Plasma Sources Science and Technology最新文献_第4页

On the influence of electrode surfaces on the plasma chemistry of a capacitive chlorine discharge 电极表面对容性氯放电等离子体化学性质的影响

Plasma Sources Science and Technology Pub Date : 2024-06-11 DOI: 10.1088/1361-6595/ad51a4

B Mahdavipour and J T Gudmundsson

引用次数: 0

Electron trapping efficiency of a magnetron sputtering cathode 磁控溅射阴极的电子捕获效率

Plasma Sources Science and Technology Pub Date : 2024-06-11 DOI: 10.1088/1361-6595/ad52c0

Mostafa Salahshoor

{"title":"Electron trapping efficiency of a magnetron sputtering cathode","authors":"Mostafa Salahshoor","doi":"10.1088/1361-6595/ad52c0","DOIUrl":"https://doi.org/10.1088/1361-6595/ad52c0","url":null,"abstract":"A common feature of all types of magnetron sputtering (MS) assemblies is an effective confinement of electrons by an appropriate combination of electric and magnetic fields. Therefore, studying the motions of electrons in the fields of magnetron assemblies is of particular importance. Here, we systematically analyze the electrons motions in front of a typical DC MS cathode. We first calculate the profiles of the magnetron’s magnetic field for balanced and two types of unbalanced configurations. Then, we compute the profiles of the cathode’s electric field before the gas discharge and after the plasma formation. A semi-analytical model is utilized to compute the plasma potential. We then track the motions of electrons released from the target and electrons produced through impact ionization of the background gas in the prescribed fields. A Monte Carlo model is implemented to consider electron-gas collisions and a mixed boundary condition is employed to account for electron-wall interactions. The study analyzes the impact of field profiles on the cathode’s efficiency in trapping electron by examining electron escape from the magnetic trap and electron recapture at the target surface. It is shown that the presence of plasma in all configurations leads to a significant increase in the trapping efficiency and the ionization performance, as well as a decrease in the recapture probability. These effects are attributed to the high electric field developed in the cathode sheath. Moreover, we statistically analyze the trapping efficiency by illustrating the spatial distributions of electrons locations in both axial and radial dimensions. It is demonstrated that during their azimuthal drift motion, the electrons released from the middle region at the target surface have the smallest range of axial and radial locations, in all configurations in the absence of plasma. Finally, the impact of field profiles on the average energies of electrons is discussed.","PeriodicalId":20192,"journal":{"name":"Plasma Sources Science and Technology","volume":"5 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-06-11","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141501068","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Microwave plasma interaction in a printed transmission line for a power limiting application : from surface-wave-sustained to leaky-wave-sustained discharge. 用于功率限制应用的印刷传输线中的微波等离子体相互作用：从表面波持续放电到泄漏波持续放电。

Plasma Sources Science and Technology Pub Date : 2024-06-04 DOI: 10.1088/1361-6595/ad53fd

Lucas Fuster, R. Pascaud, J. Sokoloff, Gerjan J M Hagelaar, Patrick Hoffmann, Olivier Pascal, Thierry Callegari

{"title":"Microwave plasma interaction in a printed transmission line for a power limiting application : from surface-wave-sustained to leaky-wave-sustained discharge.","authors":"Lucas Fuster, R. Pascaud, J. Sokoloff, Gerjan J M Hagelaar, Patrick Hoffmann, Olivier Pascal, Thierry Callegari","doi":"10.1088/1361-6595/ad53fd","DOIUrl":"https://doi.org/10.1088/1361-6595/ad53fd","url":null,"abstract":"\u0000 The coupling between a microwave signal and a plasma discharge in a suspended microstrip transmission line is analytically studied. Maxwell's equations are solved in a 2D approximation to get the expressions of the electromagnetic field. The wave propagation in the guiding structure is first explored without plasma, and for several modes and frequencies. A unified characterization of the three different modes that can propagate at the interface between two dielectric media, namely the leaky waves, the pseudo-surface wave and the pure surface wave, is given in terms of of both wave vectors and electromagnetic field magnitude distribution. This analyze allow to conclude that the fundamental mode in this case is a pseudo-surface wave. Thereafter, we focus on the microwave propagation with a uniform plasma inside the guiding structure. In the non collisional limit, it appears that the plasma discharge is sustained by the so-called pure surface wave, whereas in the collisional limit, a leaky wave propagates along the plasma column. Finally, a non-uniform density profile is taken into account in the calculation. The numerical results obtained from the self-consistent simulation of the microwave-plasma coupling, in a previous work, are thus analyzed with the aid of the analytical formulas to identify the microwave coupling involved in our plasma-based microwave power limiter. The computed propagation constant from numerical data confirmed the type of coupling exhibited for a uniform electron density. Furthermore, we highlight the role of the dielectric slab, from which electromagnetic power transfer occurs into the plasma discharge.","PeriodicalId":20192,"journal":{"name":"Plasma Sources Science and Technology","volume":"3 4","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-06-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141266453","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

