Microscopy Microanalysis Microstructures最新文献

{"title":"Characterization of W Films on Si and SiO2/Si Substrates by X-Ray Diffraction, AFM and Blister Test Adhesion Measurements","authors":"A. Bosseboeuf, M. Dupeux, M. Boutry, T. Bourouina, D. Bouchier, D. Débarre","doi":"10.1051/MMM:0199700804-5026100","DOIUrl":"https://doi.org/10.1051/MMM:0199700804-5026100","url":null,"abstract":"Contrary to most classical adhesion test, the blister test provides quantitative adhesion energy measurements. We demonstrate its application to 1 03BCm thick W films in tensile stress state deposited by xenon DC magnetron sputtering on PECVD/Si(100) substrates. The W films surface morphology, structure and residual stress were also characterized by atomic force microscopy, X-ray diffraction and substrate curvature measurements as function of the deposition pressure. Films characteristics are compared with those of W films deposited directly","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"14 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122239081","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Quantification de l'analyse en profondeur par spectrométrie d'électrons Auger et pulvérisation ionique : caractérisation des interfaces des films multicouches Cu–Co","authors":"F. Basile, Jean Bergner, C. Bombart, P. Nallet, E. Chassaing, G. Lorang","doi":"10.1051/MMM:1997123","DOIUrl":"https://doi.org/10.1051/MMM:1997123","url":null,"abstract":"2014 Depth profiling analysis by AES combined with ion sputtering is employed for the characterization of Co2014Cu multilayer interfaces prepared either by RF sputter deposition or by electrodeposition. Depth concentration profiles are derived from Auger profiles with appropriate corrections of elemental sensitivities, escape lengths of Auger electrons and from changes of the sputter rate occuring at interfaces with composition; they are expressed as atomic densities which can provide significant atomic balances, film thicknesses and depth resolution measurements. Microroughness induced by sputtering is widely improved by the Zalar rotation method during etching, so the remaining contribution (7201410 nm) to the interface broadening mainly consists with atomic mixing whereas important resolution losses (0394Z > 20 nm) observed in electrodeposited layers as well as in sputtered materials at Co~Cu interfaces can be attributed to the sample preparation rather to the sputtering process itself. Résumé. 2014 Les interfaces de matériaux multicouches Cu-Co préparés par pulvérisation cathodique ou par électrodéposition sont caractérisées analytiquement par spectrométrie d’électrons Auger (AES) en combinaison avec l’abrasion ionique. La microrugosité induite par le bombardement d’ions est minimisée par la méthode de rotation \"Zalar\" des échantillons. L’approche quantitative utilisée prend en compte les sensibilités élémentaires, corrige les profils Auger de la profondeur d’échappement des électrons Auger et de l’évolution de la vitesse d’érosion avec la composition pour conduire aux profils de concentration sur lesquels est mesurée la résolution en profondeur aux interfaces 0394Z. La largeur des interfaces (0394Z = 7201410 nm) peut être alors globalement attribuée au mixage ionique d’atomes. Ainsi les pertes importantes de résolution (0394Z > 20 nm) observées à certaines interfaces (Co~Cu) paraissent imputables aux conditions d’élaboration de ces matériaux plutôt qu’aux effets induits par le bombardement d’ions. Microsc. Microanal. Microstruct. AUGUST/OCTOBER 1997, PAGE 301","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"31 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130475056","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Mechanical Properties of Optical Dielectric Thin Films Deposited by the Ion Plating Technique","authors":"C. Mahodaux, H. Rigneault, H. Giovannini, L. Escoubas, Paul Morreti","doi":"10.1051/MMM:1997120","DOIUrl":"https://doi.org/10.1051/MMM:1997120","url":null,"abstract":"Stress in thin films deposited by Reactive Low-Voltage Ion Plating (RLVIP) is studied in air and at room temperature. A multilayer stack, composed of tantalum pentoxide and silicon dioxide layers, is considered and the interactions layer to layer turn out to have no effect as regards to the final bending. The evolutions of plate bending after annealing show the possibility to reduce the stress as well as the absorption for tantalum pentoxide thin films. Finally, ion implantation, with ions such He+ or Xe+ accelerated at energy in the MeV range, proves to be also a way to vary and reduce the stress in thin