Optical Systems Design最新文献

{"title":"A priori information in ptychographic image reconstruction for EUV mask metrology","authors":"R. Nebling, I. Mochi, Hyun-su Kim, A. Dejkameh, Tao Shen, Y. Ekinci","doi":"10.1117/12.2600233","DOIUrl":"https://doi.org/10.1117/12.2600233","url":null,"abstract":"EUV photomasks define the lithographic layers of chips, which are binary structures of relatively low versatility in contrast to specimen in biology or materials science. This knowledge can be used in EUV photomask imaging and inspection methods to improve the speed or sensitivity. We present here a total variation-based phase retrieval algorithm similar to previous methods by Chang et al. and Enfedaque et al. for EUV mask imaging and metrology. Total variation (TV) regularization exploits the binary structure of the reticles, enforcing a sparse sample gradient. We compare the TV regularized algorithm, PtychoADMM, to a standard phase retrieval approach, the difference map (DM). For simulated data containing Poisson noise, we do not observe a benefit from using the TV based PtychoADMM algorithm. The reconstructed image quality is similar, while PtychoADMM being a computationally more demanding method. In future, we will investigate if TV can recover information where the standard DM approach fails, e.g. for relaxed measurement requirements like a lower signal to noise ratio or less probe overlap in the ptychography scan.","PeriodicalId":217586,"journal":{"name":"Optical Systems Design","volume":"2 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-14","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"123955821","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"A study on sputtered ultrathin chromium films for optical applications","authors":"A. Belosludtsev, A. Sytchkova, Kazimieras Baltrušaitis, T. Gric","doi":"10.1117/12.2604097","DOIUrl":"https://doi.org/10.1117/12.2604097","url":null,"abstract":"Structural, optical, and electrical properties of ultrathin chromium films manufactured using magnetron sputtering were investigated. The films showed pure metallic chromium phase yet their refractive index and extinction coefficient result very different from previously reported in literature. Structural, electrical and optical properties of ultrathin chromium layers are discussed in detail. The obtained optical constants of ultrathin chromium films show a specific trend with the film thickness increase. Precise knowledge of optical constants of ultrathin chromium films is important for many electro-optical and optical applications.","PeriodicalId":217586,"journal":{"name":"Optical Systems Design","volume":"183 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134216342","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Modeling interference using Monte Carlo ray trace","authors":"W. Cassarly, A. Lin","doi":"10.1117/12.2596775","DOIUrl":"https://doi.org/10.1117/12.2596775","url":null,"abstract":"Monte Carlo ray tracing has been shown to be both a robust and reliable method for optical modeling of illumination systems. The typical approach traces rays through an optical system and averages the rays in spatial and angular bins to provide estimates of the illuminance and intensity. While Monte Carlo methods are commonly used with incoherent sources, they can also be used with coherent sources. The primary difference between the two simulation types is the inclusion of the phase difference between binned rays in the illuminance and intensity calculations. The phase information can be stored in a ray’s optical path length, which is updated as a ray is traced through a system and when a ray encounters specific interfaces, such as the π phase shift due to a reflection from a surface of higher index. Thus, when careful consideration is given to the phase changes that occur during a ray trace, it is possible to use Monte Carlo methods to model illumination systems that require coherent sources, such as interferometers. Furthermore, with the ability to model coherent sources, beamlet based approaches are also effective. Comparisons are presented. In general, a common challenge for Monte Carlo simulations is the large number of needed rays to overcome statistical noise. However, it is possible to reduce the number of traced rays using various methods, such as: source aiming, scatter aiming, and Backwards Ray Trace. These methods minimize the number of traced rays by using knowledge of the system to selectively avoid tracing rays which will not contribute meaningful data to the output distribution. Monte Carlo ray tracing can also be computationally expensive. To prevent rerunning a costly simulation, it is advantageous to save the traced rays and post process the data for further analysis and studies. For example, the rays can be defocused to a plane at a different distance, re-binned for a difference receiver resolution, or filters can be used to remove rays based on specific criteria like whether they passed through a specific surface. This paper is organized with three main sections. First, we discuss Monte Carlo ray tracing to model interference. The second discusses Monte Carlo ray tracing for modeling diffraction using a Huygens-Fresnel approach. The last summarizes the paper.","PeriodicalId":217586,"journal":{"name":"Optical Systems Design","volume":"19 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131225166","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Some first-order and higher-order statistical properties of polarization speckle","authors":"S. Xiao, Jianlin Nie, S. Hanson, M. Takeda, Wen Wang","doi":"10.1117/12.2600101","DOIUrl":"https://doi.org/10.1117/12.2600101","url":null,"abstract":"In this paper, we revisit the role of polarization and coherence in the study of polarization speckle. It is shown that the type of polarization and coherence used in such analysis has an important difference from the \"classical\" polarization and coherence concepts. The analogy between polarization speckle and partially polarized thermal radiation is explored. We propose a concept referred to as ensemble-average polarization and coherence for statistical optics and give the definition and physical indication for polarization speckle. Some statistics associated with polarization speckle including the 1st order statistical statistics of the Stokes parameters and the ensemble-average Van Cittert-Zernike theorem for the ensembled-average