Micro-Raman scattering study of strain induced by compositional variation in single crystalline Si/sub 1-x/Ge/sub x/ discs

M.R. Islam, M. Yamada
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Abstract

Micro-Raman scattering (MRS) study has been made to investigate residual strain in single crystalline Si/sub 1-x/Ge/sub x/ discs. It is found that the residual strain is induced by the compositional variation along the radial direction of disc sample, although there is no strain when the composition is uniform over the disc sample. It is also found that the induced strain is relaxed near the edge of disc sample. The residual strain value is evaluated to be of the order of 10/sup -3/ for the parabolic-like variation of composition ranged from 0.112 at the center to the 0.143 at the edge of the disc sample.
单晶Si/sub - 1-x/Ge/sub -x/光盘组成变化引起的应变微拉曼散射研究
采用微拉曼散射(MRS)研究了单晶Si/sub - 1-x/Ge/sub -x/片中的残余应变。发现残余应变是由成分沿圆盘试样径向方向的变化引起的,而当成分均匀分布在圆盘试样上时则不产生残余应变。同时发现,在圆盘试样边缘附近,诱导应变是松弛的。残余应变值为10/sup -3/,其组成的抛物线状变化范围从中心的0.112到边缘的0.143。
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