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Foundations of the relations for calculation of macrostress in electrodeposits 电沉积宏观应力计算关系的基础
Surface Technology Pub Date : 1985-09-01 Epub Date: 2002-10-09 DOI: 10.1016/0376-4583(85)90110-4
Christo N. Kouyumdjiev
{"title":"Foundations of the relations for calculation of macrostress in electrodeposits","authors":"Christo N. Kouyumdjiev","doi":"10.1016/0376-4583(85)90110-4","DOIUrl":"10.1016/0376-4583(85)90110-4","url":null,"abstract":"<div><p>Many relations exist for calculation of the spontaneous macrostress appearing in an electrodeposits plated on one side of a flexible strip cathode. In the present work a schematization of the deposit and the cathode is carried out and their state of stress examined by use of the finite element method. In this way the correctness of the theoretical models and of the more accurate formulae for calculation of macrostress in electrodeposits derived previously is proved. The determination of the force interaction between the deposit and the substrate was further refined, in comparison with that of Popereka.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"26 1","pages":"Pages 45-55"},"PeriodicalIF":0.0,"publicationDate":"1985-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90110-4","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"89897956","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
Study of the electrodeposition process of NiFE alloys from chloride electrolytes: II 氯化物电解液电沉积NiFE合金工艺研究ⅱ
Surface Technology Pub Date : 1985-09-01 Epub Date: 2002-10-09 DOI: 10.1016/0376-4583(85)90108-6
M. Lieder, S. BiaŁŁozor
{"title":"Study of the electrodeposition process of NiFE alloys from chloride electrolytes: II","authors":"M. Lieder,&nbsp;S. BiaŁŁozor","doi":"10.1016/0376-4583(85)90108-6","DOIUrl":"https://doi.org/10.1016/0376-4583(85)90108-6","url":null,"abstract":"<div><p>The cathodic codeposition of nickel and iron from chloride solutions with organic additives (D-mannitol, citric or ascorbic acids) has been investigated. It was found that the ratio of the concentrations of iron and nickel in the deposit was always higher that <em>c</em><sub>Fe<sup>2+</sup></sub>/<em>C</em><sub>Ni<sup>2+</sup></sub> in the electrolytes irrespective of the buffer capacity of the solution. The experimental results obtained did not confirm the theory of Dahms and Croll.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"26 1","pages":"Pages 23-34"},"PeriodicalIF":0.0,"publicationDate":"1985-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90108-6","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"137208565","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
A short review of the effect of bismuth of lead-cell electrotechnology 铋对铅电池电解技术的影响综述
Surface Technology Pub Date : 1985-09-01 Epub Date: 2002-10-09 DOI: 10.1016/0376-4583(85)90106-2
S.R. Ellis, M. Johnson, M.P.J. Brennan, N.A. Hampson
{"title":"A short review of the effect of bismuth of lead-cell electrotechnology","authors":"S.R. Ellis,&nbsp;M. Johnson,&nbsp;M.P.J. Brennan,&nbsp;N.A. Hampson","doi":"10.1016/0376-4583(85)90106-2","DOIUrl":"10.1016/0376-4583(85)90106-2","url":null,"abstract":"<div><p>Bismuth in some respets behaves like antimony in the lead cell; as such it is of interest. This review notes the limited amount of work available in the literature.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"26 1","pages":"Pages 11-16"},"PeriodicalIF":0.0,"publicationDate":"1985-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90106-2","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"81030248","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Initial stress in an electrodeposited layer formed on a bending strip cathode 在弯曲带状阴极上形成的电沉积层中的初始应力
Surface Technology Pub Date : 1985-09-01 Epub Date: 2002-10-09 DOI: 10.1016/0376-4583(85)90111-6
Christo N. Kouyumdjiev
{"title":"Initial stress in an electrodeposited layer formed on a bending strip cathode","authors":"Christo N. Kouyumdjiev","doi":"10.1016/0376-4583(85)90111-6","DOIUrl":"10.1016/0376-4583(85)90111-6","url":null,"abstract":"<div><p>Through a generalization of the theoretical model proposed in previous work, a number of relations have been derived for calculating the initial stress and the initial strains occuring in the course of the formation of an arbitrary electrodeposited layer on a bending elastic strip cathode. The results have been verified by means of the finite element method. They provide a new basis for or an opportunity to improve the accuracy of some of the relations used in the investigation of electrocrystallization processes.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"26 1","pages":"Pages 57-66"},"PeriodicalIF":0.0,"publicationDate":"1985-09-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90111-6","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"90259260","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
