Surface & Coatings Technology最新文献

{"title":"Low temperature dependence of resistivity in obliquely sputter-deposited gold thin films","authors":"Nicolas Martin ,&nbsp;Eliot Martin ,&nbsp;Jean-Marc Cote ,&nbsp;Fabrice Sthal ,&nbsp;Joseph Gavoille ,&nbsp;Marina Raschetti ,&nbsp;Stefania Oliveri","doi":"10.1016/j.surfcoat.2025.131884","DOIUrl":"10.1016/j.surfcoat.2025.131884","url":null,"abstract":"<div><div>We report on the electrical resistivity at low temperature of Au thin films 400 nm thick deposited by DC magnetron sputtering using oblique angle deposition (OAD). The deposition angle <em>α</em> is gradually and systematically changed from 0° to 80°. A tilted and voided columnar structure is produced for deposition angles higher than 60°, whereas the lowest angles lead to a dense and compact structure with no clear cross-section morphology. Resistivity <em>vs.</em> temperature measurements reveal a typical metallic-like behavior in the range 7–300 K whatever the deposition angle. The latter gives rise to a significant increase of residual resistivity and temperature coefficient of resistance, and again for the most grazing angles, <em>i.e.</em>, α &gt; 60°. The Bloch-Grüneisen model is assumed for understanding the evolution of electron-phonon interactions as a function of the deposition angle. This enhanced resistivity is connected to the structural defects and the porous architecture especially emphasized for glancing angles, and the strengthening of the electron-phonon coupling for high deposition angles.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"499 ","pages":"Article 131884"},"PeriodicalIF":5.3,"publicationDate":"2025-02-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143224794","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Achieving a crackless, abrasion- and corrosion-resistant oxide coating on Ti-Zr-Hf-Nb-Al-Y refractory high-entropy alloy through Y alloying and high-temperature fast oxidation","authors":"Nengbin Hua ,&nbsp;Rui Wang ,&nbsp;Zhongya Qian ,&nbsp;Rongpei Shi ,&nbsp;Da Zeng ,&nbsp;Xiongwei Liang ,&nbsp;Xinxiong Xiao ,&nbsp;Hanxin Lin ,&nbsp;Wenfei Lu ,&nbsp;Jun Shen ,&nbsp;Peter K. Liaw","doi":"10.1016/j.surfcoat.2025.131882","DOIUrl":"10.1016/j.surfcoat.2025.131882","url":null,"abstract":"<div><div>High-temperature oxidation is a facile technique to fabricate a wear- and corrosion-resistant oxide coating for metals. However, TiZrHfNb-based refractory high-entropy alloys (RHEAs) are prone to suffer from surface cracking during high-temperature oxidation processes, which is a common outcome observed in the high-temperature oxidation behavior of titanium alloys. This study introduces a novel approach to mitigate high-temperature oxidation cracking in the TiZrHfNbAl_0.5 RHEA by leveraging the synergistic effects of Y-alloying and precise oxidation control. It's found that surface cracking observed in the TiZrHfNbAl_0.5 RHEA following oxidation at 1000 °C is primarily attributed to the formation of needle-like (ZrHf)O₂ within the oxide layer. By combining Y-doping and an oxidation treatment at 1000 °C for 8 min, the generation of (ZrHf)O₂ is effectively suppressed, while a dispersion Y-Al-rich oxides is promoted, thereby creating a pinning effect that results in the formation of a crack-free oxide coating. Consequently, the oxidized TiZrHfNbAl_0.5Y_0.1 RHEA exhibits a wear rate that is two orders of magnitude lower and a corrosion current density that is one order of magnitude lower than those of the Ti6Al4V (wt%) alloy. A systematic analysis is also carried out to elucidate the oxidation mechanism underpinning this exceptionally wear- and corrosion-resistant RHEA. The present work offers new possibilities for the industrial applications of RHEAs in abrasive and corrosive environments.