generalized Stokes parameters are investigated theoretically and experimentally to demonstrate their link and different physical features as compared with the conventional concepts.","PeriodicalId":217586,"journal":{"name":"Optical Systems Design","volume":"7 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"129313564","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Development of method for measuring a light energy distribution over foci for mould of diffractive component of bifocal intraocular lens","authors":"V. Korolkov, P. E. Konoshenko, S. L. Mikerin, D. Belousov, A. I. Malyshev, S. K. Golubtsov","doi":"10.1117/12.2597112","DOIUrl":"https://doi.org/10.1117/12.2597112","url":null,"abstract":"Bifocal diffractive-refractive intraocular lenses (BDRIOL) are used in ophthalmology to replace natural lenses that are clouded by cataracts. In Russia, the REPER-NN enterprise developed a BDRIOL manufacture technology on the base of a liquid photopolymer frontal polymerization placed between two transparent fused silica moulds. One of them has a spherical shape, the other has a flat surface with a diffractive optical element (DOE). In our BDRIOL design the diffractive structure depth changes so that the energy distribution over the foci weakly depends on the pupil diameter. Zeroth and first orders efficiencies should almost the same. Measurement of this distribution is complicated due to the diffractive profile depth corresponds to the operation of a polymer lens in the eye and is significantly greater than required for working in air. We have proposed to use temporal planarization of the diffractive mould to measure energy distribution over foci. The diffractive structure is filled with a material that provides approximately the same module of refractive index difference with fused silica as between the polymer and vitreous body of the eye. This difference is adjusted by the temperature and time selection at the photoresist baking. The sign inversion of the refractive index difference in comparison with the operating conditions in human eye changes the DOE focus to positive. The paper discussed specific photoresist treatment, refractive index measurement and preliminary results of the developed method.","PeriodicalId":217586,"journal":{"name":"Optical Systems Design","volume":"20 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117284226","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Optical design of an ultraviolet hybrid refractive-diffractive space telescope for photometry","authors":"Grzegorz Fluder, Zdzisław Choromański, J. Krężel, M. Józwik","doi":"10.1117/12.2597130","DOIUrl":"https://doi.org/10.1117/12.2597130","url":null,"abstract":"Space-based telescopes are important tools in astronomy and Earth observations. They enable observation in spectral ranges outside of the atmospheric window, e.g. below 300 nm. One of the ways to decrease the mass of space telescopes is to use diffractive optical elements. They have unique capabilities when it comes to aberration corrections. By combining refractive and diffractive components it is possible to obtain a well-corrected system with fewer optical elements compared to purely refractive systems. In this paper we present an optical design of a hybrid refractive-diffractive telescope working in the 200 nm – 300 nm spectral range with improved performance and decreased mass compared to refractive system. The telescope has a large field of view 10°×10°, enabling observations of many objects simultaneously, focal length of 150 mm and f-number equal to F/1.67. We compare the performance of two systems optimized using different merit functions. In the first case the goal was to minimize spot size, in the other a widened point spread function was obtained in order to avoid undersampling. The results of tolerance analysis prove that the satisfactory imaging quality may be obtained with moderate tolerances. Moreover, the influence of the antireflective coating on the efficiency of the diffractive lens is discussed. Performed simulations show that the antireflective coating deposited on the diffractive structure gives an increase of the efficiency at the expected level.","PeriodicalId":217586,"journal":{"name":"Optical Systems Design","volume":"176 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114445730","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"New approaches to improve the illumination optics of rigid endoscopes","authors":"Alexander Gaertner, Antje Dietzel-Schaarschmidt, P. Belloni","doi":"10.1117/12.2596859","DOIUrl":"https://doi.org/10.1117/12.2596859","url":null,"abstract":"Rigid endoscopes are optical systems characterized by high light losses and poor light transfer efficiencies below 20 %. We investigated this issue first by performing a photometric analysis of three state of the art endoscopes and second by carrying out an optical analysis by means of an optomechanical model with the optical design software LightTools (Synopsys). The light losses in the material and the critical interfaces of the optomechanical model are then analyzed by considering both the spectral power distribution of the light source and the light distribution that is coupled into the endoscope’s illumination optics. To improve the illumination optics of rigid endoscopes three approaches are presented in this work: a compound parabolic concentrator and a fiber cone are first developed as alternative coupling elements but only a minor improvement could be realized, because the present optical system is highly constraint by étendue law. Therefore, an immersion element is secondly introduced between coupling element and fiberbundle to reduce backscattering between the interfaces and to increase the overall light transfer efficiency. However, it turned out that a 10 % increased light transfer efficiency can be achieved only by selecting high numerical aperture fibers combined with the immersion element. Third, the influence of the initial coupling element’s geometry on the light distribution in the surgical field is investigated. The optical simulations show that by lengthening the coupling element’s truncated cone the light can be distributed more uniformly in the surgical field.","PeriodicalId":217586,"journal":{"name":"Optical Systems Design","volume":"40 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116199423","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Applying