真空中等离子体处理对中空玻璃充放电的控制

Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041) Pub Date : 2000-09-18 DOI:10.1109/DEIV.2000.879097

H. Fujii

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引用次数: 0

摘要

为了控制高压真空设备用中空玻璃的充放电，研究了H/sub - 2/等离子体对玻璃表面的处理。以硼硅酸盐玻璃板为试样。将玻璃暴露在交流(60hz)电压产生的H/sub /等离子体中。玻璃的表面电阻率随H/sub /等离子体处理时间的延长而降低。通过H/sub / 2/等离子体照射20分钟，表面电阻率从10/sup 17/ /spl Omega/降至10/sup 12/ /spl Omega/。由于表面电阻率的降低，电子束辐照玻璃的充电可以控制在不引起表面闪络的水平。

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Control of charge-up on insulating glass in vacuum due to plasma processing

In order to control charge-up on insulating glasses used for high-voltage vacuum equipment, H/sub 2/ plasma processing on the glass surface was studied. Borosilicate glass plates were used as test samples. The glasses were exposed to H/sub 2/ plasma produced by AC (60 Hz) voltage application. The surface resistivity of the glass was deceased with H/sub 2/ plasma processing time. By H/sub 2/ plasma exposure for 20 minutes, the surface resistivity was reduced from 10/sup 17/ /spl Omega/ to 10/sup 12/ /spl Omega/. Due to the reduction of the surface resistivity, charge-up of the glass irradiated by electron beam can be controlled to the level not to cause surface flashover.

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Proceedings ISDEIV. 19th International Symposium on Discharges and Electrical Insulation in Vacuum (Cat. No.00CH37041)

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