Microtechnologies for the New Millennium最新文献_第8页

A biopsymeter to support the diagnostic procedure of skin samples 支持皮肤样本诊断程序的生物系统计

Microtechnologies for the New Millennium Pub Date : 2015-06-01 DOI: 10.1117/12.2178500

Valeria Fioravanti, Shailendra Chandrashekar, L. Brandhoff, Daniela Pucciarelli, S. van den Driesche, H. Breiteneder, C. Hafner, M. Vellekoop

引用次数: 0

Imaging label-free biosensor with microfluidic system 带有微流体系统的成像无标签生物传感器

Microtechnologies for the New Millennium Pub Date : 2015-06-01 DOI: 10.1117/12.2179366

S. Jahns, P. Glorius, M. Hansen, Y. Nazirizadeh, M. Gerken

{"title":"Imaging label-free biosensor with microfluidic system","authors":"S. Jahns, P. Glorius, M. Hansen, Y. Nazirizadeh, M. Gerken","doi":"10.1117/12.2179366","DOIUrl":"https://doi.org/10.1117/12.2179366","url":null,"abstract":"We present a microfluidic system suitable for parallel label-free detection of several biomarkers utilizing a compact imaging measurement system. The microfluidic system contains a filter unit to separate the plasma from human blood and a functionalized, photonic crystal slab sensor chip. The nanostructure of the photonic crystal slab sensor chip is fabricated by nanoimprint lithography of a period grating surface into a photoresist and subsequent deposition of a TiO2 layer. Photonic crystal slabs are slab waveguides supporting quasi-guided modes coupling to far-field radiation, which are sensitive to refractive index changes due to biomarker binding on the functionalized surface. In our imaging read-out system the resulting resonance shift of the quasi-guided mode in the transmission spectrum is converted into an intensity change detectable with a simple camera. By continuously taking photographs of the sensor surface local intensity changes are observed revealing the binding kinetics of the biomarker to its specific target. Data from two distinct measurement fields are used for evaluation. For testing the sensor chip, 1 μM biotin as well as 1 μM recombinant human CD40 ligand were immobilized in spotsvia amin coupling to the sensor surface. Each binding experiment was performed with 250 nM streptavidin and 90 nM CD40 ligand antibody dissolved in phosphate buffered saline. In the next test series, a functionalized sensor chip was bonded onto a 15 mm x 15 mm opening of the 75 mm x 25 mm x 2 mm microfluidic system. We demonstrate the functionality of the microfluidic system for filtering human blood such that only blood plasma was transported to the sensor chip. The results of first binding experiments in buffer with this test chip will be presented.","PeriodicalId":232941,"journal":{"name":"Microtechnologies for the New Millennium","volume":"3 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124677006","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 5

Multi-diode laser system for UV exposure of the photoresists 多二极管激光系统用于紫外曝光的光刻胶

Microtechnologies for the New Millennium Pub Date : 2015-06-01 DOI: 10.1117/12.2177568

R. Barbucha, M. Tański, M. Kocik

引用次数: 0

Self-assembly 'micro-origami' photon cages as hollow micro-resonators 自组装“微折纸”光子笼作为空心微谐振器

Microtechnologies for the New Millennium Pub Date : 2015-06-01 DOI: 10.1117/12.2178486

A. Danescu, C. Chevalier, R. Artinyan, P. Regreny, G. Grenet, S. Callard, P. Rojo-Romeo, X. Letartre, J. Leclercq

引用次数: 2

Noise spectroscopy of nano- and microscopic periodic material structures 纳米和微观周期性材料结构的噪声光谱

Microtechnologies for the New Millennium Pub Date : 2015-05-21 DOI: 10.1117/12.2177798

A. Nasswettrová, P. Drexler, J. Seginak, D. Nespor, M. Friedl, P. Marcon, P. Fiala

引用次数: 2

Optical characterization of MEMS-based multiple air-dielectric blue-spectrum distributed Bragg reflectors 基于mems的多空气介质蓝光谱分布Bragg反射器的光学特性

Microtechnologies for the New Millennium Pub Date : 2015-05-21 DOI: 10.1117/12.2178609

M. Ghaderi, N. P. Ayerden, G. de Graaf, R. Wolffenbuttel

{"title":"Optical characterization of MEMS-based multiple air-dielectric blue-spectrum distributed Bragg reflectors","authors":"M. Ghaderi, N. P. Ayerden, G. de Graaf, R. Wolffenbuttel","doi":"10.1117/12.2178609","DOIUrl":"https://doi.org/10.1117/12.2178609","url":null,"abstract":"The optical performance of a distributed Bragg reflector (DBR) is typically the determining factor in many optical MEMS devices and is mainly limited by the number of the periods (number of layers) and the refractive index contrast (RIC) of the materials used. The number of suitable available materials is limited and implementing a large number of periods increases the process complexity. Using air as a low-index material improves the RIC by almost 50% as compared with most conventional layer combinations and hence provides a higher optical performance at a given number of layers. This paper presents the design, fabrication, and optical characterization of multiple air-SiO2 Bragg reflectors with two airgap layers designed for the visible spectrum. Alternate polysilicon deposition and silicon-dioxide growth on the wafers followed by the selective etching of polysilicon layers in a TMAH-based solution results in a layer stack according to the optical design. However, unlike the conventional MEMS processes, fabrication of a blue-band airdielectric DBR demands several sacrificial layers in the range of 100 nm. Therefore, a successful release of the membrane after wet-etching is critical to the successful performance of the device. In this study, several DBRs with two periods have been fabricated using a CO2 supercritical drying process. The wide-area reflection measurements showed a peak reflectance of 65% and an FWHM of about 100 nm for a DBR centered at 500 nm. DBRs centered on 400 nm gave a much wider spectral response. This paper presents preliminary optical characterization results and discusses the challenges for a reflector design in the blue-visible range.","PeriodicalId":232941,"journal":{"name":"Microtechnologies for the New Millennium","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"125558977","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 7

