S.C. Lee, X. Sun, S. Hersee, J. Lee, Y. Ziang, H. Xu, S. Brueck
{"title":"Growth of GaN on a nanoscale periodic faceted Si substrate by metal organic vapor phase epitaxy","authors":"S.C. Lee, X. Sun, S. Hersee, J. Lee, Y. Ziang, H. Xu, S. Brueck","doi":"10.1109/ISCSPC.2003.1354425","DOIUrl":"https://doi.org/10.1109/ISCSPC.2003.1354425","url":null,"abstract":"Growth of GaN on a nanoscale periodic faceted Si substrate by metal organic vapor phase epitaxy is reported. The surface of the Si(001) substrate is patterned with a one-dimensional, 355-nm period array of grooves. Each groove consisted of two facing Si{111} stripe facets separated by upper and lower Si(001) surfaces. GaN deposition on this groove array shows a strong selectivity with epitaxial growth of the hexagonal phase on the Si {111} facets being dominant. The initial stage of GaN growth appears to be amorphous. This is followed by GaN containing a high-density of stacking faults to accommodate the large lattice mismatch strain but the defect density decreases as growth proceeds. Lateral overgrowth from the Si{111} facets toward neighboring Si(001) facets leads to coalescence between GaN from opposing Si{111} facets. These GaN regions have misaligned c-axes and the crystal structure becomes unstable as they merge, resulting in a phase transition from hexagonal to cubic at the coalescence region. Experimental results of GaN grown on a nanoscale faceted Si surface including: nucleation, crystal structure, and lateral growth depending on Si orientation are presented.","PeriodicalId":275466,"journal":{"name":"2003 International Symposium on Compound Semiconductors: Post-Conference Proceedings (IEEE Cat. No.03TH8767)","volume":"62 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126276352","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Chandola, Y. Ko, P. Dutta, A. Zakel, L. Gonzales, A. Hall, J. Henry, G. Gillen, S. Guha
{"title":"Improvements in electrical and optical properties of low bandgap III-V antimonides by using isoelectronic dopants","authors":"A. Chandola, Y. Ko, P. Dutta, A. Zakel, L. Gonzales, A. Hall, J. Henry, G. Gillen, S. Guha","doi":"10.1109/ISCSPC.2003.1354432","DOIUrl":"https://doi.org/10.1109/ISCSPC.2003.1354432","url":null,"abstract":"Vertical Bridgman grown bulk crystals of antimonides (e.g. InSb, GaSb and InGaSb) doped with isoelectronic dopants exhibited significant reduction in free-carrier absorption. The enhancement in below band gap optical transmission and reduction in residual doping concentration are attributed to reduction or compensation of native defects.","PeriodicalId":275466,"journal":{"name":"2003 International Symposium on Compound Semiconductors: Post-Conference Proceedings (IEEE Cat. No.03TH8767)","volume":"24 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122333748","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
P. Bhattacharya, J. Topolancik, J. Sabarinathan, S. Pradhan, Poli C. Yu
{"title":"Two dimensional photonic crystal active and passive devices","authors":"P. Bhattacharya, J. Topolancik, J. Sabarinathan, S. Pradhan, Poli C. Yu","doi":"10.1109/ISCSPC.2003.1354450","DOIUrl":"https://doi.org/10.1109/ISCSPC.2003.1354450","url":null,"abstract":"The properties of electrically injected photonic crystal surface and edge emitting light sources and passive waveguides for microfluidic discrimination and their applications are presented.","PeriodicalId":275466,"journal":{"name":"2003 International Symposium on Compound Semiconductors: Post-Conference Proceedings (IEEE Cat. No.03TH8767)","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133309840","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Micro-Raman scattering study of strain induced by compositional variation in single crystalline Si/sub 1-x/Ge/sub x/ discs","authors":"M.R. Islam, M. Yamada","doi":"10.1109/ISCSPC.2003.1354435","DOIUrl":"https://doi.org/10.1109/ISCSPC.2003.1354435","url":null,"abstract":"Micro-Raman scattering (MRS) study has been made to investigate residual strain in single crystalline Si/sub 1-x/Ge/sub x/ discs. It is found that the residual strain is induced by the compositional variation along the radial direction of disc sample, although there is no strain when the composition is uniform over the disc sample. It is also found that the induced strain is relaxed near the edge of disc sample. The residual strain value is evaluated to be of the order of 10/sup -3/ for the parabolic-like variation of composition ranged from 0.112 at the center to the 0.143 at the edge of the disc sample.","PeriodicalId":275466,"journal":{"name":"2003 International Symposium on Compound Semiconductors: Post-Conference Proceedings (IEEE Cat. No.03TH8767)","volume":"398 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124389671","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Y. M. Park, Y.J. Park, K.M. Kim, J.C. Shin, J.D. Song, J. Lee, K. Yoo
{"title":"Transient behavior of self-assembled quantum dots formed by atomic layer epitaxy technique","authors":"Y. M. Park, Y.J. Park, K.M. Kim, J.C. Shin, J.D. Song, J. Lee, K. Yoo","doi":"10.1109/ISCSPC.2003.1354430","DOIUrl":"https://doi.org/10.1109/ISCSPC.2003.1354430","url":null,"abstract":"We investigated the effects of carrier dynamics on the temperature dependence of the photoluminescence (PL) of an InGaAs dots-in-a-well (DWELL) structure. The quantum dots (QDs) were formed by the atomic layer epitaxy (ALE) technique alternately supplying InAs and GaAs sources. It was found from the PL measurements at various temperatures that the DWELL structure was accomplished through the generation process of the intermediate layer between the quantum well (QW) and the QDs during the formation of the QDs inside a QW. The thermal quenching equations on the basis of the rate equation model can be explained by the carrier dynamics, which included in the radiative recombination, the carrier thermal escape and the carrier capture process occurring in these three layers, i.e. QW, QD and the intermediate layer.","PeriodicalId":275466,"journal":{"name":"2003 International Symposium on Compound