On working gas rarefaction in high power impulse magnetron sputtering 高功率脉冲磁控溅射中的工作气体稀释问题

Plasma Sources Science and Technology Pub Date : 2024-06-04 DOI: 10.1088/1361-6595/ad53fe

Kateryna Barynova, Martin Rudolph, S. Babu, J. Fischer, D. Lundin, M. Raadu, N. Brenning, Jon Tomas Gudmundsson

{"title":"On working gas rarefaction in high power impulse magnetron sputtering","authors":"Kateryna Barynova, Martin Rudolph, S. Babu, J. Fischer, D. Lundin, M. Raadu, N. Brenning, Jon Tomas Gudmundsson","doi":"10.1088/1361-6595/ad53fe","DOIUrl":"https://doi.org/10.1088/1361-6595/ad53fe","url":null,"abstract":"\u0000 The ionization region model (IRM) is applied to explore working gas rarefaction in high power impulse magnetron sputtering discharges operated with graphite, aluminum, copper, titanium, zirconium, and tungsten targets. For all cases the working gas rarefaction is found to be significant, the degree of working gas rarefaction reaches values of up to 83 %. The various contributions to working gas rarefaction, including electron impact ionization, kick-out by the sputtered species or hot argon atoms, and diffusion, are evaluated and compared for the different target materials, and over a range of discharge current densities. The relative importance of the various processes varies between different target materials. In the case of a graphite target with argon as the working gas at 1 Pa, electron impact ionization (by both primary and secondary electrons) is the dominating contributor to working gas rarefaction, with over 90 % contribution, while the contribution of sputter wind kick-out is small < 10 %. In the case of copper and tungsten targets, the kick-out dominates, with up to ∼60 % contribution at 1 Pa. For metallic targets the kick-out is mainly due to metal atoms sputtered from the target, while for the graphite target the small kick-out contribution is mainly due to kick-out by hot argon atoms and to a smaller extent by carbon atoms. The main factors determining the relative contribution of the kick-out by the sputtered species to working gas rarefaction appear to be the sputter yield and the working gas pressure.","PeriodicalId":20192,"journal":{"name":"Plasma Sources Science and Technology","volume":"16 12","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-06-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141266856","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Oblique streaming waves observed in multipactor-induced plasma discharge above a dielectric surface 在介质表面上方的多反应器诱导等离子体放电中观测到的斜流波

Plasma Sources Science and Technology Pub Date : 2024-06-04 DOI: 10.1088/1361-6595/ad53ff

Biemeng Jin, Jian Chen, Guang-Yu Sun, Zhibin Wang, Haomin Sun

引用次数: 0

Experimental study on the discharge characteristics of air rotating gliding arc 空气旋转滑翔弧放电特性实验研究

Plasma Sources Science and Technology Pub Date : 2024-06-04 DOI: 10.1088/1361-6595/ad5401