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"499 ","pages":"Article 131882"},"PeriodicalIF":5.3,"publicationDate":"2025-02-05","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143225060","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Electrochemical preparation of supersaturated solid solution ZnFe alloy coating on mild steel from ChCl-EG deep eutectic solvents for corrosion protection","authors":"Xiuling Yan,&nbsp;Cunying Xu,&nbsp;Tongjiang Tian,&nbsp;Anan Song","doi":"10.1016/j.surfcoat.2025.131880","DOIUrl":"10.1016/j.surfcoat.2025.131880","url":null,"abstract":"<div><div>The Zn<img>Fe alloy coating on mild steel was produced through electrodeposition from a choline chloride-ethylene glycol (ChCl-EG) deep eutectic solvent (DES) containing ZnCl₂ and FeCl₂ at a temperature of 343 K. Although the reduction potential of Zn(II) is more negative than of Fe(II), but the presence of Fe(II) ions facilitates the under-potential deposition of Zn. A dense and uniform Zn<img>Fe alloy coating devoid of hydrogen brittleness can be achieved at low current density (3–5 mA cm⁻²) with a modest <em>C</em>_Zn(II)/<em>C</em>_Fe(II) ratio, specifically between 3:1 and 5:1. Increasing the <em>C</em>_Zn(II)/<em>C</em>_Fe(II) ratio in the bath while increasing the current density leads to a decrease in the iron content of the Zn<img>Fe alloy coating. The crystal structure and corrosion resistance of these coatings on mild steel are contingent upon deposition condition and their composition. At moderately high current density (≥5 mA cm⁻²), Zn<img>Fe alloy with an iron content between 8.5 at.% to 14.0 at.% exhibits a supersaturated solid solution phase (η-phase), whereas an increase in Fe content to 18.2 at.% leads to a mixed phase comprising η, FeZn₁₅ and Fe₄Zn₉ phases. Additionally, as current density decreases, similar iron contents (14.2 ∼ 14.7 at.%) yield mixtures including η, Γ₁,and FeZn₁₅ phase within the resultant alloys. Notably, a Zn<img>Fe alloy containing approximately 14.0 at.% Fe on mild steel demonstrates optimal corrosion resistance in 3.5 wt% NaCl solution due to its dense microstructure coupled with appropriate iron content levels. These results offer a promising approach for fabricating dense Zn<img>Fe alloy coating owing to its simplicity, non-polluting nature, efficiency, and absence of hydrogen evolution.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"499 ","pages":"Article 131880"},"PeriodicalIF":5.3,"publicationDate":"2025-02-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143178656","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Analysis of the stress field by finite element model in boride layers formed in the Inconel 718 superalloy","authors":"T.N. Cabrera-Yacuta ,&nbsp;G.A. Rodríguez-Castro ,&nbsp;A. Meneses Amador ,&nbsp;I. Arzate-Vázquez ,&nbsp;O. Morales-Contreras ,&nbsp;I.E. Campos-Silva ,&nbsp;M.A. Melo Pérez","doi":"10.1016/j.surfcoat.2025.131874","DOIUrl":"10.1016/j.surfcoat.2025.131874","url":null,"abstract":"<div><div>This research numerically investigates the stress fields in boride layers on Inconel 718 superalloy, generated by Vickers indentations at various distances from the system interface in cross-sectional views. Three powder-pack boriding conditions at 850, 900, and 950 °C for 2, 4, and 6 h, respectively, were applied to Inconel 718. Employing X-ray diffraction, mainly the Ni₄B₃, Ni₂B, and Ni₃B phases were identified. In addition, a hardness (H) range between 23.8 and 26 GPa was determined by Berkovich instrumented indentation, while 280 to 380 GPa for Young's modulus (E). Vickers indentations were made in a load range between 200 and 1500 N at different distances from the diffusion zone towards the substrate. The cracks were identified in the boride layer without advancing to the substrate or at the interface with the diffusion zone and only the thinnest thickness presented delamination at 1500 N. The stress fields were analyzed using the finite element method with explicit dynamic analysis. The numerical model consists of a Vickers indenter modeled as a discrete, rigid body and a 3D deformable solid defined through cross sections. As the layer thickness increases, the system becomes less sensitive to applied loads, and the magnitude of the stress fields decreases. Simulation results indicate that maximum principal stresses lead to cracking within the layer, while the shear stresses are insufficient to cause delamination. Forming layers with low porosity is crucial to avoid stress concentrators that could eventually propagate into cracks. The thickest layer/substrate system, produced at 950 °C for 6 h, demonstrates greater resistance to cracking.