Cencillo‐Abad, Debashis Chanda

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Roll-to-roll tomographic volumetric additive manufacturing for continuous production of microstructures on long flexible substrates 用于在长柔性基底上连续生产微结构的卷对卷层析体积增材制造技术

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII Pub Date : 2024-02-12 DOI: 10.1117/12.3008445

J. Toombs, C. Li, H. Taylor

{"title":"Roll-to-roll tomographic volumetric additive manufacturing for continuous production of microstructures on long flexible substrates","authors":"J. Toombs, C. Li, H. Taylor","doi":"10.1117/12.3008445","DOIUrl":"https://doi.org/10.1117/12.3008445","url":null,"abstract":"Tomographic volumetric additive manufacturing (VAM) has proven viable to 3D-print diverse materials including polymer, glass, ceramic, and hydrogel at the centimeter scale. As tomographic VAM is extended to the microscale, many of its advantages are translatable, including smooth layer-less surfaces, support-free and shear force-free printing, material flexibility, and speed of production. However, as we shrink the patterning scale, the depth of field shrinks much more rapidly and does so roughly with the square of the patterning scale. Consequently, the build volume is substantially reduced as the numerical aperture of the system is increased. Additionally, microscale tomographic VAM is currently limited to batch production, i.e., the photoresist container must be exchanged after the exposure phase is completed. In this work, we introduce roll-to-roll (R2R) tomographic VAM in which these limitations are addressed by unwrapping the precursor material into a film enabling continuous production of microstructures with theoretically unlimited length. We elaborate the design of a focus-multiplexed projection optical system that can scan the projection focal plane axially in sync with the refresh cycle of a digital micromirror device. We describe the process of iteratively optimizing and segmenting sinograms to produce long aperiodic microstructures with the focus tunable optical system. Furthermore, we formulate a thermally reversible organogel photoresist which is deposited onto the substrate in films multiple millimeters in thickness with slot-die coating. Finally, we present progress on printing with the R2R tomographic VAM system.","PeriodicalId":517870,"journal":{"name":"Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII","volume":"200 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-02-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140458546","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Multi-beam phase mask optimization for holographic volumetric additive manufacturing 全息体积增材制造的多光束相位掩模优化

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII Pub Date : 2024-01-28 DOI: 10.1117/12.3023424

C. Li, J. Toombs, Vivek Subramanian, H. Taylor

{"title":"Multi-beam phase mask optimization for holographic volumetric additive manufacturing","authors":"C. Li, J. Toombs, Vivek Subramanian, H. Taylor","doi":"10.1117/12.3023424","DOIUrl":"https://doi.org/10.1117/12.3023424","url":null,"abstract":"The capability of holography to project three-dimensional (3D) images and correct for aberrations offers much potential to enhance optical control in light-based 3D printing. Notably, multi-beam multi-wavelength holographic systems represent an important development direction for advanced volumetric additive manufacturing (VAM). Nonetheless, searching for the optimal 3D holographic projection is a challenging ill-posed problem due to the physical constraints involved. This work introduces an optimization framework to search for the optimal set of projection parameters, namely phase modulation values and amplitudes, for multi-beam holographic lithography. The proposed framework is more general than classical phase retrieval algorithms in the sense that it can simultaneously optimize multiple holographic beams and model the coupled non-linear material response created by co-illumination of the holograms. The framework incorporates efficient methods to evaluate holographic light fields, resample quantities across coordinate grids, and compute the coupled exposure effect. The efficacy of this optimization method is tested for a variety of setup configurations that involve multi-wavelength illumination, two-photon absorption, and time-multiplexed scanning beam. A special test case of holo-tomographic patterning optimized 64 holograms simultaneously and achieved the lowest error among all demonstrations. This variant of tomographic VAM shows promises for achieving high-contrast microscale fabrication. All testing results indicate that a fully coupled optimization offers superior solutions relative to a decoupled optimization approach.","PeriodicalId":517870,"journal":{"name":"Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII","volume":"322 4","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-01-28","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140491211","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

Single-photon-assisted two-photon polymerization 单光子辅助双光子聚合反应

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII Pub Date : 2024-01-22 DOI: 10.1117/12.3002287

Buse Unlu, M. I. Álvarez-Castaño, Antoine Boniface, Ye Pu, Christophe Moser

{"title":"Single-photon-assisted two-photon polymerization","authors":"Buse Unlu, M. I. Álvarez-Castaño, Antoine Boniface, Ye Pu, Christophe Moser","doi":"10.1117/12.3002287","DOIUrl":"https://doi.org/10.1117/12.3002287","url":null,"abstract":"Light-based additive manufacturing (AM) has revolutionized the fabrication of complex three-dimensional (3D) objects offering a cost-effective and high-speed alternative to traditional machining. One-photon polymerization is a key process in this advancement, standing out for rapid printing time, albeit with limited resolution. Two-photon polymerization (2PP) empowers AM with unprecedented resolution but is accompanied by a tradeoff of prolonged printing times. We propose combining the single-photon absorption (1PA) and 2PP to benefit from the dual capabilities, allowing for faster printing while maintaining high resolution and improved depth sectioning, respectively. In this study, we employ a blue light source to pre-excite a photocurable resin by 1PA followed by a precisely focused femtosecond (fs) beam to provide the missing energy necessary to reach the polymerization threshold to solidify the resin through two-photon absorption. First, we investigate the impact of pre-sensitization by blue light illumination on 2PP and demonstrate one order of magnitude faster printing time for a voxel size of 150 nm as compared to the same voxel size printed by 2PP only. Then, we build a custom 2PP printer utilizing blue light sensitization in a light-sheet mode and demonstrate successful 3D prints.","PeriodicalId":517870,"journal":{"name":"Advanced Fabrication Technologies for Micro/Nano Optics and Photonics XVII","volume":"64 3","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-01-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140500402","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0