An active reference spring array for in-situ calibration of the normal spring constant of AFM cantilevers 一种用于原位标定AFM悬臂梁法向弹簧常数的主动参考弹簧阵列

Microtechnologies for the New Millennium Pub Date : 2015-05-21 DOI: 10.1117/12.2178850

S. Gao, U. Brand, S. Hahn, K. Hiller

引用次数: 1

Optical design and characterization of a gas filled MEMS Fabry-Perot filter 充气MEMS法布里-珀罗滤波器的光学设计与表征

Microtechnologies for the New Millennium Pub Date : 2015-05-21 DOI: 10.1117/12.2178773

N. P. Ayerden, M. Ghaderi, G. de Graaf, R. Wolffenbuttel

引用次数: 5

Interdigitated design of a thermoelectric microgenerator based on silicon nanowire arrays 基于硅纳米线阵列的热电微发电机的数字化设计

Microtechnologies for the New Millennium Pub Date : 2015-05-21 DOI: 10.1117/12.2178782

I. Donmez, M. Salleras, C. Calaza, J. D. Santos, G. Gadea, Á. Morata, D. Dávila, A. Tarancón, L. Fonseca

{"title":"Interdigitated design of a thermoelectric microgenerator based on silicon nanowire arrays","authors":"I. Donmez, M. Salleras, C. Calaza, J. D. Santos, G. Gadea, Á. Morata, D. Dávila, A. Tarancón, L. Fonseca","doi":"10.1117/12.2178782","DOIUrl":"https://doi.org/10.1117/12.2178782","url":null,"abstract":"Silicon nanowires thermoelectric properties are much better than those of silicon bulk. Taking advantage of silicon microfabrication techniques and compatibilizing the device fabrication with the CVD-VLS silicon nanowire growth, we present a thermoelectric microgenerator based on silicon nanowire arrays with interdigitated structures which enhance the power density compared to previous designs presented by the authors. The proposed design features a thermally isolated silicon platform on the silicon device layer of an SOI silicon wafer. This silicon platform has vertical walls exposing <111< planes where gold nanoparticles are deposited by galvanic displacement. These gold nanoparticles act as seeds for the silicon nanowires. The growth takes place in a CVD with silane precursor, and uses the Vapor-Solid-Liquid synthesis. Once the silicon nanowires are grown, they connect the silicon platform with the silicon bulk. The proposed thermoelectric generator is unileg, which means that only one type of semiconductor is used, and the second connection is made through a metal. In addition, to improve the thermal isolation of the silicon platform, multiple trenches of silicon nanowire arrays are used, up to a maximum of nine. After packaging the device with nanowires, we are able to measure the Seebeck voltage and the power obtained with different operation modes: harvesting mode, where the bottom device is heated up, and the silicon platform is cooled down by natural or forced convection, and test mode, where a heater integrated on the silicon platform is used to produce a thermal gradient.","PeriodicalId":232941,"journal":{"name":"Microtechnologies for the New Millennium","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123661554","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 6

Wafer edge protection kit for MEMS and TSV Si-etching 用于MEMS和TSV硅腐蚀的晶圆边缘保护套件

Microtechnologies for the New Millennium Pub Date : 2015-05-21 DOI: 10.1117/12.2180135

R. Wieland, K. Nguyen, U. Seidelmann, M. Scholz, G. Schrag

{"title":"Wafer edge protection kit for MEMS and TSV Si-etching","authors":"R. Wieland, K. Nguyen, U. Seidelmann, M. Scholz, G. Schrag","doi":"10.1117/12.2180135","DOIUrl":"https://doi.org/10.1117/12.2180135","url":null,"abstract":"A new process kit for a SPTS Pegasus DRIE Si-Etch tool has been developed and tested for several different process regimes, e.g. bulk-Si cavity etching and TSV (through-Silicon-Via) etching with high aspect ratios <10:1, using the socalled Bosch process. Additionally, Si-etch back (recess etching) with a single step process has been tested as well. The especially developed \"edge protection kit\", consisting of Al2O3 material and optionally of PEEK material, covers the edge of a wafer, preventing it from being etched or even being etched away. However, placing such a part on top of the cathode, results in changes of the electric field distribution and the gas flow behavior compared to the standard process kit supplied by SPTS. The consequences may be altered Si-etch rates combined with changes of the tilt and side wall taper of the etched structures, mainly near the outside regions of the wafer. To this end, extensive investigations on the mask and bulk-Si etch rates, the tilt and taper angle of various MEMS test structures and their respective uniformity over the wafer surface have been performed. Additionally, simulations applying Comsol Multiphysics have been carried out to visualize the potential impact of the new process kit on the electrical field distribution. A simplex-optimization was carried out, varying the platen power and source power, in order to improve the tilt and to maintain the proper taper angle. One major advantage of the new process kit design compared to the original one is the reduction of movable parts to a minimum.","PeriodicalId":232941,"journal":{"name":"Microtechnologies for the New Millennium","volume":"25 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2015-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126231276","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0