Microscopy Microanalysis Microstructures最新文献

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Bimetallic PdCu and PdCu$_3$ Particles Prepared by Wet Impregnation-HRTEM Study of the Structure and the Interface with the MgO Substrate 湿浸渍- hrtem法制备双金属PdCu和PdCu$_3$颗粒的结构及与MgO衬底界面的研究
Microscopy Microanalysis Microstructures Pub Date : 1997-12-01 DOI: 10.1051/MMM:1997129
S. Giorgio, C. Henry
{"title":"Bimetallic PdCu and PdCu$_3$ Particles Prepared by Wet Impregnation-HRTEM Study of the Structure and the Interface with the MgO Substrate","authors":"S. Giorgio, C. Henry","doi":"10.1051/MMM:1997129","DOIUrl":"https://doi.org/10.1051/MMM:1997129","url":null,"abstract":"Bimetallic particles of PdCu and PdCu3 are prepared by decomposition of orga- nometallic compounds on MgO micro-cubes. During the annealing between 350 and 400 °C, in reducing atmosphere, PdCu particles grow with the fcc structure, without defined shape. The particles epitaxially (001) oriented on MgO are dilated and accommodated to the substrate. After annealing at 450 ° C, the particles adopt the 03B2 ordered structure. The particles are limited at the edges by (100) and (110) faces. Most of them are oriented (001) on MgO with (110)PdCu ~ (100)MgO, which corresponds to a perfect accommodation of the lattices without deformation compared to the bulk, despite of the reduction in H2. The PdCu3 particles smaller than about 10 nm were found with the 03B1 ordered structure, without periodic anti-phase boundaries.","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125333629","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Fabrication of Nano-Tips by Carbon Contamination in a Scanning Electron Microscope for Use in Scanning Probe Microscopy and Field Emission 在扫描电子显微镜下碳污染制备纳米针尖用于扫描探针显微镜和场发射
Microscopy Microanalysis Microstructures Pub Date : 1997-12-01 DOI: 10.1051/MMM:1997127
M. Antognozzi, Andrea Sentimenti, U. Valdré
{"title":"Fabrication of Nano-Tips by Carbon Contamination in a Scanning Electron Microscope for Use in Scanning Probe Microscopy and Field Emission","authors":"M. Antognozzi, Andrea Sentimenti, U. Valdré","doi":"10.1051/MMM:1997127","DOIUrl":"https://doi.org/10.1051/MMM:1997127","url":null,"abstract":"Results are reported on a systematic study addressed to an effective fabrication of nano-tips by means of carbon contamination in a scanning electron microscope. Nano-tips with angular aperture of 10°, apical radius of about 5 nm,1 03BCm long can be efficiently produced by our method in less than 60 s of electron beam exposure; it involves, in particular, successive focusing during tip growth and the use of a carbon block as a source of contaminant. These tips have been used as high aspect ratio and low capillary force probes in atomic force microscopy, and as nano-sized field emitters for electron guns.","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"36 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133509789","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 27
Electron Beam Induced Structural Modification of the Oxidized Silicon Micro-Clusters in ZnO Matrix 电子束诱导ZnO基体中氧化硅微团簇的结构修饰
Microscopy Microanalysis Microstructures Pub Date : 1997-12-01 DOI: 10.1051/MMM:1997131
U. Pal, N. Koshizaki, S. Terauchi, T. Sasaki
{"title":"Electron Beam Induced Structural Modification of the Oxidized Silicon Micro-Clusters in ZnO Matrix","authors":"U. Pal, N. Koshizaki, S. Terauchi, T. Sasaki","doi":"10.1051/MMM:1997131","DOIUrl":"https://doi.org/10.1051/MMM:1997131","url":null,"abstract":"Si/ZnO nano- and micro-composites were grown on SiO2 glass substrates by co-sputtering technique. The content of Si in the films was controlled by the no. of Si pieces placed on the ZnO target. The crystallinity of the composite films decreased on increasing the Si content in them and increased on post deposition thermal annealing. The dispersed Si in the ZnO matrix remained in the form of nano-particles with an average size value of 3.7 nm and does not depend on the fractional Si content in them. On thermal annealing, the size of the nano-particles did not change noticeably up to 600 °C. For the thermal annealing at and above 700 ° C, the nano-particles aggregated to form micro-clusters with an average size value of 34 nm. The micro-clusters were seen to be crystallized with distinct line structures in the TEM images and spots in the TED patterns. On high energy electron irradiation, the micro-clusters broke to form nano-particles of similar size as they were before the formation of micro-clusters.","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"236 5‐8","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132442969","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Ion Beam Implantation and Plasma Immersion Ion Implantation. Application on Nitrided Ti-6Al-4V Titanium Alloy 离子束注入与等离子体浸没离子注入。氮化Ti-6Al-4V钛合金的应用
Microscopy Microanalysis Microstructures Pub Date : 1997-12-01 DOI: 10.1051/MMM:1997132
A. Fabre, L. Barrallier, F. Torregrosa, L. Roux