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"498 ","pages":"Article 131874"},"PeriodicalIF":5.3,"publicationDate":"2025-02-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143178847","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Contribution to the understanding of antibacterial properties of CuTiZn thin film: From crystalline alloy to metallic glass","authors":"D. Boivin ,&nbsp;P. Birnal ,&nbsp;P. Brault ,&nbsp;F. Brulé-Morabito ,&nbsp;A. Caillard ,&nbsp;E. Bourhis ,&nbsp;P. Andreazza ,&nbsp;B. Aspe ,&nbsp;T. Vaubois ,&nbsp;E. Menou ,&nbsp;M. Cavarroc-Weimer ,&nbsp;A.L. Thomann","doi":"10.1016/j.surfcoat.2025.131879","DOIUrl":"10.1016/j.surfcoat.2025.131879","url":null,"abstract":"<div><div>In this work, thin films of CuZn and CuTiZn alloys were synthesized by magnetron sputter deposition. Their antibacterial activity on the proliferation of <em>Escherichia coli</em> was investigated after incubation during 24 h at 37.0 °C by measuring the bacteria solution absorbance at 600 nm. Among tests usually employed in laboratories to evaluate the antibacterial properties of coatings, this one specially characterizes the action of chemical elements dissolved in the solution, i.e. the so-called release killing mechanism. The obtained results are discussed depending on the film chemical composition (in depth and at the surface), microstructure and crystallinity. A good antibacterial activity was found for pure Zn and CuZn films, whereas a rapid degradation was observed as soon as Ti is added, which coincides with the formation of a dense amorphous phase. At close chemical compositions, formation of this stable metallic glass phase seems to be detrimental to the ion release mechanism. This work highlighted that the microstructural and crystalline properties (more or less porous polycrystalline film/dense, defect free metallic glass) significantly influence the antibacterial properties of such alloy thin films.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"499 ","pages":"Article 131879"},"PeriodicalIF":5.3,"publicationDate":"2025-02-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143177133","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Two-step large-area synthesis of Bi2Se3 topological insulator thin films via bismuth evaporation and selenization","authors":"Dae-Hyung Cho ,&nbsp;Tae-Ha Hwang ,&nbsp;Yong-Duck Chung ,&nbsp;So-Young Lim ,&nbsp;Woo-Jung Lee","doi":"10.1016/j.surfcoat.2025.131878","DOIUrl":"10.1016/j.surfcoat.2025.131878","url":null,"abstract":"<div><div>Bi₂Se₃ is recognized as one of the most promising topological insulators, with substantial potential for industrial applications, particularly as a qubit in quantum computing. Realizing large-area growth using cost-effective methods is crucial for practical applications. This study presents an innovative approach for fabricating high-quality large-area Bi₂Se₃ thin films by combining Bi thermal evaporation with cracker selenization, which inherently supports scalability. The amorphous precursor—a Bi film capped with a Se layer—reacts with highly reactive cracked Se, forming crystalline Bi₂Se₃ thin films with layered structures. Prolonged selenization enhances the crystallinity of the Bi₂Se₃ thin films and significantly reduces their oxygen content by effectively substituting the O atoms with Se atoms. Thicker precursors require extended selenization to improve their crystallinity and are more susceptible to stress. Electrical transport measurements of Bi₂Se₃ films formed via selenization for 8 h reveal a long phase coherence length of &gt;375 nm and a single surface state with a spin texture, which are unique properties of topological insulators. Uniform physical and optical properties are achieved across a substrate with a large 4-in diameter under optimized conditions. This novel method exhibits great potential for the industrial fabrication of high-quality large-area Bi₂Se₃ topological insulator thin films.