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[1991] Proceedings. IEEE Micro Electro Mechanical Systems最新文献

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Simulation of two-dimensional etch profile of silicon during orientation-dependent anisotropic etching 取向相关各向异性刻蚀过程中硅二维刻蚀轮廓的模拟
[1991] Proceedings. IEEE Micro Electro Mechanical Systems Pub Date : 1900-01-01 DOI: 10.1109/MEMSYS.1991.114799
A. Koide, K. Sato, S. Tanaka
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引用次数: 22
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