Surong Sun, Fei Chen, Yu-Hang Zheng, Chao Wang, Hai-Xing Wang

{"title":"Experimental study on the discharge characteristics of air rotating gliding arc","authors":"Surong Sun, Fei Chen, Yu-Hang Zheng, Chao Wang, Hai-Xing Wang","doi":"10.1088/1361-6595/ad5401","DOIUrl":"https://doi.org/10.1088/1361-6595/ad5401","url":null,"abstract":"\u0000 In this study, the discharge characteristics of air rotating gliding arc are investigated by the synchronous measurements of digital oscilloscope and high-speed camera, and emission spectrum. The discharge evolution in one complete motion cycle exhibits “breakdown-elongation-extinction” process accompanied by the jump of arc root and back-breakdown phenomenon. The discharge evolves from the unstable breakdown mode (U-B), to the transition mode and finally to the stable gliding mode (S-G) by increasing the input voltage or decreasing the tangential and axial gas flow rates. The U-B mode at the input voltage of 120 V is featured by the large reduced electric field and high electron temperature of 1.90 eV, but the arc length and existence time are very short. The S-G mode at the input voltage of 270 V has relatively low breakdown frequency of 0.33 kHz and average breakdown current of 1.31 A, implying that the arc steadily glides and rotates along the spiral electrode. The average electron temperature is 0.64 eV in S-G mode, while the arc length and existence time are longer. The rotational and vibrational temperatures of N2 state are respectively measured to 2200 K and 4400 K in U-B mode, and in S-G mode are 2600 K and 4820 K. From the evolution of emission intensities of measured excited species, it is found that the NOγ band emission intensity generally rises from U-B mode to S-G mode since the gas temperature and arc existence time rise, indicating that S-G mode may be beneficial for the vibrationally-promoted Zeldovich reactions. This study could deepen the understanding of arc characteristics in air rotating gliding arc for selecting a suitable mode to achieve better plasma performance in practical applications.","PeriodicalId":20192,"journal":{"name":"Plasma Sources Science and Technology","volume":"82 6","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-06-04","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141268409","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Plasma dynamics of individual HiPIMS pulses: imaging study using high-frame-rate camera 单个 HiPIMS 脉冲的等离子体动力学：使用高帧频照相机的成像研究

Plasma Sources Science and Technology Pub Date : 2024-05-21 DOI: 10.1088/1361-6595/ad4416

Matjaž Panjan

{"title":"Plasma dynamics of individual HiPIMS pulses: imaging study using high-frame-rate camera","authors":"Matjaž Panjan","doi":"10.1088/1361-6595/ad4416","DOIUrl":"https://doi.org/10.1088/1361-6595/ad4416","url":null,"abstract":"A high-frame-rate camera with microsecond-level time resolution was used to make systematic investigations of plasma self-organization and spoke dynamics during individual HiPIMS pulses. The plasma was imaged for a range of argon pressures (0.25–2 Pa) and peak discharge currents (10–400 A) using an Al target. The experiments revealed that plasma evolves through three characteristic stages as the discharge current increases. In stage I, which is present from the current onset and up to ∼25 A, spokes are azimuthally long and rotate in the −Ez× B direction. The spoke behavior is similar to the one observed in DCMS discharges. The number of spokes depends on pressure and the current growth rate. At the lowest pressure (0.25 Pa) a single spoke is present in discharge, while at higher pressures (1–2 Pa) two spokes are most often observed. The spoke velocity depends on the number of spokes, current growth rate and pressure. A single spoke rotates with velocities in the 4–15 km s−1 range, while two spokes rotate in the 1–9 km s−1 range depending on the pressure and growth rate. Following stage I, the plasma undergoes a complex reorganization that is characterized by aperiodic spoke patterns and irregular dynamics. In stage II spokes are less localized, they merge, split and propagate either in the retrograde or prograde direction. After chaotic plasma reorganization, more ordered spoke patterns begin to form. Spokes in stage III are azimuthally shorter, typically exhibit a triangular shape and rotate in the Ez× B direction. In general, the spoke dynamics is less complicated and is only influenced by the pressure. Spokes rotate faster at higher pressures than at lower ones; velocities range from 9 km s−1 at 0.25 Pa to 6 km s−1 at 2 Pa. The spoke velocity in stage III is largely unaffected by the discharge current or number of spokes. Stage III can be further divided into sub-stages, which are characterized by different current growth rates, spoke sizes and shapes. In general, the spoke evolution is highly reproducible for pulses with similar discharge current waveforms.","PeriodicalId":20192,"journal":{"name":"Plasma Sources Science and Technology","volume":"94 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-05-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"141152905","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Simulation of low-current DC discharges in longitudinal flows of atmospheric-pressure air 模拟大气压空气纵向流中的低电流直流放电

