1030nm处HR涂层YAG和玻璃基板多脉冲纳秒LIDT的比较

Laser Damage Pub Date : 2019-11-20 DOI:10.1117/12.2536433
J. Vanda, M. Mureșan, P. Čech, Martin Mydlář, A. Lucianetti, J. Brajer, T. Mocek, V. Škoda, S. Uxa
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引用次数: 0

摘要

光学玻璃,特别是熔融石英和BK7,是激光技术和光学元件制造中最常见和最常用的基板。这些材料的介电涂层技术是众所周知和建立的;制备的高反射和抗反射涂层在纳秒范围内的激光损伤阈值(LIDT)均超过数十J·cm-2。然而,LIDT成为进一步开发晶体材料的主要问题,如钇铝石榴石(YAG)晶体,它通常作为激光介质中的宿主,也可用于其他组件。目前面临的挑战之一是能否将玻璃上使用的薄膜涂层技术转移到YAG上,以达到与熔融二氧化硅或BK7同类材料相同的性能。采用反应性或离子辅助电子束沉积技术在熔融二氧化硅、BK7和YAG基底上制备的HR介电涂层,根据ISO标准建议,用s-on-1方法在LIDT上进行了测试。本文对试验结果进行了介绍和讨论。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Comparison of multipulse nanosecond LIDT of HR coated YAG and glass substrates at 1030 nm
Optical glasses, in particular fused silica and BK7, are the most common and used substrates for components manufacturing in laser technology and optics in general. Dielectric coating technologies for those materials are well known and established; both high-reflective and anti-reflective coatings prepared on such substrates demonstrated laser induced damage threshold (LIDT) exceeding tens J·cm-2 in nanosecond regime. However, LIDT became a major issue in further exploitation of crystalline materials as yttrium aluminum garnet (YAG) crystals, which often serves as a host in laser media and would be used in other components as well. One of the current challenge is the ability to transfer thin film coating technology used on glass to YAG in order to reach the same performance as in the case of fused silica or BK7 counterparts. HR dielectric coatings prepared on fused silica, BK7 and YAG substrates by reactive or ion-assisted e-beam deposition technique were tested on LIDT by s-on-1 method according to the ISO standard recommendations. Results from tests are presented and discussed in following paper.
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