New Uses of Micro and Nanomaterials最新文献

Elaboration of Nanoporous Copper via Chemical Composition Design of Amorphous Precursor Alloys 非晶前驱体合金化学成分设计制备纳米多孔铜

New Uses of Micro and Nanomaterials Pub Date : 2018-10-10 DOI: 10.5772/INTECHOPEN.77222

Z. Dan, F. Qin, I. Muto, N. Hara, HuiChang

{"title":"Elaboration of Nanoporous Copper via Chemical Composition Design of Amorphous Precursor Alloys","authors":"Z. Dan, F. Qin, I. Muto, N. Hara, HuiChang","doi":"10.5772/INTECHOPEN.77222","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.77222","url":null,"abstract":"Au-group (Ag, Au) and Pt-group (Ni, Pd, Pt) metals have lower surface diffusion coeffi - cients than Cu and are defined as LSD. The chemical composition has been designed based on the differences in diffusion coefficients, and the micro-alloying of 1 at % LSD met - als with the Ti 60 Cu 40 amorphous precursor alloy results in the formation of bi-continuous nanoporous copper (NPC) with finer nanoporous structure. LSD-stabilized NPCs have the smallest characteristic pore sizes of 7 nm and 6 nm after dealloying amorphous Ti 60 Cu 39 Pd 1 and Ti 60 Cu 39 Pt 1 precursor alloys, while NPC had a pore size of 39 nm after dealloying the amorphous Ti 60 Cu 40 alloy. The refining factor increases approximately from 3.7 for Ti 60 Cu 39 Ag 1 to 1780 for Ti 60 Cu 39 Pt 1 precursors due to the dramatic decrease in the surface diffusivity during both preferential dissolution and rearrangement of Cu adatoms. The elaboration efficiencies of Ti 60 Cu 40 alloy with addition of 1 at.% Pt-group elements are higher than those of Au-group elements. The homogeneous distribution of LSD elements in both the precursors and final stabilized NPCs played a key role in restriction of the long-distance diffusion of Cu adatoms. LSD-stabilized NPCs are able to have an ultrafine nanoporosity with a pore size almost one order smaller than that from LSD-free alloys. alloys heterogeneous in microstructure","PeriodicalId":246449,"journal":{"name":"New Uses of Micro and Nanomaterials","volume":"41 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"122954469","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

The Atomic Layer Deposition Technique for the Fabrication of Memristive Devices: Impact of the Precursor on Pre-deposited Stack Materials 制备记忆器件的原子层沉积技术:前驱体对预沉积堆叠材料的影响

New Uses of Micro and Nanomaterials Pub Date : 2018-10-10 DOI: 10.5772/INTECHOPEN.78937

C. Quinteros, A. Hardtdegen, M. Barella, Federico Golmar, Félix Palumbo, J. Curiale, S. Hoffmann‐Eifert, Pablo Levy

{"title":"The Atomic Layer Deposition Technique for the Fabrication of Memristive Devices: Impact of the Precursor on Pre-deposited Stack Materials","authors":"C. Quinteros, A. Hardtdegen, M. Barella, Federico Golmar, Félix Palumbo, J. Curiale, S. Hoffmann‐Eifert, Pablo Levy","doi":"10.5772/INTECHOPEN.78937","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.78937","url":null,"abstract":"Atomic layer deposition (ALD) is a standard technique employed to grow thin-film oxides for a variety of applications. We describe the technique and demonstrate its use for obtaining memristive devices. The metal/insulator/metal stack is fabricated by means of ALD-grown HfO2, deposited on top of a highly doped Si substrate with an SiO2 film and a Ti electrode. Enhanced device capabilities (forming free, self-limiting current, non-crossing hysteretic current-voltage features) are presented and discussed. Careful analysis of the stack structure by means of X-ray reflectometry, atomic force microscopy, and secondary ion mass spectroscopy revealed a modification of the device stack from the intended sequence, HfO2/Ti/SiO2/Si. Analytical studies unravel an oxidation of the Ti layer which is addressed for the use of the ozone precursor in the HfO2 ALD process. A new deposition process and the model deduced from impedance measurements support our hypothesis: the role played by ozone on the previously deposited Ti layer is found to determine the overall features of the device. Besides, these ALD-tailored multifunctional devices exhibit rectification capability and long enough retention time to deserve their use as memory cells in a crossbar architecture and multibit approach, envisaging other potential applications.","PeriodicalId":246449,"journal":{"name":"New Uses of Micro and Nanomaterials","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123676855","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2