An electrochemical approach to the interfaces in metal-vacuum-metal arcs: Comparison and contrast with the metal-electrolyte-metal situation 金属-真空-金属电弧界面的电化学研究:与金属-电解质-金属情况的比较
Surface Technology Pub Date : 1985-08-01 Epub Date: 2002-10-09 DOI: 10.1016/0376-4583(85)90085-8
Ashok K. Vijh
{"title":"An electrochemical approach to the interfaces in metal-vacuum-metal arcs: Comparison and contrast with the metal-electrolyte-metal situation","authors":"Ashok K. Vijh","doi":"10.1016/0376-4583(85)90085-8","DOIUrl":"10.1016/0376-4583(85)90085-8","url":null,"abstract":"<div><p>A novel conceptual approach treating metal-vacuum-metal sandwiches in the arc regime as electrolysis cells is presented. A qualitative comparison and contrast between the fundamental features of the two devices is carried out. The cathode fall region of the arc is shown to be a type of “double” layer region as for the ordinary metal-electrolyte interface. A schematic description of the metal-plasma interphasic region (<em>i.e</em>, the cathode fall) is given in electrochemical terms. The concepts provide an electrochemical model for the quantitative calculation of the magnitudes of the electrode potentials appropriate to the metal-plasma interfaces obtaining at the cathodes of arcs. It is pointed out that the agreement between the experimental cathode fall values and those calculated on the basic of the electrochemical model previously by us is excellent for thirty-two metals for which reliable experimental <em>V</em><sub>c</sub> values are available in the literature.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 4","pages":"Pages 335-341"},"PeriodicalIF":0.0,"publicationDate":"1985-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90085-8","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"82333759","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 10
The kinetics of silicon dioxide chemical vapour deposition I: Surface chemical reactions 二氧化硅化学气相沉积动力学ⅰ:表面化学反应
Surface Technology Pub Date : 1985-08-01 Epub Date: 2002-10-09 DOI: 10.1016/0376-4583(85)90082-2
Piotr B. Grabiec, Jan Przyłuski
{"title":"The kinetics of silicon dioxide chemical vapour deposition I: Surface chemical reactions","authors":"Piotr B. Grabiec,&nbsp;Jan Przyłuski","doi":"10.1016/0376-4583(85)90082-2","DOIUrl":"10.1016/0376-4583(85)90082-2","url":null,"abstract":"<div><p>The process of SiO<sub>2</sub> deposition by oxidizing silane with oxygen is widely applied in manufacturing integrated circuits. However, its mechanism and kinetics are not fully understood. In this paper a general analysis of chemical vapour deposition of silicon dioxide is presented. In the first part, it is pointed out that in the case of low temperature SiO<sub>2</sub> deposition it is necessary to consider all process stages, <em>i.e.</em> diffusion, adsorption and chemical reactions. The electron structures of reagents are analysed. As a result of these studies a mechanism for the surface reactions is proposed.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 4","pages":"Pages 307-313"},"PeriodicalIF":0.0,"publicationDate":"1985-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90082-2","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80463255","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
A study on krypton adsorption on uranium dioxide kernels 二氧化铀核对氪的吸附研究
Surface Technology Pub Date : 1985-08-01 Epub Date: 2002-10-09 DOI: 10.1016/0376-4583(85)90088-3
A.F. Bishay
{"title":"A study on krypton adsorption on uranium dioxide kernels","authors":"A.F. Bishay","doi":"10.1016/0376-4583(85)90088-3","DOIUrl":"10.1016/0376-4583(85)90088-3","url":null,"abstract":"<div><p>The monolayer capacity in the physical adsorption of krypton or point B, <em>i.e.</em> the point defining the beginning of the plateau region of the S-shaped isotherm, was used to determine the number of statistical layers <span><math><mtext>n </mtext><mtext>V</mtext><mtext>V</mtext><msub><mi></mi><mn>m</mn></msub></math></span>).</p><p>In the absence of capillary condensation, the <em>V</em>−<em>n</em> plot was a straight line with slope <span><math><mtext>V</mtext><mtext>n</mtext></math></span> or <em>V</em><sub>m</sub>. When extrapolated to <em>V</em> = 0, this line intersected the axes at the origin. The two conditions that the data points fit a straight line and that this line may be extrapolated to the origin combine to make a <em>V</em>−<em>n</em> plot a rigorous test for both the accuracy of the <em>n</em> values and the isotherm data.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 4","pages":"Pages 363-367"},"PeriodicalIF":0.0,"publicationDate":"1985-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90088-3","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"72651085","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
