On the influence of electrode surfaces on the plasma chemistry of a capacitive chlorine discharge

B Mahdavipour and J T Gudmundsson
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引用次数: 0

Abstract

One-dimensional particle-in-cell/Monte Carlo collisional simulations are performed on capacitive chlorine discharges with 2.54 cm gap rf driven by a sinusoidal with voltage amplitude of 222 V at driving frequency of 13.56 MHz. The properties of the discharge, the reaction rates for creation and loss of a few key species, the electron energy probability function, and the primary electron power absorption processes are explored as the gas pressure and the inclusion of secondary electron emission processes in the discharge model is varied. Five cases are investigated, including and neglecting electron, ion, and fast neutrals induced secondary electron emission. The negative ion Cl− is almost entirely created by dissociative attachment and lost through ion-ion recombination, and therefore the capacitive chlorine discharge is recombination dominated.
电极表面对容性氯放电等离子体化学性质的影响
在 13.56 MHz 的驱动频率下,通过电压振幅为 222 V 的正弦波,对间隙为 2.54 cm 的电容式氯放电进行了一维粒子池内/蒙特卡洛碰撞模拟。随着气体压力和放电模型中包含的二次电子发射过程的变化,探讨了放电的特性、几种关键物质的生成和损耗反应速率、电子能量概率函数和一次电子功率吸收过程。研究了包括和忽略电子、离子和快中子诱导的二次电子发射的五种情况。负离子 Cl- 几乎完全由离解附着产生,并通过离子-离子重组而消失,因此电容式氯放电以重组为主。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
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