金属-真空-金属电弧界面的电化学研究:与金属-电解质-金属情况的比较

Ashok K. Vijh
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引用次数: 10

摘要

提出了一种将电弧区金属-真空-金属夹层作为电解池的新概念方法。对这两种装置的基本特性进行了定性比较和对比。电弧的阴极落区表现为与普通金属-电解质界面类似的一种“双”层区。用电化学术语给出了金属-等离子体间相区(即阴极跌落)的示意图。这些概念为定量计算电弧阴极处金属-等离子体界面电极电位的大小提供了一个电化学模型。文中指出,对于文献中已有可靠的实验Vc值的32种金属,实验阴极降值与我们先前的电化学模型计算值吻合良好。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
An electrochemical approach to the interfaces in metal-vacuum-metal arcs: Comparison and contrast with the metal-electrolyte-metal situation

A novel conceptual approach treating metal-vacuum-metal sandwiches in the arc regime as electrolysis cells is presented. A qualitative comparison and contrast between the fundamental features of the two devices is carried out. The cathode fall region of the arc is shown to be a type of “double” layer region as for the ordinary metal-electrolyte interface. A schematic description of the metal-plasma interphasic region (i.e, the cathode fall) is given in electrochemical terms. The concepts provide an electrochemical model for the quantitative calculation of the magnitudes of the electrode potentials appropriate to the metal-plasma interfaces obtaining at the cathodes of arcs. It is pointed out that the agreement between the experimental cathode fall values and those calculated on the basic of the electrochemical model previously by us is excellent for thirty-two metals for which reliable experimental Vc values are available in the literature.

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