The rotational friction characteristics of human long bones 人类长骨的旋转摩擦特性
Surface Technology Pub Date : 1985-08-01 DOI: 10.1016/0376-4583(85)90090-1
J. A. Fraunhofer, L. Schaper, D. Seligson
{"title":"The rotational friction characteristics of human long bones","authors":"J. A. Fraunhofer, L. Schaper, D. Seligson","doi":"10.1016/0376-4583(85)90090-1","DOIUrl":"https://doi.org/10.1016/0376-4583(85)90090-1","url":null,"abstract":"","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"224 1","pages":"377-383"},"PeriodicalIF":0.0,"publicationDate":"1985-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73155583","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
The rotational friction characteristics of human long bones 人类长骨的旋转摩擦特性
Surface Technology Pub Date : 1985-08-01 Epub Date: 2002-10-09 DOI: 10.1016/0376-4583(85)90090-1
J.A. Von Fraunhofer, L.A. Schaper, D. Seligson
{"title":"The rotational friction characteristics of human long bones","authors":"J.A. Von Fraunhofer,&nbsp;L.A. Schaper,&nbsp;D. Seligson","doi":"10.1016/0376-4583(85)90090-1","DOIUrl":"https://doi.org/10.1016/0376-4583(85)90090-1","url":null,"abstract":"<div><p>The rotational friction characteristics of unembalmed human long bones (femora and tibiae) have been determined following osteotomy (surgical sectioning). The coefficients of static and kinetic friction were determined for bones cut with a Gigli saw and an oscillating saw as well as for bones ground to a 17 μm silicon carbide finish. It was found that there was no difference in the coefficients of static and kinetic friction for both types of bone when cut by surgical saws but the coefficients obtained were greater than those for ground bones. The results suggest that bone-bone friction is a function of the type of bone, its surface finish and the degree of bone-bone interdigitation arising from the apposition force used to reduce anatomically the osteotomy.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 4","pages":"Pages 377-383"},"PeriodicalIF":0.0,"publicationDate":"1985-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90090-1","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"91621133","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Ellipsometric studies of silicon dioxide films on silicon 二氧化硅薄膜在硅上的椭偏性研究
Surface Technology Pub Date : 1985-08-01 Epub Date: 2002-10-09 DOI: 10.1016/0376-4583(85)90081-0
S. Yaghmour , W.E.J. Neal
{"title":"Ellipsometric studies of silicon dioxide films on silicon","authors":"S. Yaghmour ,&nbsp;W.E.J. Neal","doi":"10.1016/0376-4583(85)90081-0","DOIUrl":"10.1016/0376-4583(85)90081-0","url":null,"abstract":"<div><p>Ellipsometry is demonstrated to be an appropriate technique for measuring the thickness of silicon dioxide films grown thermally and by an r.f. glow discharge deposition technique in commercial equipment. Optical anisotropy has been observed in thermally grown oxide layers on crystalline (111) and (100) silicon by rotating the samples (in an ellipsometer) about a normal to the sample surface. The degree of anisotropy of films on silicon (111) was found to be dependent on the oxide thickness and decreased to about zero with time at an annealing temperature of 950 °C. The changes in the optical constant produced by rotation increased from 1 × 10<sup>-3</sup> to 8 × 10<sup>-3</sup> with an increase in oxide thickness from 400 to 1000 nm and decreased for thicker films. No anisotropy was observed in thermally grown films or for films deposited by an r.f. glow discharge for thicknesses less than 400nm.</p></div>","PeriodicalId":22037,"journal":{"name":"Surface Technology","volume":"25 4","pages":"Pages 297-305"},"PeriodicalIF":0.0,"publicationDate":"1985-08-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"https://sci-hub-pdf.com/10.1016/0376-4583(85)90081-0","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"73301107","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 5
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