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"499 ","pages":"Article 131878"},"PeriodicalIF":5.3,"publicationDate":"2025-02-03","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143177134","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"OA","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"One-step fabrication of wear resistant and friction-reducing Al2O3/MoS2 nanocomposite coatings on 2A50 aluminum alloy by plasma electrolytic oxidation with MoS2 nanoparticle additive","authors":"Min Zhang ,&nbsp;Xining Ma ,&nbsp;Siyang Zhang ,&nbsp;Liyan Hou ,&nbsp;Kwang Ho Kim","doi":"10.1016/j.surfcoat.2025.131796","DOIUrl":"10.1016/j.surfcoat.2025.131796","url":null,"abstract":"<div><div>Wear resistant and friction-reducing Al₂O₃/MoS₂ nanocomposite coatings were fabricated in-situ on 2A50 aluminum alloy substrate using one-step plasma electrolytic oxidation in silicate electrolyte solution with MoS₂ nanoparticle addition. The effect of MoS₂ incorporation on microstructure and wear resistance of the obtained ceramic coatings was investigated by regulating the concentration of MoS₂ nanoparticle. Phase structure, microstructure, composition and wear resistance of the ceramic coatings were characterized by XRD, SEM, EDS, profilometer and ball-on-disc friction and wear tester. The results show that the anodic voltage of micro-arc discharge stage increased with the increasing of MoS₂ concentration and the prepared ceramic coatings were mainly composed of α-Al₂O₃, γ-Al₂O₃, MoS₂, and mullite phases. The EDS mapping results show Mo and S elements were evenly distributed in the ceramic coatings indicating the formation of Al₂O₃/MoS₂ nanocomposite coatings. Friction performance evaluation shows that the ceramic coatings obtained at the MoS₂ nanoparticle concentration of 4 g/L exhibit the best wear resistance and antifriction property. During the friction and wear test, the protective lubricant film formed between ceramic layer and grinding parts is the largest and the average friction coefficient is the lowest, as low as 0.1. The wear rate was the lowest (about 5.28 × 10⁻⁴ cm³·N⁻¹·m⁻¹). It can be concluded that MoS₂ can play a good antifriction and lubrication effect in ceramic layer, optimize the microstructure of ceramic layer, and improve the wear resistance of ceramic layer.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"497 ","pages":"Article 131796"},"PeriodicalIF":5.3,"publicationDate":"2025-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143142866","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Optical properties in well and barrier single-mode Nd:YLiF4 waveguides formed under 300 keV H-ion irradiation","authors":"Mei Qiao ,&nbsp;Tiejun Wang ,&nbsp;Yong Liu ,&nbsp;Guofeng Liu ,&nbsp;Ran Jia ,&nbsp;Wanling Cui ,&nbsp;Xiaoxin Wang ,&nbsp;Zhenxing Wang ,&nbsp;Xin Li ,&nbsp;Shicai Xu","doi":"10.1016/j.surfcoat.2025.131791","DOIUrl":"10.1016/j.surfcoat.2025.131791","url":null,"abstract":"<div><div>A “well+barrier”-type, single-mode optical waveguide structure was created in a Nd:YLiF₄ (Nd:YLF) crystal through H-ion irradiation at an energy level of 300 keV and a fluence of 5.6 × 10¹⁶ ions/cm². The electronic energy loss (<em>S</em>_<em>e</em>) and nuclear energy loss (<em>S</em>_<em>n</em>) induced by inelastic and elastic collisions, respectively, were simulated using the SRIM 2013 software. The cross-sectional image of the Nd:YLF crystal after H-ion irradiation was captured using a microscope. The prism coupling and end-face coupling methods were utilized to capture the effective refractive index of waveguide modes and near-field intensity distributions. The spectral characteristics of the Nd:YLF crystal were examined after H-ion irradiation based on absorption spectra and Raman spectra. This study is of considerable significance for the advancement of integrated optical devices utilizing Nd:YLF crystals.