films.","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129028220","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Microanalyse nucléaire d'aciers nitrurés","authors":"P. Vigier, C. Iacob, D. David","doi":"10.1051/MMM:1997124","DOIUrl":"https://doi.org/10.1051/MMM:1997124","url":null,"abstract":"","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"124 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124627461","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Depth Profiles of Al/Mn/Si Multilayers","authors":"C. Hombourger, P. Jonnard, C. Bonnelle, E. Beauprez, M. Spirckel, B. Feltz, D. Boutard, J. Gallien","doi":"10.1051/MMM:1997122","DOIUrl":"https://doi.org/10.1051/MMM:1997122","url":null,"abstract":"An electron scattering model called IntriX associated to electron X-ray emission spectrometry (EXES) at high resolution is tested to characterize stratified samples. The ability of the model to simulate the X-ray intensity emitted by a surface layer and a buried layer in film/substrate systems is illustrated. The characterization of Al/Mn/Si multilayers by means of non destructive techniques (electron probe microanalysis (EPMA), Rutherford back scattering (RBS)) have been performed comparatively to the EXES measurements. The potentialities of the IntriX model combined to EXES to predict thicknesses is established by comparison with EPMA and RBS results.","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"4 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127270377","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Stress evolution under neutron irradiation of NiC/Ti supermirrors","authors":"Kalyana N'Guy-Maréchal, A. Menelle, P. Gergaud, K. A. Usta","doi":"10.1051/MMM:1997100","DOIUrl":"https://doi.org/10.1051/MMM:1997100","url":null,"abstract":"2014 We present here the stress evolution under thermal neutrons irradiation of NiC/Ti multilayers used in supermirror neutron guides. After irradiation, titanium undergoes a change of structure. Stresses in nickel layers have been determined: it is shown that the evolution under irradiation depends on the deposition process. Microsc. Microanal. Microstruct. 8 AUGUST/OCTOBER 1997, PAGE 239","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116593416","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Book review: Atom-Probe Field Microscopy. M.K. Miller, A. Cerezo, M.G. Hetherington and G.D.W Smith Clarendon Press, Oxford (1996) 500 pages, ISBN 0 19 851 387 9","authors":"D. Blavette","doi":"10.1051/MMM:0199700803022700","DOIUrl":"https://doi.org/10.1051/MMM:0199700803022700","url":null,"abstract":"","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"17 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125289005","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"An Incommensurate Reconstruction Studied with Scanning Tunnelling Microscopy and Surface X-Ray Diffraction","authors":"B. Aufray, M. Göthelid, C. Mottet, E. Landemark, G. Falkenberg, L. Lottermoser, L. Seehofer, R. Johnson","doi":"10.1051/MMM:1997116","DOIUrl":"https://doi.org/10.1051/MMM:1997116","url":null,"abstract":"","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129282580","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Application of the Convergent Beam Imaging (CBIM) Technique to the Analysis of Crystal Defects","authors":"J. Morniroli, P. Cordier, E. V. Cappellen, J. Zuo, J. Spence","doi":"10.1051/MMM:1997114","DOIUrl":"https://doi.org/10.1051/MMM:1997114","url":null,"abstract":"2014 It is shown how the technique of Convergent Beam IMaging (CBIM), proposed by Humpreys et al. in 1988, can be useful for the analysis of crystal defects such as dislocations in Garnet. It is also shown how the original technique can be greatly improved by using an objective aperture, a very small spot size and an energy filter. With these experimental conditions, the quality of the CBIM patterns is nearly as good as the quality of LACBED patterns, with which they are compared. Microsc. Microanal. Microstruct. 8 (1997) 187-202 JUNE 1997, PAGE","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"112 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122003584","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"An Electrochemical-AFM Study of the Initiation of the Pitting Corrosion of a Martensitic Stainless Steel","authors":"Isabelle Reynaud-Laporte, M. Vayer, J. Kauffmann, R. Erre","doi":"10.1051/MMM:1997117","DOIUrl":"https://doi.org/10.1051/MMM:1997117","url":null,"abstract":"","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129715835","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}