Laser Damage最新文献_第10页

High-aspect ratio damage and modification in transparent materials by tailored focusing of femtosecond lasers 飞秒激光定制聚焦对透明材料的高纵横比损伤和修饰

Laser Damage Pub Date : 2019-11-20 DOI: 10.1117/12.2536450

B. Canfield, A. Terekhov, L. Costa, L. Davis

引用次数: 1

Dual-wavelength laser-induced damage threshold of a HfO2/SiO2 dichroic coating developed for high transmission at 527 nm and high reflection at 1054 nm 527 nm高透射、1054 nm高反射的HfO2/SiO2双波长激光致损伤阈值研究

Laser Damage Pub Date : 2019-11-20 DOI: 10.1117/12.2536417

E. Field, B. Galloway, D. Kletecka, P. Rambo, I. Smith

引用次数: 4

Creation of high-fluence precursors by 351-nm laser exposure on SiO2 substrates 351 nm激光辐照在SiO2衬底上制备高通量前驱体

Laser Damage Pub Date : 2019-11-20 DOI: 10.1117/12.2536507

D. Cross, C. Carr

引用次数: 1

Comparison of multipulse nanosecond LIDT of HR coated YAG and glass substrates at 1030 nm 1030nm处HR涂层YAG和玻璃基板多脉冲纳秒LIDT的比较

Laser Damage Pub Date : 2019-11-20 DOI: 10.1117/12.2536433

J. Vanda, M. Mureșan, P. Čech, Martin Mydlář, A. Lucianetti, J. Brajer, T. Mocek, V. Škoda, S. Uxa

引用次数: 0

Laser-induced damage threshold by high pulse repetition rate ArF excimer laser radiation 高脉冲重复率ArF准分子激光诱发损伤阈值研究

Laser Damage Pub Date : 2019-11-20 DOI: 10.1117/12.2536268

T. Kumazaki, Daisuke Tei, M. Hattori, Yousuke Fujimaki, J. Fujimoto, H. Mizoguchi

{"title":"Laser-induced damage threshold by high pulse repetition rate ArF excimer laser radiation","authors":"T. Kumazaki, Daisuke Tei, M. Hattori, Yousuke Fujimaki, J. Fujimoto, H. Mizoguchi","doi":"10.1117/12.2536268","DOIUrl":"https://doi.org/10.1117/12.2536268","url":null,"abstract":"In the semiconductor industry, optical projection lithography is employed for the production of microchips. In this process ultraviolet radiation has been used to exposure of photoresists on silicon wafers. Light sources with shorter wavelength are needed to shrink the chip size due to the diffraction limit. Pulsed excimer lasers have been used since the middle of 1990s instead of mercury lamps. At first KrF lasers (248-nm) were adopted, then ArF lasers (193-nm) have been applied to satisfy tighter leading edge device requirements. Now almost 5,000 excimer lasers for lithography tools are being operated at the world-wide semiconductor fab with stable, its availability up to 99.8%. The latest ArF excimer laser can pulse 15mJ to 20mJ energy with 6-kHz repetition rate, its typical module lifetime which can be replaced is several dozen Billion pulses. The module lifetime are expected to expand to reduce the downtime to replace. Also for precise micromachining applications, ArF hybrid laser consists of all-solid-state DUV light source as a seed laser and excimer laser as amplifier is been developed. The pulse width of this laser is typically sub-nanosecond and its high peak power is another concern for laser optics. Generally, the lifespan of optical elements has been growing to reach 100 Bpls, and its evaluation takes a very long time, typically several years. Comprehensive durability evaluation becomes more efficient by creating accelerated element tests [1]. As an alternative, accelerated lifetime testing with high fluence are helpful approach to screen and select the optics to satisfy the lifetime requirement. We have been developing the accelerated test system to determinate the laser-induced damage threshold of optical surfaces. In this paper, the test system and some results of field-approved optics with 20ns pulse duration will be explained.","PeriodicalId":202227,"journal":{"name":"Laser Damage","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2019-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"114526283","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Stability of dielectric multilayer coatings for the Vacuum ultraviolet 真空紫外介质多层涂层的稳定性