Semiconductors: Post-Conference Proceedings (IEEE Cat. No.03TH8767)","volume":"45 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130377353","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Polarization dependent inter-subband transitions in n-type InGaAs/GaAs and p-type SiGe/Ge self assembled dots: theoretical studies","authors":"Yih-Yin Lin, J. Singh","doi":"10.1109/ISCSPC.2003.1354434","DOIUrl":"https://doi.org/10.1109/ISCSPC.2003.1354434","url":null,"abstract":"This work presents the results of polarization dependence of inter-subband absorption in the n-doped InAs/GaAs quantum dots as a function of dot shapes and as a function of dot compositions in p-doped SiGe/Si dots.","PeriodicalId":275466,"journal":{"name":"2003 International Symposium on Compound Semiconductors: Post-Conference Proceedings (IEEE Cat. No.03TH8767)","volume":"63 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-10-27","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114801418","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Design of resonant tunneling permeable base transistors","authors":"P. Lindstrom, E. Lind, L. Wernersson","doi":"10.1109/ISCSPC.2003.1354448","DOIUrl":"https://doi.org/10.1109/ISCSPC.2003.1354448","url":null,"abstract":"We evaluate the performance of resonant tunneling permeable base transistors (RT-PBTs) by numerical simulations. Since the current is limited by the barriers, a design with a low doping level around the embedded gate wires is chosen to improve the transconductance. We evaluate the influence of the various geometrical parameters, to optimize the design for high frequency operation. We obtain a performance comparable to conventional PBTs, to which we have incorporated the tunneling characteristics.","PeriodicalId":275466,"journal":{"name":"2003 International Symposium on Compound Semiconductors: Post-Conference Proceedings (IEEE Cat. No.03TH8767)","volume":"97 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-08-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122044610","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Investigation of quantum effects in monolithic integrated circuits based on RTDs and HEMTs with a quantum hydrodynamic transport model","authors":"J. Hontschel, W. Klix, R. Stenzel","doi":"10.1109/ISCSPC.2003.1354441","DOIUrl":"https://doi.org/10.1109/ISCSPC.2003.1354441","url":null,"abstract":"This paper describes the first reported numerical simulations of monolithic integrated circuits of resonant tunneling structures and high electron mobility transistors based on In/sub 0.53/Ga/sub 0.47/As/In/sub 0.52/Al/sub 0.48/As/InP with a quantum hydrodynamic transport model (QHD-Model). For the numerical investigations the device simulator SIMBA is used, which is capable to handle complex device geometries as well as various physical models represented by certain sets of partial differential equations. As a new feature the involvement of a quantum potential is implemented to include quantum mechanical transport phenomena in different quantum size devices. The coupled solution of this quantum correction potential with a hydrodynamic transport model allows to model resonant tunneling of electrons through potential barriers and particle build up in potential wells. Different structure variations, especially the resonant tunneling diode area and the gate width of the HEMT structure show variable modulations in the output characteristics of the monolithic integrated device.","PeriodicalId":275466,"journal":{"name":"2003 International Symposium on Compound Semiconductors: Post-Conference Proceedings (IEEE Cat. No.03TH8767)","volume":"65 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-08-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114704692","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Magnetic anisotropy of ultrathin epitaxial Fe films on As-terminated GaAs(001)-(2/spl times/1) surfaces","authors":"J. Herfort, H.-P. Schonherr, P. Muduli, K. Ploog","doi":"10.1109/ISCSPC.2003.1354438","DOIUrl":"https://doi.org/10.1109/ISCSPC.2003.1354438","url":null,"abstract":"We quantitatively study the in-plane uniaxial magnetic anisotropy of ultrathin Fe films epitaxially grown on As-terminated GaAs(001)-(2/spl times/1) surfaces in dependence of the film thickness and temperature. It is found that the effective anisotropy constant of the in-plane uniaxial magnetic interface anisotropy first increases with reducing the thickness of the Fe film and then drops to zero. The strength of the in-plane uniaxial magnetic anisotropy is very large with anisotropy fields up to 3 kOe and amounts to 0.2 erg/cm/sup 2/ at T =10 K.","PeriodicalId":275466,"journal":{"name":"2003 International Symposium on Compound Semiconductors: Post-Conference Proceedings (IEEE Cat. No.03TH8767)","volume":"69 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-08-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129743171","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
T. Tanabe, K. Suto, J. Nishizawa, K. Saito, T. Kimura
{"title":"Frequency-tunable terahertz wave generation via excitation of phonon-polaritons in GaP and beam properties","authors":"T. Tanabe, K. Suto, J. Nishizawa, K. Saito, T. Kimura","doi":"10.1109/ISCSPC.2003.1354453","DOIUrl":"https://doi.org/10.1109/ISCSPC.2003.1354453","url":null,"abstract":"High-power, frequency-tunable terahertz (THz) waves over the range from 0.3 to 7.5 THz were generated based on difference-frequency generation in GaP crystals using a YAG laser and an optical parametric oscillator. The THz-wave linewidth was estimated to 3.2 GHz and spatial distribution is discussed. We measured the absorption coefficient of the GaP as well as spectra of polytetrafluroethylene (PTFE) in the THz frequency region.","PeriodicalId":275466,"journal":{"name":"2003 International Symposium on Compound Semiconductors: Post-Conference Proceedings (IEEE Cat. No.03TH8767)","volume":"26 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2003-08-25","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114432083","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}