{"title":"Ion Beam Implantation and Plasma Immersion Ion Implantation. Application on Nitrided Ti-6Al-4V Titanium Alloy","authors":"A. Fabre, L. Barrallier, F. Torregrosa, L. Roux","doi":"10.1051/MMM:1997132","DOIUrl":"https://doi.org/10.1051/MMM:1997132","url":null,"abstract":"Due to its mechanical properties and low density, the Ti-6Al-4V titanium al- loy is used in hip prostheses. But the tribological behavior of Ti-6Al-4V sliding against ultra high molecular weight polyethylene involves wear degradations. The wear behavior of (Ti-6Al- 4V/UHMWPE) couple can be improved by ion implantation of nitrogen. After a characterization study to find the optimal parameters for classic ion implantation, this study presents an analysis of wear behavior in comparison with chemical composition, microhardness and adhesion work for a new implantation technique, plasma immersion ion implantation.","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121862831","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
Quantitative EELS by Spectrum Parametrization 光谱参数化定量EELS
Microscopy Microanalysis Microstructures Pub Date : 1997-12-01 DOI: 10.1051/MMM:1997128
A. Aitouchen, Y. Kihn, G. Zanchi
{"title":"Quantitative EELS by Spectrum Parametrization","authors":"A. Aitouchen, Y. Kihn, G. Zanchi","doi":"10.1051/MMM:1997128","DOIUrl":"https://doi.org/10.1051/MMM:1997128","url":null,"abstract":"2014 In order to describe the profiles of electron energy loss spectra in transmission electron microscopy, an analytical form of the intensity has been established taking the various elementary diffusion processes into account. This procedure is used to evaluate the background profile in each part of the spectra, even for thick samples. Simple diffusion models can then be established from experimental spectra and the application area of quantitative elementary chemical analysis can hence be extended. Résumé. 2014 Dans le but de décrire les profils de spectres de pertes d’énergie d’électrons en microscopie électronique en transmission, une expression analytique de l’intensité a été établie en tenant compte des divers processus de diffusion élémentaires. L’un des intérêts majeurs de cette méthode de calcul est de pouvoir evaluer le fond continu en tout point du spectre, quelle que soit l’épaisseur de l’échantillon analysée. Ceci permet d’une part de définir les modèles de diffusion simple à partir des spectres expérimentaux et d’autre part d’élargir le domaine d’application de l’analyse chimique élémentaire quantitative. Microsc. Microanal. Microstruct. 8 (1997) 369-378 DECEMBER 1997, PAGE","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"91 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126931728","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
A Scanning Force Microscope Combined with a Scanning Electron Microscope for Multidimensional Data Analysis 扫描力显微镜与扫描电子显微镜相结合的多维数据分析
Microscopy Microanalysis Microstructures Pub Date : 1997-12-01 DOI: 10.1051/MMM:1997130
M. Troyon, H. Lei, Zhonghuai Wang, G. Shang
{"title":"A Scanning Force Microscope Combined with a Scanning Electron Microscope for Multidimensional Data Analysis","authors":"M. Troyon, H. Lei, Zhonghuai Wang, G. Shang","doi":"10.1051/MMM:1997130","DOIUrl":"https://doi.org/10.1051/MMM:1997130","url":null,"abstract":"A scanning force microscope (SFM) intended for operation inside a scanning electron microscope (SEM) is described. This combined instrument allows one to image a sample conventionally by SEM and to investigate by SFM the local topography as well as certain physical characteristics of the surface (e.g., friction and elasticity). The combination of the two microscopes is very attractive because they complement each other in terms of depth of field, lateral and vertical resolution, field of view, speed and ability to image insulating surfaces. A multi-dimensional data space relative to the same area of a sample surface can be constructed, which should help to give new insights into the nature of materials.","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-12-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131269323","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 42
Some Aspects of Coherent Epitaxial Deposits 相干外延沉积的几个方面
Microscopy Microanalysis Microstructures Pub Date : 1997-08-01 DOI: 10.1051/MMM:1997119
P. Muller, R. Kern
