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Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)最新文献

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Investigation of 2-dimensional charge distribution on dielectric surface in vacuum by real-time measurement technique 真空介质表面二维电荷分布的实时测量研究
Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041) Pub Date : 2000-09-18 DOI: 10.1109/DEIV.2000.877264
K. Kato, S. Ito, Y. Yamano, Y. Hakamata, H. Okubo
{"title":"Investigation of 2-dimensional charge distribution on dielectric surface in vacuum by real-time measurement technique","authors":"K. Kato, S. Ito, Y. Yamano, Y. Hakamata, H. Okubo","doi":"10.1109/DEIV.2000.877264","DOIUrl":"https://doi.org/10.1109/DEIV.2000.877264","url":null,"abstract":"For the establishment of the vacuum insulation technique, the electrical insulation characteristics under the existence of the solid insulator need to be given attention. In particular, a study of a charging mechanism on the solid surface in vacuum is very important. For this reason, we measured a 2-dimensional surface charge distribution using a real-time measurement technique. Under electron beam irradiation to the dielectric surface, we measured the time-transition of surface charge accumulation by electrostatic probes. By varying the electron beam current and the beam energy, we investigated the dependence of such parameters on the charging process. From the measurement results, we clarified that such a measurement technique allowed us to obtain the time varying 2D charging characteristics, which resulted in the clarification of the charging mechanism caused by electron irradiation in vacuum.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115846864","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High field insulation relevant to vacuum microelectronic devices 与真空微电子器件相关的高场绝缘
Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041) Pub Date : 2000-09-18 DOI: 10.1109/DEIV.2000.879095
T. Sudarshan, Xianyun Ma, P. Muzykov
{"title":"High field insulation relevant to vacuum microelectronic devices","authors":"T. Sudarshan, Xianyun Ma, P. Muzykov","doi":"10.1109/DEIV.2000.879095","DOIUrl":"https://doi.org/10.1109/DEIV.2000.879095","url":null,"abstract":"This paper briefly introduces the authors' recent results on high field vacuum insulation relevant to vacuum microelectronics. It addresses the key factors that contribute to the failure of the vacuum gap insulation. Approaches to the development of specific solutions to improve the vacuum gap breakdown voltages are presented. Solutions to alleviate the edge breakdown effect in the thin-film vacuum gap and to inhibit the formation of electrical activity in the spacer triple junction area were proven to be very effective in improving the vacuum insulation performance of vacuum microelectronics. The influence of the presence of an electron beam on the plain-vacuum-gap insulation is also reported.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"150 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134106692","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Plasma filtration of vacuum arc droplets 真空电弧液滴的等离子体过滤
Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041) Pub Date : 2000-09-18 DOI: 10.1109/DEIV.2000.879058
P. Shanin, N. Koval, A. V. Kozirev, I. Goncharenko, J. Langner, S. Grigoriev
{"title":"Plasma filtration of vacuum arc droplets","authors":"P. Shanin, N. Koval, A. V. Kozirev, I. Goncharenko, J. Langner, S. Grigoriev","doi":"10.1109/DEIV.2000.879058","DOIUrl":"https://doi.org/10.1109/DEIV.2000.879058","url":null,"abstract":"Theoretical and experimental studies have been performed on the effect of the gas-discharge plasma on the vacuum arc droplet fraction arriving at the sample in plasma-assisted deposition of TiN coatings. It has been shown that the number of droplets on a negatively biased sample decreases four or five times if the droplet flow passes through the plasma of a low-pressure nonself-sustained arc discharge having a higher electron temperature than the plasma of the vacuum arc. Possible mechanisms for the observed plasma filtration of the droplet fraction of a vacuum arc are discussed.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134174443","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
A radial graded solid insulation structure in vacuum 一种径向梯度真空固体绝热结构
Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041) Pub Date : 2000-09-18 DOI: 10.1109/DEIV.2000.879096
Meng Wang, Jian-jun Deng, G. Dai
{"title":"A radial graded solid insulation structure in vacuum","authors":"Meng Wang, Jian-jun Deng, G. Dai","doi":"10.1109/DEIV.2000.879096","DOIUrl":"https://doi.org/10.1109/DEIV.2000.879096","url":null,"abstract":"A radial graded solid insulation structure was designed and applied in 2.4 MeV electron injector. It operates in high vacuum, which is in the order of 10/sup -5/ Torr. The pulsewidth of applied voltage is 90 ns and its magnitude is -1.2 MV. Simulation with ANSYS code was made on the distribution of electric field. A series of fundamental experiments was performed to study characteristics of the solid insulators in vacuum. A detailed investigation has been made about the some important factors which affect the flashover voltage. The theoretical results and some disciplinarian methods in designing of radial insulation system have been obtained.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"62 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131088133","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Present state of the theory of vacuum arcs 真空电弧理论的现状
Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041) Pub Date : 2000-09-18 DOI: 10.1109/DEIV.2000.877276
I. Beilis
{"title":"Present state of the theory of vacuum arcs","authors":"I. Beilis","doi":"10.1109/DEIV.2000.877276","DOIUrl":"https://doi.org/10.1109/DEIV.2000.877276","url":null,"abstract":"The understanding of vacuum arc processes including the cathode and anode phenomena with cold and hot electrodes as well as the processes in interelectrode plasma is presented. In the case of cold electrodes, the current continuity mechanism, the nature of mass loss, spot motion, plasma jet generation in the spots and the cathode potential drop are reviewed. The explosive and gas-dynamical models of cathode spot operation are described. In the case of hot electrodes, the diffuse current continuity mechanism is analyzed. The present state of electrical and plasma characteristics of high current arcs in magnetic fields are discussed.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"73 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131119954","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Electrical conductivity of CuCr alloys [for vacuum switches] CuCr合金的电导率[真空开关用]
Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041) Pub Date : 2000-09-18 DOI: 10.1109/DEIV.2000.879094
Z. Tie, H. Jun-jia, Z. Jiyan
{"title":"Electrical conductivity of CuCr alloys [for vacuum switches]","authors":"Z. Tie, H. Jun-jia, Z. Jiyan","doi":"10.1109/DEIV.2000.879094","DOIUrl":"https://doi.org/10.1109/DEIV.2000.879094","url":null,"abstract":"Based on the resistance theory of metals, the influence of phase structure on the electrical conductivity of CuCr alloys is analyzed. The electrical conductivity is calculated under different phase structure models. By comparison with measurements, the utility of these models are discussed. Some influencing factors on the conductivity of CuCr are summarized. Several ways to improve the electric conductivity of CuCr alloys for vacuum switch applications are presented.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114602699","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
An improved automatic finite element mesh generation for arbitrary multiply connected domains in electric field analysis of vacuum interrupters 真空灭流器电场分析中任意多连通域有限元网格自动生成的改进方法
Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041) Pub Date : 2000-09-18 DOI: 10.1109/DEIV.2000.879043
Wang Shuhong, Jia Shenli, Zhao Luhual, Qiu Jie, Liu Qinfu
{"title":"An improved automatic finite element mesh generation for arbitrary multiply connected domains in electric field analysis of vacuum interrupters","authors":"Wang Shuhong, Jia Shenli, Zhao Luhual, Qiu Jie, Liu Qinfu","doi":"10.1109/DEIV.2000.879043","DOIUrl":"https://doi.org/10.1109/DEIV.2000.879043","url":null,"abstract":"This paper presents an improved fully automatic finite element mesh generation for arbitrary multiply connected domains in vacuum interrupter electric field analysis. This method is based on the advancing front method. It doesn't need to apply the aided lines between the solution domain boundary with the subdomain boundaries and the coherence of the finite elements to the subdomain boundary is satisfied automatically. This method deals with the subdomains directly in mesh processing. The characteristic constraints such as polylines and fixed nodes involved in solution domain are discussed by this method in this paper. Finally, a 110 kV vacuum interrupter is applied by the method. It is shown that the improved mesh method is correct, simple and universal.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117134067","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A nonstationary model for vacuum arcs with refractory hot anode 难熔热阳极真空电弧的非平稳模型
Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041) Pub Date : 2000-09-18 DOI: 10.1109/DEIV.2000.877291
I. Beilis, R. Boxman, S. Goldsmith
{"title":"A nonstationary model for vacuum arcs with refractory hot anode","authors":"I. Beilis, R. Boxman, S. Goldsmith","doi":"10.1109/DEIV.2000.877291","DOIUrl":"https://doi.org/10.1109/DEIV.2000.877291","url":null,"abstract":"A new form of arc, termed the refractory hot anode vacuum arc (HRAVA), was analyzed. The HRAVA has a thermally isolated anode and a cooled cathode. The arc operates initially as a multi-cathode-spot vacuum arc, and material from the cathode spot jets deposits on the anode. During a transition stage, the arc heats the anode and evaporates the material deposited thereon, forming an anode plasma plume. A system of time-dependent equations were formulated and solved for the heat flux from the plasma to the anode surface, heat conduction within the anode, electron energy balance and heavy particle conservation in the anode plasma. The calculations show that the plasma electron temperature decreases while the anode temperature and plasma density increase with time. The model results agree well with previously measured data.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"18 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116335714","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Control of charge-up on insulating glass in vacuum due to plasma processing 真空中等离子体处理对中空玻璃充放电的控制
Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041) Pub Date : 2000-09-18 DOI: 10.1109/DEIV.2000.879097
H. Fujii
{"title":"Control of charge-up on insulating glass in vacuum due to plasma processing","authors":"H. Fujii","doi":"10.1109/DEIV.2000.879097","DOIUrl":"https://doi.org/10.1109/DEIV.2000.879097","url":null,"abstract":"In order to control charge-up on insulating glasses used for high-voltage vacuum equipment, H/sub 2/ plasma processing on the glass surface was studied. Borosilicate glass plates were used as test samples. The glasses were exposed to H/sub 2/ plasma produced by AC (60 Hz) voltage application. The surface resistivity of the glass was deceased with H/sub 2/ plasma processing time. By H/sub 2/ plasma exposure for 20 minutes, the surface resistivity was reduced from 10/sup 17/ /spl Omega/ to 10/sup 12/ /spl Omega/. Due to the reduction of the surface resistivity, charge-up of the glass irradiated by electron beam can be controlled to the level not to cause surface flashover.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123688556","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Effect of the magnetic field on the anode spot formation in the vacuum arc 磁场对真空电弧中阳极斑点形成的影响
Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041) Pub Date : 2000-09-18 DOI: 10.1109/DEIV.2000.877311
K. Ulyanov, V. Fedorov, Ye.F. Prozorov
{"title":"Effect of the magnetic field on the anode spot formation in the vacuum arc","authors":"K. Ulyanov, V. Fedorov, Ye.F. Prozorov","doi":"10.1109/DEIV.2000.877311","DOIUrl":"https://doi.org/10.1109/DEIV.2000.877311","url":null,"abstract":"The aim of the work is to obtain quantitative experimental data on the process of suppressing the anode spot of a vacuum arc by a longitudinal magnetic field and to compare them with theoretical calculations. In addition to this, the authors designed a system of impulse longitudinal magnetic field which exceeds, by many times, the inherent magnetic field of the arc current at a maximum current value.","PeriodicalId":429452,"journal":{"name":"Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2000-09-18","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125781586","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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