Christof Zillner, J. Jeřábek, A. Moqanaki, Harald Höller-Lugmayr, E. Platzgummer
{"title":"Progress of multi-beam curvilinear mask writing","authors":"Christof Zillner, J. Jeřábek, A. Moqanaki, Harald Höller-Lugmayr, E. Platzgummer","doi":"10.1117/12.2643253","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"39 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-10-31","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"1","resultStr":null,"platform":"Semanticscholar","paperid":null,"PeriodicalName":"Photomask Technology 2022","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2643253","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}