sacrificial substrate technology to miniaturized precision optical thin-film coatings","authors":"A. Rüsseler, F. Carstens, L. Jensen, Sebastian Bengsch, D. Ristau","doi":"10.1117/12.2597003","DOIUrl":"https://doi.org/10.1117/12.2597003","url":null,"abstract":"Hybrid integrated photonics open up new application perspectives due to compact size and the shift to cost-efficient components. Therefore, integration of optical and electro-optical functionalities into photonic chips has recently attracted great interest. Research has been directed towards miniaturization of demanding spectral transfer properties for individual applications. However, it remains challenging to implement highly complex transmission and reflection characteristics with few additional process steps. In this contribution, we report on our advancement in the field of optical thin-film coating fabrication, which enables a manufacturing process comparable to die assembly in electronics. We have combined a sacrificial-substrate approach with the production of miniaturized optical thin-film coatings by ion-beam sputtering. The concept is applicable to high precision coatings with more than 130 individual layers and adding up to over 26 µm total film thickness. Segmentation down to sizes of 25 μm x 25 μm pieces is realized by laser cutting of the coating. By completely removing the substrate afterwards, we achieve a freestanding thin-film and thus minimized thickness. Our measurements indicate no general performance loss compared to coatings on glass substrates. Additionally, the substrates refractive index and absorption do not have to be considered in the multilayer-coating design. Therefore, the design can be optimized and matched to the refractive index of specific waveguides on the chip. Furthermore, we demonstrate the compatibility to releasable transfer tape. With this, we aim for enabling a high-volume feed of miniaturized thin-film filters to an automated assembly process.","PeriodicalId":217586,"journal":{"name":"Optical Systems Design","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127610941","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Usage of dry processes for the formation of diffractive structures on Ti and Ti/Si films","authors":"V. Korolkov, R. Kuts, A. I. Malyshev, D. A. Belousov, A. E. Matochkin","doi":"10.1117/12.2597162","DOIUrl":"https://doi.org/10.1117/12.2597162","url":null,"abstract":"The paper describes methods for manufacturing of diffractive optical elements by means of only \"dry\" processes starting from direct laser writing on titanium-containing films. According to first approach, direct laser writing onto thin Ti film forms surface oxide mask. Reactive ion etching removes non-oxidized Ti film and develops \"latent\" oxidized image. Subsequent thermal annealing of the oxidized Ti structure in air makes the mask more stable for following reactive ion etching of fused silica substrate to ensure proper phase depth of the binary diffractive structure. This makes it possible to avoid liquid etching, which reduces the yield and accuracy. The phase structure of the diffractive elements manufactured using the described method consists of the grooves etched in the fused silica substrate between ridges covered by TiO2 between them. We found out also that covering the Ti film by very thin Si layer helps to increase laser energy absorption at direct writing and creates quite resistant masking layer TiSi2 for the reactive ion etching. Preliminary estimates show that dual layer Si/Ti films can be used to create amplitude reflective DOEs. Possible application area for the developed methods is manufacturing of the diffractive optical elements used for precision generation of reference wavefronts in interferometric measurements of spherical and aspherical surfaces.","PeriodicalId":217586,"journal":{"name":"Optical Systems Design","volume":"63 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126373460","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Properties of new transparent polymers for optical applications","authors":"U. Schulz, Nancy Gratzke, Tina Seifert, Caroline Hahmann, F. Rickelt, S. Schröder","doi":"10.1117/12.2597061","DOIUrl":"https://doi.org/10.1117/12.2597061","url":null,"abstract":"Transparent thermoplastic polymers are widely used as materials for precision optical lenses as well as for sensing and lighting. The advantages of transparent polymers for optical parts are significant weight reduction, high impact strength, molding options and cost saving mass-production. Antireflection (AR) coatings are essential to improve transmission and contrast of lenses, windows and display covers. Polymer-capable coating conditions must be investigated for each type of polymer because of the varying chemical and physical properties of optical polymers. A presently well-established coating technology for plastics is plasma ion-assisted deposition (Plasma-IAD). It enables the coating deposition at low temperature as well as low-energy plasma conditions and ion bombardment to tailor the optical and mechanical properties of oxide layers. A good understanding of complex interactions of polymer surfaces with plasma and high-energetic radiation is a key factor to achieve polymer optics with high-end AR-properties and long-time durability. The Aim of this study is to evaluate and to understand the surface properties of polymers which are relevant for the deposition of optical coatings and for its later application. The investigation is focused primarily on the new polymer types APEL, Iupizita EP and OKP. They are compared with the long-established materials such as polycarbonate (Makrolon) and ZeonexE48R. The optical properties of the polymers are systematically studied including the influence of aging caused by UV-irradiation, humidity and heat. In addition, properties like surface hardness, water absorption and thermal stability are compared and discussed. Different pre-treatments and designs are considered to bond multilayer AR systems to surfaces with high adhesive strength. In addition, plasma-etching technology AR-plas is applied to achieve AR properties for the visible spectral range (VIS).","PeriodicalId":217586,"journal":{"name":"Optical Systems Design","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2021-09-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130171536","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}