Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop最新文献_第9页

Improving manufacturing performance at the Rochester Institute of Technology integrated circuit factory 改善罗彻斯特理工学院集成电路工厂的制造性能

Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop Pub Date : 1995-11-13 DOI: 10.1109/ASMC.1995.484404

L. Fuller, K. Hirschman

{"title":"Improving manufacturing performance at the Rochester Institute of Technology integrated circuit factory","authors":"L. Fuller, K. Hirschman","doi":"10.1109/ASMC.1995.484404","DOIUrl":"https://doi.org/10.1109/ASMC.1995.484404","url":null,"abstract":"The Integrated circuit Factory at RIT has realized much success in improving manufacturing performance and advancement toward six-sigma process capability goals. The Factory is comprised of approximately 20 graduate and undergraduate students in microelectronic engineering. Customers include a small number of companies and other universities in addition to faculty members and graduate students in electrical, microelectronic, and computer engineering at RIT. Products mostly consist of analog and digital CMOS integrated circuits fabricated in a P-well CMOS process. The factory maintains a work-in-progress (WIP) level of around 5 lots (50 wafers) and has a throughput of approximately 50 lots per year, with an average lot cycle time of approximately 1 month. The university IC facility is very dynamic in that the operators, equipment, and processes are constantly changing, The process capability baseline has been obtained from data collected for the past several years of student-run factory operation. A methodology to improve the quality of the student-run factory was implemented and is described in detail, The baseline study found that none of processes had process capability (Cpk) greater than one (3 sigma). However, manufacturing performance and product quality has been greatly improved by implementing the following set of tools: computer integrated manufacturing (CIM); total quality management (TQM) methodology; statistical process control (SPC); and \"six-sigma\" process capability analysis. Today several processes show Cpk>1. The student run integrated circuit factory at RIT has made significant progress toward achieving six-sigma manufacturing goals.","PeriodicalId":237741,"journal":{"name":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","volume":"8 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-11-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128541806","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2

Facility fluids cost models 设施流体成本模型

Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop Pub Date : 1995-11-13 DOI: 10.1109/ASMC.1995.484336

N. Patel, T. Boswell, T. Nelson

引用次数: 1

Development of cost of ownership modeling at a semiconductor production facility 开发半导体生产设施的拥有成本模型

Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop Pub Date : 1995-09-19 DOI: 10.1109/ASMC.1995.484362

Raul Nañez, A. Iturralde

{"title":"Development of cost of ownership modeling at a semiconductor production facility","authors":"Raul Nañez, A. Iturralde","doi":"10.1109/ASMC.1995.484362","DOIUrl":"https://doi.org/10.1109/ASMC.1995.484362","url":null,"abstract":"Current trends in semiconductor manufacturing place a large emphasis on monitoring and/or controlling costs. One of the tools used in this effort is cost of ownership modeling. Cost of ownership provides a method to monitor and control costs, evaluate projects, and gain a better understanding into the manufacturing process. From the previous literature on the subject, models can range from very simple to very complex. The need for complexity in this type of model must be evaluated with respect to the actual level of accuracy required. Quality of the data obtained is very important as inaccurate information can lead to potential misuse. From past experience, data collection for modeling can range from being easily accessible to very obscure. In the search for data, various departments such as finance, engineering, facilities, production, and many others must be consulted. The value of the information obtained versus the cost involved in obtaining this information must also be evaluated. In this paper, the development of a cost of ownership model is outlined with the emphasis being placed on the desired goals, the methods used, the sources and manipulation of the data, and a practical example. Future applications of cost of ownership modeling are also discussed as well as integration into a semiconductor production facility.","PeriodicalId":237741,"journal":{"name":"Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop","volume":"63 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1995-09-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130567320","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 6

Development of an optimal inspection strategy for chemical mechanical polished (CMP) wafers 化学机械抛光(CMP)晶圆最优检测策略的开发

Proceedings of SEMI Advanced Semiconductor Manufacturing Conference and Workshop Pub Date : 1900-01-01 DOI: 10.1109/ASMC.1995.484406

R. Sacco, R. Cappel

引用次数: 0