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"497 ","pages":"Article 131791"},"PeriodicalIF":5.3,"publicationDate":"2025-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143142868","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Effect of interface states on capacitance-voltage characteristics of CdZnTe crystals after surface oxidation","authors":"Xiaoyan Liang ,&nbsp;Xuan Zhu ,&nbsp;Jijun Zhang ,&nbsp;Chen Xie ,&nbsp;Wenxuan Yang ,&nbsp;Bo Zhang ,&nbsp;Linjun Wang ,&nbsp;Jian Huang ,&nbsp;Jiahua Min","doi":"10.1016/j.surfcoat.2025.131790","DOIUrl":"10.1016/j.surfcoat.2025.131790","url":null,"abstract":"<div><div>The interface states of TeO₂/CdZnTe affects the capacitance voltage characteristics of metal oxide semiconductor (MIS) structured CdZnTe devices. Based on numerical simulations, the interface states exhibit a capacitance hump in the depletion region of the C<img>V curve, which is influenced by substrate doping concentration, frequency, interface state density, and energy level position. According to microstructure and component analysis by high resolution transmission electron microscope and energy dispersive spectroscopy (HRTEM-EDS), MIS-CdZnTe devices with TeO₂ passivation layer of 142–173 nm and limited oxygen diffusion region as interface layers were prepared by NH₄F/H₂O₂ passivation and CMP/NaClO oxidation, respectively, and then used for experimental capacitance characteristic measurement. The results show that the hump capacitance of MIS-CdZnTe prepared by passivation gradually decreases with increasing frequency, consistent with the simulation results, but presents relatively gentle due to the actual interface states with multiple energy levels. Moreover, the influence mechanism of interface traps on C<img>V curve is analyzed using band plots. In addition, the interface state density of MIS-CdZnTe structure is calculated using conductance method, which indicates that the interface state density of MIS- CdZnTe structure prepared by CMP/NaClO method is less than 1/3 that of passivation method (2.11 × 10¹⁰ cm⁻² eV⁻¹), presenting no obvious hump capacitance was observed in its C<img>V curves at low frequencies. Therefore, passivation forms an uneven thickness oxide interface layer between CdZnTe and TeO₂, resulting in a higher density of interface states. While CMP/NaClO treatment forms a limited oxygen diffusion zone and achieves a smooth and dense interface, which can reduce the interface recombination rate, leading to a smaller leakage current (0.067 nA/mm² @ 100 V) for MIS-CdZnTe device, and improving spectral performance of the energy resolution from 11.4 % to 7.7 %.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"497 ","pages":"Article 131790"},"PeriodicalIF":5.3,"publicationDate":"2025-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143142871","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Studies of H ions irradiation damage of CdTe crystal detector","authors":"Meng Cao ,&nbsp;Zexin Wang ,&nbsp;Weifan He ,&nbsp;Zhenzhao Zhang ,&nbsp;Qingzhi Hu ,&nbsp;Liying Sun ,&nbsp;Jian Huang ,&nbsp;Linjun Wang","doi":"10.1016/j.surfcoat.2025.131776","DOIUrl":"10.1016/j.surfcoat.2025.131776","url":null,"abstract":"<div><div>CdTe has a wide range of applications in nuclear radiation detectors. However, it will be seriously damaged by irradiation in space and easily lead to device failure. This article primarily focuses on using two software packages in SRIM (Stopping and Range of Ions in Matter) to simulate and study the irradiation damage of CdTe materials. The penetration abilities of irradiated H ions, He ions, and Ar ions inside CdTe crystals were studied firstly. And H ions were selected because of its irradiation damage was distributed wholely inside CdTe crystals. Then, the ion irradiation depth, ion distribution position, and vacancy generation under various energy and dose of H ions were studied. And ²⁴¹Am energy spectrum responses and charge induction efficiency (CIE) of CdTe detectors influenced by H ion irradiation were investigated. The research results are contributive to improve the application of CdTe detectors in the filed of nuclear radiation detection.</div></div>","PeriodicalId":22009,"journal":{"name":"Surface & Coatings Technology","volume":"497 ","pages":"Article 131776"},"PeriodicalIF":5.3,"publicationDate":"2025-02-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"143142873","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":2,"RegionCategory":"材料科学","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}