Laser Damage Pub Date : 2019-11-20 DOI: 10.1117/12.2536346

Weili Zhang, Zhenkun Yu, Ruijuan Zhu, Xiaofeng Liu, Kui Yi, Meiping Zhu, J. Shao

{"title":"Stability of dielectric multilayer coatings for the Vacuum ultraviolet","authors":"Weili Zhang, Zhenkun Yu, Ruijuan Zhu, Xiaofeng Liu, Kui Yi, Meiping Zhu, J. Shao","doi":"10.1117/12.2536346","DOIUrl":"https://doi.org/10.1117/12.2536346","url":null,"abstract":"Vacuum ultraviolet (VUV) reflective coatings play an important role in many high-tech fields including cosmic physics, space research, life science and synchrotron radiation. In this research, the emphasis are focused on the aging effect of 135.6nm high reflective coatings. The coatings were deposited by resistive heating method based on Lanthanum fluoride (LaF3) and Aluminum fluoride (AlF3). Optical property, surface morphology and roughness, and composition were characterized in different period after deposited. Due to the porous structure and the worse stability of lanthanum fluoride, the content of C and O element increased in LaF3 thin films during aging process. On one hand, the content of C and O are the hydrocarbon contamination from environment and packing boxes. On the other hand, due to the oxidation of film materials, the fluorides will turn into oxyfluoride, which will increase O content. As a result, there will be an increase of absorption and a decrease of reflectance of the 135.6nm high reflective coating. The surface roughness decreased which led to the reduction of scattering and the rise of reflectivity. There will be LaF3-AlF3 mixed layers between interfaces because of interface diffusion, which will further reduce the film performance.","PeriodicalId":202227,"journal":{"name":"Laser Damage","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2019-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"127908289","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Continuous wave laser-induced damage threshold of Schott IRG-24, IRG-25, and IRG-26 at 1.07 microns Schott IRG-24、IRG-25和IRG-26在1.07微米处的连续波激光诱导损伤阈值

Laser Damage Pub Date : 2019-11-20 DOI: 10.1117/12.2532062

J. McElhenny, N. Bambha

引用次数: 1

UV-laser-induced contamination: a parametric study of deposit morphology 紫外激光诱导污染:沉积形态的参数化研究

Laser Damage Pub Date : 2019-11-20 DOI: 10.1117/12.2538961

F. Wagner, G. Gebrayel El Reaidy, D. Faye, J. Natoli

引用次数: 1

A study of ns-LIDT of ion-beam assisted coatings of optical windows 离子束辅助光学窗涂层的ns-LIDT研究

Laser Damage Pub Date : 2019-11-20 DOI: 10.1117/12.2536435

S. Uxa, J. Vanda, M. Mureșan, V. Škoda

引用次数: 0

Single-shot femtosecond laser-induced damage and ablation of HfO2/SiO2-based optical thin films: a comparison between few-cycle pulses and 110 fs pulses 单次飞秒激光诱导HfO2/ sio2基光学薄膜的损伤和烧蚀:少周期脉冲和110 fs脉冲的比较

Laser Damage Pub Date : 2019-11-20 DOI: 10.1117/12.2536423

N. Talisa, M. Tripepi, Brandon Harris, A. Alshafey, J. Krebs, A. Davenport, E. Randel, C. Menoni, E. Chowdhury

{"title":"Single-shot femtosecond laser-induced damage and ablation of HfO2/SiO2-based optical thin films: a comparison between few-cycle pulses and 110 fs pulses","authors":"N. Talisa, M. Tripepi, Brandon Harris, A. Alshafey, J. Krebs, A. Davenport, E. Randel, C. Menoni, E. Chowdhury","doi":"10.1117/12.2536423","DOIUrl":"https://doi.org/10.1117/12.2536423","url":null,"abstract":"The pulse duration dependence of single-shot laser-induced damage and ablation of HfO2/SiO2-based double- and quadlayer thin films is studied using time-resolved surface microscopy (TRSM) and ex situ imaging down to the few-cycle pulse (FCP) regime. Both samples exhibit a raised, \"blister\" morphology for a range of fluences between the damage and ablation thresholds. The fluence range associated with blister formation is much larger for FCPs than for 110 fs pulses, and TRSM images at early time-delays show that the density of the laser-generated plasma is much higher for 110 fs pulses for a lower fluence relative to the damage threshold. Also, for high enough fluences the excited electron density exhibits a fast decay down to a significantly high value, which remains even after the onset of mechanical damage of the layers. The pulse duration dependence suggests that as fluence is increased, the increase in absorbed energy is more gradual for FCPs, which points towards inherent differences in the way high intensity FCPs are absorbed in dielectrics relative to longer femtosecond laser pulses.","PeriodicalId":202227,"journal":{"name":"Laser Damage","volume":null,"pages":null},"PeriodicalIF":0.0,"publicationDate":"2019-11-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131348023","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 2