K. Y. Kraynova, A. Mishanin, E. Pecherskaya, Y. Shepeleva
{"title":"The Formation of a Topological Drawing in a Polycrystalline Diamond Layer by the Plasma-Chemical Etching Method","authors":"K. Y. Kraynova, A. Mishanin, E. Pecherskaya, Y. Shepeleva","doi":"10.1109/EDM.2019.8823185","DOIUrl":"https://doi.org/10.1109/EDM.2019.8823185","url":null,"abstract":"The article is devoted to the actual problem of the synthesis of polycrystalline diamonds with a combination of unique electrophysical parameters (high hardness and thermal conductivity, low dielectric constant, high radiation resistance, etc.), due to which diamonds are promising materials for micromechanical devices.The features of synthesizing dense thick films of polycrystalline diamond with the required parameters are considered.The work justifies the choice of the mask, establishes the modes of experimental formation of a topological pattern using the method of plasma-chemical etching. The results of an experimental study of the obtained pattern confirm its high accuracy (the error does not exceed ± 1.2 μm relative to the elements on the photomask) and the minimum structure etching under the protective mask is ≈1.5 μm.As a result of the research, the possibility of manufacturing a high-precision pressure sensor based on polycrystalline diamond has been revealed; the technological modes of micro-processing of a polycrystalline diamond film by plasma-chemical etching, affecting the reproducibility of the required material properties, are determined.","PeriodicalId":216376,"journal":{"name":"2019 20th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM)","volume":"12 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"126507185","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
A. Boyakhchyan, I. Lezhnina, M. I. Samolutchenko, M. A. Ivanov, A. Aristov
{"title":"Study of the Skin-Electrode Contact Effect on the Electrocardiography Signal Recorded by Capacitive Electrodes","authors":"A. Boyakhchyan, I. Lezhnina, M. I. Samolutchenko, M. A. Ivanov, A. Aristov","doi":"10.1109/EDM.2019.8823193","DOIUrl":"https://doi.org/10.1109/EDM.2019.8823193","url":null,"abstract":"The possibility of creating capacitive electrodes for cardiography with detuning from the skin-electrode capacitance influence was studied in the paper. Electrodesathematical models and electrocardiogram signals recording scheme were developed in OrCAD, field experiments were conducted.","PeriodicalId":216376,"journal":{"name":"2019 20th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM)","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131390058","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
Marina V. Markulyova, O. Bezborodova, M. Gerashchenko, S. Gerashchenko, V. Polosin
{"title":"Statistical Approach of the Isoline Drift Compensating in the Systems of Bifunctional Biomedical Signals Monitoring","authors":"Marina V. Markulyova, O. Bezborodova, M. Gerashchenko, S. Gerashchenko, V. Polosin","doi":"10.1109/EDM.2019.8823566","DOIUrl":"https://doi.org/10.1109/EDM.2019.8823566","url":null,"abstract":"The paper considers the origin of the chaotic properties of processes in biological systems and substantiates the need to apply probabilistic methods for analyzing biomedical signals using the example of isoline drift compensation in bifunctional monitoring systems. The paper contains a classification of statistical methods for recovering the drift of biomedical signals. The paper discusses the features of compensation for electrocardiogram drift and blood pressure values. In particular, it has been shown that the ranking method and the sliding median method are effective tools for reducing the drift of biomedical signals. The paper discusses also the possibility of applying the statistical series formula to compensate the contour drift.","PeriodicalId":216376,"journal":{"name":"2019 20th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM)","volume":"32 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"124008540","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
V. Khmelev, D. Abramenko, D. V. Genne, E. V. Ilchenko, V. Nesterov, Vladislav A. Shakura
{"title":"The Study of the Superposition of Vibrations on the Large Thin-Walled Structures","authors":"V. Khmelev, D. Abramenko, D. V. Genne, E. V. Ilchenko, V. Nesterov, Vladislav A. Shakura","doi":"10.1109/EDM.2019.8823390","DOIUrl":"https://doi.org/10.1109/EDM.2019.8823390","url":null,"abstract":"The article is devoted to the imposition of vibrations on sheet materials. Considered various options for the imposition of fluctuations. The measurements of the generated oscillation distributions on the surface of the object under study are given.","PeriodicalId":216376,"journal":{"name":"2019 20th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM)","volume":"11 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128421488","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"An Investigation of Two-Stage AC-AC Converter with High-Frequency Galvanic Isolation","authors":"E. Baranov, V. Popov, Roman I. Yakimov","doi":"10.1109/EDM.2019.8823363","DOIUrl":"https://doi.org/10.1109/EDM.2019.8823363","url":null,"abstract":"In this paper the research of Current Source Converter with high-frequency galvanic isolation is considered. The basic converter circuit represents cascade connection of Current Source Rectifier and Current Source Inverter with high-frequency transformer placed at the intermediate stage. The topology provides voltage step-up/down capabilities, arbitrary signal frequencies and requiring input/output power factors. Due to circuit symmetry a reverse power flow is possible, thus the converter can be configured as bidirectional Solid-State Transformer with relatively small sizes and reduced number of switches. In the paper a few simple control strategies are discussed. The simulation results are presented with plotted graphs and signal waveforms approving functionality. The step-up voltage capability is verified and comparison study is performed considering all operation modes. Also THD factors of input/output currents are measured with the dependencies vs. switching duty cycles for rectifying and inverting stages. The results are published and discussed in the last sections.","PeriodicalId":216376,"journal":{"name":"2019 20th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM)","volume":"39 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128764380","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
