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AE’s RF and DC Power Solutions for Next Generation PECVD and PVD Industrial Applications AE为下一代PECVD和PVD工业应用提供射频和直流电源解决方案
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0042
Mike Meyer
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引用次数: 0
U.S. Export Controls and Sanctions: What SVC Companies Need to Know 美国出口管制和制裁:SVC公司需要知道什么
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0001
Douglas Jacobson
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引用次数: 0
Power Factor Improvement for Roll-to-Roll Vacuum Coating Systems Using SCR Power Controller in Voltage Sequence Control 用可控硅功率控制器在电压序列控制中改善卷对卷真空镀膜系统的功率因数
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0041
Andreas Breitkopf
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引用次数: 0
New Generation In-Situ Process Control of Chemical Composition of Compound Materials and Alloys During PVD Process 新一代PVD过程中复合材料和合金化学成分的原位过程控制
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0053
C. Metting
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引用次数: 0
Metallic Magnetron Sputtered Deposited Coatings for Controlling Biofilm Formation 控制生物膜形成的金属磁控溅射沉积涂层
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0005
D. Mihut
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引用次数: 0
Scalable van der Waals Superlattices for Electronics, Optics, and Catalysis 用于电子、光学和催化的可伸缩范德华斯超晶格
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0003
C. Muratore
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引用次数: 0
Reactive Sputter Deposition: Effect of Different Power Configurations – A Case Study 反应溅射沉积:不同功率配置的影响-一个案例研究
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0018
G. Rane
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引用次数: 0
Introduction for RAM FORCE Low Damage Sputtering Solutions RAM力低损伤溅射解决方案介绍
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0043
Shojji Matsumoto
{"title":"Introduction for RAM FORCE Low Damage Sputtering Solutions","authors":"Shojji Matsumoto","doi":"10.14332/svc22.proc.0043","DOIUrl":"https://doi.org/10.14332/svc22.proc.0043","url":null,"abstract":"","PeriodicalId":305525,"journal":{"name":"65th Annual Technical Conference Proceedings","volume":"47 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121820758","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Reactive Sputtering Made Easy 反应溅射变得容易
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0045
D. Monaghan
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引用次数: 0
Time Series Analysis in Vacuum Roll to Roll Coating Technology 真空滚涂工艺的时间序列分析
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0037
M. Fahland
{"title":"Time Series Analysis in Vacuum Roll to Roll Coating Technology","authors":"M. Fahland","doi":"10.14332/svc22.proc.0037","DOIUrl":"https://doi.org/10.14332/svc22.proc.0037","url":null,"abstract":"","PeriodicalId":305525,"journal":{"name":"65th Annual Technical Conference Proceedings","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116468753","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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