65th Annual Technical Conference Proceedings最新文献

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The Influence of O2, CF4 Plasma and UV-Ozone Pre-Treatment on the Droplet-Based Deposition of Diamond Nanoseeds O2、CF4等离子体和uv -臭氧预处理对金刚石纳米种子滴状沉积的影响
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0024
Pieter Verding
{"title":"The Influence of O2, CF4 Plasma and UV-Ozone Pre-Treatment on the Droplet-Based Deposition of Diamond Nanoseeds","authors":"Pieter Verding","doi":"10.14332/svc22.proc.0024","DOIUrl":"https://doi.org/10.14332/svc22.proc.0024","url":null,"abstract":"","PeriodicalId":305525,"journal":{"name":"65th Annual Technical Conference Proceedings","volume":"298 1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121268586","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Novel Radial Magnetron for Deposition/Etch on Inner Diameter Surfaces with High Conformality to Replace Cu, Cr, Nb Electrochemical Techniques with iPVD 新型径向磁控管用于高共形内径表面的沉积/蚀刻,以iPVD取代Cu, Cr, Nb电化学技术
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0035
Ian Haehnlein
{"title":"Novel Radial Magnetron for Deposition/Etch on Inner Diameter Surfaces with High Conformality to Replace Cu, Cr, Nb Electrochemical Techniques with iPVD","authors":"Ian Haehnlein","doi":"10.14332/svc22.proc.0035","DOIUrl":"https://doi.org/10.14332/svc22.proc.0035","url":null,"abstract":"","PeriodicalId":305525,"journal":{"name":"65th Annual Technical Conference Proceedings","volume":"23 5","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"113990207","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Plasma-Enhanced Chemical Vapor Deposition of Graphene Layers by a Roll-to-Roll Process 等离子体增强石墨烯层化学气相沉积的卷对卷工艺
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0026
S. Saager
{"title":"Plasma-Enhanced Chemical Vapor Deposition of Graphene Layers by a Roll-to-Roll Process","authors":"S. Saager","doi":"10.14332/svc22.proc.0026","DOIUrl":"https://doi.org/10.14332/svc22.proc.0026","url":null,"abstract":"","PeriodicalId":305525,"journal":{"name":"65th Annual Technical Conference Proceedings","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114784121","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Enhancing Production Control with New Layer Control Module for EMICON Systems 用EMICON系统的新型分层控制模块加强生产控制
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0050
T. Schütte
{"title":"Enhancing Production Control with New Layer Control Module for EMICON Systems","authors":"T. Schütte","doi":"10.14332/svc22.proc.0050","DOIUrl":"https://doi.org/10.14332/svc22.proc.0050","url":null,"abstract":"","PeriodicalId":305525,"journal":{"name":"65th Annual Technical Conference Proceedings","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132083359","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The Coating Tests for the Vera C. Rubin Observatory M1M3 Mirror Vera C. Rubin天文台M1M3镜面涂层试验
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0020
T. Vucina
{"title":"The Coating Tests for the Vera C. Rubin Observatory M1M3 Mirror","authors":"T. Vucina","doi":"10.14332/svc22.proc.0020","DOIUrl":"https://doi.org/10.14332/svc22.proc.0020","url":null,"abstract":"","PeriodicalId":305525,"journal":{"name":"65th Annual Technical Conference Proceedings","volume":"2021 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133073476","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Sputter Cathode Design Consideration with HiPIMS 基于HiPIMS的溅射阴极设计考虑
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0011
Nick Franzer
{"title":"Sputter Cathode Design Consideration with HiPIMS","authors":"Nick Franzer","doi":"10.14332/svc22.proc.0011","DOIUrl":"https://doi.org/10.14332/svc22.proc.0011","url":null,"abstract":"","PeriodicalId":305525,"journal":{"name":"65th Annual Technical Conference Proceedings","volume":"36 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123915706","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
PT-Symmetric Active Gratings – A New Solution for Surface-Emitting Lasers pt对称有源光栅——表面发射激光器的新解决方案
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0033
Tina Hemati
{"title":"PT-Symmetric Active Gratings – A New Solution for Surface-Emitting Lasers","authors":"Tina Hemati","doi":"10.14332/svc22.proc.0033","DOIUrl":"https://doi.org/10.14332/svc22.proc.0033","url":null,"abstract":"","PeriodicalId":305525,"journal":{"name":"65th Annual Technical Conference Proceedings","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115070103","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
In-Line PVD Continuous HiPIMS Cr/CrN Anti-Corrosion Coatings Using Novel Inverted Cylindrical Magnetron for Nuclear Fuel Claddings & Beyond 新型倒圆柱形磁控管用于核燃料包壳及其他部位的PVD连续HiPIMS Cr/CrN防腐涂层
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0012
I. Shchelkanov
{"title":"In-Line PVD Continuous HiPIMS Cr/CrN Anti-Corrosion Coatings Using Novel Inverted Cylindrical Magnetron for Nuclear Fuel Claddings & Beyond","authors":"I. Shchelkanov","doi":"10.14332/svc22.proc.0012","DOIUrl":"https://doi.org/10.14332/svc22.proc.0012","url":null,"abstract":"","PeriodicalId":305525,"journal":{"name":"65th Annual Technical Conference Proceedings","volume":"86 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123572633","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High Power Impulse Magnetron Sputtering for Depositing Silicon-Based Films in Large Area Coaters 大功率脉冲磁控溅射在大面积涂布机上沉积硅基薄膜
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0016
A. Oniszczuk
{"title":"High Power Impulse Magnetron Sputtering for Depositing Silicon-Based Films in Large Area Coaters","authors":"A. Oniszczuk","doi":"10.14332/svc22.proc.0016","DOIUrl":"https://doi.org/10.14332/svc22.proc.0016","url":null,"abstract":"","PeriodicalId":305525,"journal":{"name":"65th Annual Technical Conference Proceedings","volume":"72 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126257353","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
ALD Process Monitoring and Optimisation by OES-Based Gas Analysis 基于oes气体分析的ALD过程监控与优化
65th Annual Technical Conference Proceedings Pub Date : 2022-11-15 DOI: 10.14332/svc22.proc.0004
M. Drazdys
{"title":"ALD Process Monitoring and Optimisation by OES-Based Gas Analysis","authors":"M. Drazdys","doi":"10.14332/svc22.proc.0004","DOIUrl":"https://doi.org/10.14332/svc22.proc.0004","url":null,"abstract":"","PeriodicalId":305525,"journal":{"name":"65th Annual Technical Conference Proceedings","volume":"57 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2022-11-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126472612","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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