S. Ishutkin, V. Arykov, I. Yunusov, M. V. Stepanenko, P. Troyan, Y. S. Zhidik
{"title":"Development of Technology Formation of the Optical Waveguide Structures Based on InP by Plasma Etching","authors":"S. Ishutkin, V. Arykov, I. Yunusov, M. V. Stepanenko, P. Troyan, Y. S. Zhidik","doi":"10.1109/EDM.2019.8823278","DOIUrl":"https://doi.org/10.1109/EDM.2019.8823278","url":null,"abstract":"The paper presents the process development results of plasma etching of InP-based structures in inductively coupled plasma in the Cl2/Ar gas mixture with the addition of N2 and O2. Etching was performed on silicon nitride mask. Dependences of process parameters influence on the etching rate, profile and surface roughness of formed elements are shown. Elements of optical waveguide structures were fabricated, using developed etching process.","PeriodicalId":216376,"journal":{"name":"2019 20th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM)","volume":"203 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"116699828","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
H. Tiismus, A. Kallaste, T. Vaimann, A. Rassõlkin, A. Belahcen
{"title":"Technologies for Additive Manufacturing of Electrical Machines","authors":"H. Tiismus, A. Kallaste, T. Vaimann, A. Rassõlkin, A. Belahcen","doi":"10.1109/EDM.2019.8823462","DOIUrl":"https://doi.org/10.1109/EDM.2019.8823462","url":null,"abstract":"Additive manufacturing (AM) technology is considered an essential component of the Industry 4.0 revolution, due to its capability for decentralized production of highly customizable complex objects. Its design and fabrication freedom also suggest for the production capacity of goods with embedded electromechanical components and even electrical machines with enhanced performance. Currently, due to the maturity of homo-material and limited multi-material capabilities of current AM systems, prototyping of 3D printed electrical machines has taken the path of manual assembly of printed components. For fully printed end-user products containing integrated electromechanical components to emerge, evolution of the multi-material printing systems is required. This paper discusses the technical demands of additively manufacturing electrical machines and current promising technologies on the horizon to bring us one step closer to mass produced fully 3D printed electrical machines.","PeriodicalId":216376,"journal":{"name":"2019 20th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM)","volume":"28 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117164073","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Combined PWM Algorithm for Voltage Source Inverter with Microprocessor Control System","authors":"I. V. Alexandrov, I. A. Bahovtsev","doi":"10.1109/EDM.2019.8823449","DOIUrl":"https://doi.org/10.1109/EDM.2019.8823449","url":null,"abstract":"Voltage source inverter characteristics are highly dependent on PWM method used in control unit. However, no one of existing methods is optimal for all operational conditions of VSI. Therefore, universal control systems should be used on purpose of such optimization. This paper concerned with the research of some PWM methods and development of microprocessor based control system that allows switching zero-sequence signal between SVPWM and DPWM3 control methods. Matlab/Simulink modeling was performed.","PeriodicalId":216376,"journal":{"name":"2019 20th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM)","volume":"9 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115542806","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
V. Khmelev, V. Nesterov, D. V. Genne, E. V. Ilchenko
{"title":"Development of Ultrasonic Oscillatory System for the Lunar Soil Drilling","authors":"V. Khmelev, V. Nesterov, D. V. Genne, E. V. Ilchenko","doi":"10.1109/EDM.2019.8823102","DOIUrl":"https://doi.org/10.1109/EDM.2019.8823102","url":null,"abstract":"The work is devoted to the creation of an experimental sample of ultrasonic equipment for conducting studies on drilling the simulator of the lunar soil. Studies have confirmed the possibility of creating equipment. The ultrasound equipment under study provides the specified drilling conditions for the lunar soil simulator.","PeriodicalId":216376,"journal":{"name":"2019 20th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM)","volume":"77 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114160699","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
M. Gromov, S. Prokopenko, N. Shabaldina, A. Laputenko
{"title":"Model Based JUnit Testing","authors":"M. Gromov, S. Prokopenko, N. Shabaldina, A. Laputenko","doi":"10.1109/EDM.2019.8823472","DOIUrl":"https://doi.org/10.1109/EDM.2019.8823472","url":null,"abstract":"In this paper, tools that automate tests conversion are presented. Tests for Java implementations are derived based on formal models. To apply these tests to Java implementations tests should be converted into an appropriate form for the Java programs. In this paper, JUnit is used. The experiments confirm the feasibility of developed tools.","PeriodicalId":216376,"journal":{"name":"2019 20th International Conference of Young Specialists on Micro/Nanotechnologies and Electron Devices (EDM)","volume":"178 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2019-06-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115179539","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}