{"title":"Some Aspects of Coherent Epitaxial Deposits","authors":"P. Muller, R. Kern","doi":"10.1051/MMM:1997119","DOIUrl":"https://doi.org/10.1051/MMM:1997119","url":null,"abstract":"2014 When wetting is complete, coherent epitaxies on a thick planar substrate B build up z continuous pseudomorphous layers A which are fully strained according to their natural misfit m. The so-accumulated strain energy density is responsible for some remarkable facts: 1) Each layer is formed at precise undersaturation. At saturation there is a specific number of wetting layers z0. 2) Such layers accumulate strain energy and then may relax plastically by interfacial dislocations at a critical thickness zd1. 3) At some other critical thickness zSK, (z0 zSK zd1), the monolayer growth becomes less stable than layer thickening, what leads to three-dimensional (3D) islanding on the zsk wetting layers, called Stranski-Krastanov (SK) growth. Such islands laterally relax and, since coherent with their substrate, drag the substrate which relaxes too. 4) If the equilibrium shape ratio r of non misfitted 3D deposit (m = 0) depends on the wetting, for a misfitted (m ~ 0) and relaxed crystal, the strain opposes to wetting, so that the higher the elastic energy, the greater the shape ratio rm. 5) Since the equilibrium shape of a 3D crystal depends upon strain, at each dislocation entrance the shape ratio of the crystal varies in a sudden way. Microsc. Microanal. Microstruct. AUGUST/OCTOBER 1997, PAGE 229","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129054987","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 18
Profilométrie par spectrométrie de masse d'ions secondaires de couches alternées cobalt-cuivre. Influence des conditions de pulvérisation sur la résolution en profondeur 钴铜交替层二次离子的质谱分析。喷雾条件对深度分辨率的影响
Microscopy Microanalysis Microstructures Pub Date : 1997-08-01 DOI: 10.1051/MMM:1997121
F. Jomard, Marcel Perdereau
{"title":"Profilométrie par spectrométrie de masse d'ions secondaires de couches alternées cobalt-cuivre. Influence des conditions de pulvérisation sur la résolution en profondeur","authors":"F. Jomard, Marcel Perdereau","doi":"10.1051/MMM:1997121","DOIUrl":"https://doi.org/10.1051/MMM:1997121","url":null,"abstract":"Depth resolution in SIMS profiling of multilayers Co/Cu/Co and Cu/Co/Cu samples has been estimated as a function of bombardment parameters with 3 keV O+2 ions. The best depth resolution is obtained at normal incidence. At glancing incidence it is necessary to flood with oxygen to improve the resolution. Topography development due to sputtering, accountable for worsening of profiles, is reduced by oxygen implantation either directly by O+2 at normal incidence or by flooding at glancing incidence.","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"116 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121772492","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Complete TEM Investigation of a Nitrided Layer for a Cr Alloy Steel Cr合金钢氮化层的TEM研究
Microscopy Microanalysis Microstructures Pub Date : 1997-08-01 DOI: 10.1051/MMM:1997126
J. Locquet, R. Soto, L. Barrallier, A. Charaï
{"title":"Complete TEM Investigation of a Nitrided Layer for a Cr Alloy Steel","authors":"J. Locquet, R. Soto, L. Barrallier, A. Charaï","doi":"10.1051/MMM:1997126","DOIUrl":"https://doi.org/10.1051/MMM:1997126","url":null,"abstract":"2014 Un-nitrided material is investigated by TEM in order to identify the different types of precipitates and to determine their respective volume fraction. M23C6 and M4C3 carbides are reported. Experimental results are confirmed by thermodynamical calculations. The same material is nitrided in industrial conditions and also investigated by TEM. Crystallographic structures and chemical compositions are determined by Selected Area Electron Diffraction (SAED), Energy Dispersive Spectroscopy (EDS) and Electron Energy Loss Spectroscopy (EELS). V-rich carbonitrides, incoherent globular CrN nitrides and semi-coherent CrN nitrides are reported. In both cases, CrN precipitates have the Baker-Nutting orientation relationship with respect to the ferritic matrix. Their size distributions as a function of depth are studied. Microsc. Microanal. Microstruct. AUGUST/OCTOBER 1997, PAGE 335","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"29 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116936796","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 26
Physicochemical Interaction and Atomic Structure at Cu-MgO Interfaces Cu-MgO界面的物理化学相互作用和原子结构
Microscopy Microanalysis Microstructures Pub Date : 1997-08-01 DOI: 10.1051/MMM:1997125
P. Jonnard, C. Hombourger, F. Vergand, C. Bonnelle, A. Renou, A. Assaban, E. Gillet, M. Gillet
{"title":"Physicochemical Interaction and Atomic Structure at Cu-MgO Interfaces","authors":"P. Jonnard, C. Hombourger, F. Vergand, C. Bonnelle, A. Renou, A. Assaban, E. Gillet, M. Gillet","doi":"10.1051/MMM:1997125","DOIUrl":"https://doi.org/10.1051/MMM:1997125","url":null,"abstract":"2014 Physicochemical interactions at Cu-MgO buried interfaces are studied by electron X-ray emission spectroscopy and compared to results obtained for native interfaces. The atomic arrangement is also determined. The role of the characteristics of the substrate is evidenced. Results suggest that weak or strong interactions can be present at the interfaces. Microsc. Microanal. Microstruct. AUGUST/OCTOBER 1997, PAGE 325","PeriodicalId":366013,"journal":{"name":"Microscopy Microanalysis Microstructures","volume":"46 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1997-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122953656","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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