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Photomask Technology 2022最新文献

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Optimum OPC methodology and visualization technique for photomask compensation in flat panel display lithography 平板显示光刻中掩模补偿的最佳OPC方法和可视化技术
Photomask Technology 2022 Pub Date : 2022-11-16 DOI: 10.1117/12.2644331
Y. Ham, T. Pistor, C. Progler
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引用次数: 0
Accelerated discovery of materials for a sustainable future of computing 加速发现可持续未来计算的材料
Photomask Technology 2022 Pub Date : 2022-11-15 DOI: 10.1117/12.2652970
D. Sanders
{"title":"Accelerated discovery of materials for a sustainable future of computing","authors":"D. Sanders","doi":"10.1117/12.2652970","DOIUrl":"https://doi.org/10.1117/12.2652970","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"91 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127048872","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Selective leading-edge mask writing and high-throughput mask writing in multi-beam mask writer MBM-2000PLUS 多波束掩码写入器MBM-2000PLUS的选择性前沿掩码写入和高通量掩码写入
Photomask Technology 2022 Pub Date : 2022-11-11 DOI: 10.1117/12.2641449
H. Nomura, Hiroshi Matsumoto, Keisuke Yamaguchi, Hayato Kimura, N. Nakayamada
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引用次数: 0
Holistic imaging for yield improvements enabled by high-availability, and low-environmental impact Cymer ArFi lightsource 采用高可用性、低环境影响的Cymer ArFi光源，实现成品率提高的整体成像
Photomask Technology 2022 Pub Date : 2022-11-11 DOI: 10.1117/12.2648306
S. Luo, W. Conley, James Bonefede, Natallia S. Karlitskaya, Thomas Yang, david manley, peter Oh, Rajasekhar M. Rao, M. Sells, J. Thornes
{"title":"Holistic imaging for yield improvements enabled by high-availability, and low-environmental impact Cymer ArFi lightsource","authors":"S. Luo, W. Conley, James Bonefede, Natallia S. Karlitskaya, Thomas Yang, david manley, peter Oh, Rajasekhar M. Rao, M. Sells, J. Thornes","doi":"10.1117/12.2648306","DOIUrl":"https://doi.org/10.1117/12.2648306","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127415645","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Critical dimension performance and defect control on multi-etching 多重刻蚀关键尺寸性能及缺陷控制
Photomask Technology 2022 Pub Date : 2022-11-11 DOI: 10.1117/12.2641684
C. C. Han
{"title":"Critical dimension performance and defect control on multi-etching","authors":"C. C. Han","doi":"10.1117/12.2641684","DOIUrl":"https://doi.org/10.1117/12.2641684","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129195003","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enabling process optimization for EUV phase shift masks using AIMS(R) EUV phase metrology 使用AIMS(R) EUV相位计量实现EUV相移掩模的工艺优化
Photomask Technology 2022 Pub Date : 2022-11-11 DOI: 10.1117/12.2645004
R. Capelli, N. Wilcox, S. Krannich, Dinumol Devasia, G. Kersteen, A. Sundaramurthy, Chang Ju Choi, S. Hoffmann, Zachary Rice, Patrick J. Straney, K. Gwosch, M. Koch, Tim Helbig
{"title":"Enabling process optimization for EUV phase shift masks using AIMS(R) EUV phase metrology","authors":"R. Capelli, N. Wilcox, S. Krannich, Dinumol Devasia, G. Kersteen, A. Sundaramurthy, Chang Ju Choi, S. Hoffmann, Zachary Rice, Patrick J. Straney, K. Gwosch, M. Koch, Tim Helbig","doi":"10.1117/12.2645004","DOIUrl":"https://doi.org/10.1117/12.2645004","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"1993 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125541695","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
DUV mask writer addressable to 90nm nodes with a sustainability profile DUV掩码写入器可寻址到90nm节点，具有可持续性配置文件
Photomask Technology 2022 Pub Date : 2022-11-11 DOI: 10.1117/12.2641791
R. Eklund, M. Wahlsten, M. Rosling, Martin Glimtoft, Gunnar Gustafsson, Ylva Mjöberg Wentzel, Anna-Karin Drake, Youngjin Park
{"title":"DUV mask writer addressable to 90nm nodes with a sustainability profile","authors":"R. Eklund, M. Wahlsten, M. Rosling, Martin Glimtoft, Gunnar Gustafsson, Ylva Mjöberg Wentzel, Anna-Karin Drake, Youngjin Park","doi":"10.1117/12.2641791","DOIUrl":"https://doi.org/10.1117/12.2641791","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"23 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115427380","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Feasibility study of alternative multilayer for EUV mask EUV掩膜替代多层材料的可行性研究
Photomask Technology 2022 Pub Date : 2022-11-11 DOI: 10.1117/12.2644225
T. Umezawa, Y. Ikebe, Naoki Hayase, T. Onoue
{"title":"Feasibility study of alternative multilayer for EUV mask","authors":"T. Umezawa, Y. Ikebe, Naoki Hayase, T. Onoue","doi":"10.1117/12.2644225","DOIUrl":"https://doi.org/10.1117/12.2644225","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"19 12","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"113935162","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Reticle qualification and re-qualification for EUV production today and in the future 目前和未来EUV生产的光镜鉴定和再鉴定
Photomask Technology 2022 Pub Date : 2022-11-11 DOI: 10.1117/12.2650339
Ming-Wu Li, Amo Chen, Vidyasagar Anantha, Ray Shi
{"title":"Reticle qualification and re-qualification for EUV production today and in the future","authors":"Ming-Wu Li, Amo Chen, Vidyasagar Anantha, Ray Shi","doi":"10.1117/12.2650339","DOIUrl":"https://doi.org/10.1117/12.2650339","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125495432","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Progress of multi-beam curvilinear mask writing 多波束曲线掩模书写的研究进展
Photomask Technology 2022 Pub Date : 2022-10-31 DOI: 10.1117/12.2643253
Christof Zillner, J. Jeřábek, A. Moqanaki, Harald Höller-Lugmayr, E. Platzgummer
{"title":"Progress of multi-beam curvilinear mask writing","authors":"Christof Zillner, J. Jeřábek, A. Moqanaki, Harald Höller-Lugmayr, E. Platzgummer","doi":"10.1117/12.2643253","DOIUrl":"https://doi.org/10.1117/12.2643253","url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123065318","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
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