多重刻蚀关键尺寸性能及缺陷控制

{"title":"多重刻蚀关键尺寸性能及缺陷控制","authors":"C. C. Han","doi":"10.1117/12.2641684","DOIUrl":null,"url":null,"abstract":"","PeriodicalId":339778,"journal":{"name":"Photomask Technology 2022","volume":"38 1","pages":"0"},"PeriodicalIF":0.0000,"publicationDate":"2022-11-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":"0","resultStr":"{\"title\":\"Critical dimension performance and defect control on multi-etching\",\"authors\":\"C. C. Han\",\"doi\":\"10.1117/12.2641684\",\"DOIUrl\":null,\"url\":null,\"abstract\":\"\",\"PeriodicalId\":339778,\"journal\":{\"name\":\"Photomask Technology 2022\",\"volume\":\"38 1\",\"pages\":\"0\"},\"PeriodicalIF\":0.0000,\"publicationDate\":\"2022-11-11\",\"publicationTypes\":\"Journal Article\",\"fieldsOfStudy\":null,\"isOpenAccess\":false,\"openAccessPdf\":\"\",\"citationCount\":\"0\",\"resultStr\":null,\"platform\":\"Semanticscholar\",\"paperid\":null,\"PeriodicalName\":\"Photomask Technology 2022\",\"FirstCategoryId\":\"1085\",\"ListUrlMain\":\"https://doi.org/10.1117/12.2641684\",\"RegionNum\":0,\"RegionCategory\":null,\"ArticlePicture\":[],\"TitleCN\":null,\"AbstractTextCN\":null,\"PMCID\":null,\"EPubDate\":\"\",\"PubModel\":\"\",\"JCR\":\"\",\"JCRName\":\"\",\"Score\":null,\"Total\":0}","platform":"Semanticscholar","paperid":null,"PeriodicalName":"Photomask Technology 2022","FirstCategoryId":"1085","ListUrlMain":"https://doi.org/10.1117/12.2641684","RegionNum":0,"RegionCategory":null,"ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":null,"EPubDate":"","PubModel":"","JCR":"","JCRName":"","Score":null,"Total":0}