Magnetic Materials by Melt Spinning Method, Structural Characterization, and Numerical Modeling 磁性材料的熔融纺丝法、结构表征和数值模拟

New Uses of Micro and Nanomaterials Pub Date : 2018-10-10 DOI: 10.5772/INTECHOPEN.77368

M. Pagnola, Jairo Useche Vivero, A. Marrugo

{"title":"Magnetic Materials by Melt Spinning Method, Structural Characterization, and Numerical Modeling","authors":"M. Pagnola, Jairo Useche Vivero, A. Marrugo","doi":"10.5772/INTECHOPEN.77368","DOIUrl":"https://doi.org/10.5772/INTECHOPEN.77368","url":null,"abstract":"Chill block melt spinning is used in industrial processes for the production of metallic glasses. It is a rapid solidification process whereby a liquid metal is ejected at high pressure and temperature via a nozzle onto a rotating wheel solidifying in the form of a ribbon. In this work, starting from an alloy with the composition of Fe 78 Si 9 B 13 (% at.) reproduces the melt spinning technique to get the amorphous magnetic material. A CFD3D model based on the finite volume method ( FVM ) is proposed. For this purpose, the OpenFoam® open source code is used. In the ribbon production stage, it has been observed that the turbulence involved in the first reported transient lasts a few millisec-onds, enough time to study the process with high-speed cameras. We measure the ejection speed by using optical flow on the melt contour. This enables us to check defects in the ribbons, which are predicted with the computational model, such as the case of cracks caused by irregularities in the first formation of the solid layer. The temperature measurement method relies on the fact that the digital camera is sensitive to electromagnetic radiation between 400 and 1000 nm in wavelength and the fact that the image gray level, which is proportional to the temperature T , provided the background illumination level is negligible.","PeriodicalId":246449,"journal":{"name":"New Uses of Micro and Nanomaterials","volume":"13 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2018-10-10","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126575915","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2

Sub-2 μm Silica Particles in Chiral Separation 手性分离中的亚2 μm二氧化硅颗粒

New Uses of Micro and Nanomaterials Pub Date : 2018-10-10 DOI: 10.5772/INTECHOPEN.79063

Diana Ibrahim, A. Ghanem

引用次数: 1

Polymeric Micro- and Nanosystems for Wood Artifacts Preservation 用于木制品保存的聚合物微纳米系统

New Uses of Micro and Nanomaterials Pub Date : 2018-10-10 DOI: 10.5772/INTECHOPEN.79135

R. Ion, R. Grigorescu, L. Iancu, PaulGhioca, N. Radu

引用次数: 5

Nanomaterials in Structural Engineering 结构工程中的纳米材料

New Uses of Micro and Nanomaterials Pub Date : 2018-10-10 DOI: 10.5772/INTECHOPEN.79995

Małgorzata Krystek, M. Górski

引用次数: 1

Nanostructured Oxide Semiconductor Compounds with Possible Applications for Gas Sensors 纳米结构氧化物半导体化合物在气体传感器中的可能应用

New Uses of Micro and Nanomaterials Pub Date : 2018-10-10 DOI: 10.5772/INTECHOPEN.79079

C. Doroftei, L. Leontie

引用次数: 1

Mechanisms of Significant Precipitation Hardening in a Medium Carbon Bainitic Steel by Complex Nanocarbides Composed of Nb, Ti and V 铌、钛、钒复合纳米碳化物对中碳贝氏体钢显著析出硬化的机理

New Uses of Micro and Nanomaterials Pub Date : 2018-10-10 DOI: 10.5772/INTECHOPEN.80273

M. Okonogi, T. Hara, H. Miura

引用次数: 0