H. Suh, L. Verstraete, Julie Van Bel, P. Bézard, G. Mannaert, Jae Uk Lee, Shouhua Wang, I. Pollentier, Ashish Rathore
{"title":"Exploring the synergy between EUV lithography and directed self-assembly","authors":"H. Suh, L. Verstraete, Julie Van Bel, P. Bézard, G. Mannaert, Jae Uk Lee, Shouhua Wang, I. Pollentier, Ashish Rathore","doi":"10.1117/12.2622565","DOIUrl":"https://doi.org/10.1117/12.2622565","url":null,"abstract":"","PeriodicalId":448143,"journal":{"name":"Novel Patterning Technologies 2022","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-06-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121181844","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}