Plasma Sources Science and Technology Pub Date : 2024-05-16 DOI: 10.1088/1361-6595/ad4588

N Yu Babaeva and G V Naidis

引用次数: 0

Electric field measurement in DC corona discharge in atmospheric pressure air using E-FISHG and laser-triggering methods 使用 E-FISHG 和激光触发方法测量常压空气中直流电晕放电的电场

Plasma Sources Science and Technology Pub Date : 2024-05-13 DOI: 10.1088/1361-6595/ad4670

Shin Nakamura, Masataka Sogame, Masahiro Sato, Takashi Fujii and Akiko Kumada

{"title":"Electric field measurement in DC corona discharge in atmospheric pressure air using E-FISHG and laser-triggering methods","authors":"Shin Nakamura, Masataka Sogame, Masahiro Sato, Takashi Fujii and Akiko Kumada","doi":"10.1088/1361-6595/ad4670","DOIUrl":"https://doi.org/10.1088/1361-6595/ad4670","url":null,"abstract":"Electric field measurement using electric-field-induced second-harmonic generation (E-FISHG) draws attention because of its non-invasiveness and is increasingly being applied to various discharge plasmas. However, measurement accuracy of previous studies is unclear since approximations in calibration are inadequate. Therefore, we have developed a measurement and analysis method that does not require approximations and can furthermore obtain the distribution of the electric field. To demonstrate the applicability of the proposed method to discharge plasmas, in this paper, we measure the electric field as a result of the space charge generated by DC corona discharge in atmospheric pressure air and validate the results by comparing them with those obtained using the laser-triggering method. We demonstrate that the electrostatic field and electric field resulting from the space charge can be measured with a difference of about 10% between the results obtained from the laser triggering method and E-FISHG method. The proposed method holds potential for applications in discharge plasmas.","PeriodicalId":20192,"journal":{"name":"Plasma Sources Science and Technology","volume":"32 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-05-13","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140928564","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge 双极 HiPIMS 放电中长正电压脉冲期间产生的双层和反向放电

Plasma Sources Science and Technology Pub Date : 2024-05-12 DOI: 10.1088/1361-6595/ad3e29

A D Pajdarová, T Kozák, T Tölg and J Čapek

{"title":"On double-layer and reverse discharge creation during long positive voltage pulses in a bipolar HiPIMS discharge","authors":"A D Pajdarová, T Kozák, T Tölg and J Čapek","doi":"10.1088/1361-6595/ad3e29","DOIUrl":"https://doi.org/10.1088/1361-6595/ad3e29","url":null,"abstract":"Time-resolved Langmuir probe diagnostics at the discharge centerline and at three distances from the target ( , , and ) was carried out during long positive voltage pulses (a duration of and a preset positive voltage of ) in bipolar high-power impulse magnetron sputtering of a Ti target (a diameter of ) using an unbalanced magnetron. Fast-camera spectroscopy imaging recorded light emission from Ar and Ti atoms and singly charged ions during positive voltage pulses. It was found that during the long positive voltage pulse, the floating and the plasma potentials suddenly decrease, which is accompanied by the presence of anode light located on the discharge centerline between the target center and the magnetic null of the magnetron’s magnetic field. These light patterns are related to the ignition of a reverse discharge, which leads to the subsequent rise in the plasma and the floating potentials. The reversed discharge is burning up to the end of the positive voltage pulse, but the plasma and floating potentials have lower values than the values from the initial part of the positive voltage pulse. Secondary electron emission induced by the impinging Ar+ ions to the grounded surfaces in the vicinity of the discharge plasma together with the mirror configuration of the magnetron magnetic field are identified as the probable causes of the charge double-layer structure formation in front of the target and the ignition of the reverse discharge.","PeriodicalId":20192,"journal":{"name":"Plasma Sources Science and Technology","volume":"41 1","pages":""},"PeriodicalIF":0.0,"publicationDate":"2024-05-12","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140942204","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0