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Exploring the potential of ChatGPT in enhancing atmospheric pressure plasma research techniques 探索 ChatGPT 在提高常压等离子体研究技术方面的潜力
IF 3.5 3区 物理与天体物理
Plasma Processes and Polymers Pub Date : 2024-04-02 DOI: 10.1002/ppap.202400028
Ruihang Bai, Haiwei Zhu, Jiacheng Li, Dawei Liu, Xin Lu
{"title":"Exploring the potential of ChatGPT in enhancing atmospheric pressure plasma research techniques","authors":"Ruihang Bai, Haiwei Zhu, Jiacheng Li, Dawei Liu, Xin Lu","doi":"10.1002/ppap.202400028","DOIUrl":"https://doi.org/10.1002/ppap.202400028","url":null,"abstract":"Released in March 2023, GPT‐4 has shown remarkable proficiency in various scientific areas, including atmospheric pressure plasma research. The paper discusses how GPT‐4, supported by ScholarAI and Wolfram plugins, enhances research efficiency with its vast knowledge and inferencing skills. It focuses on plasma‐water‐based nitrogen fixation experiments, demonstrating GPT‐4's abilities in explanation, analysis, prediction, planning, and verification. The study also addresses challenges like interpreting non‐textual data and keeping pace with scientific advancements. It highlights GPT‐4's role in improving nitrogen fixation process efficiency, showcasing its utility in scientific analysis and decision‐making. The paper emphasizes the evolving role of AI in research and the need for the scientific community to adapt to the rise of more advanced AI systems.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"43 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-04-02","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140585891","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Impact of open-air processing on atmospheric pressure plasma deposition of poly(ethylene oxide) coatings for antifouling applications 露天加工对用于防污的聚环氧乙烷涂层的常压等离子沉积的影响
IF 3.5 3区 物理与天体物理
Plasma Processes and Polymers Pub Date : 2024-03-26 DOI: 10.1002/ppap.202400019
Tijs Dekoster, Rita Vos, Karolien Jans, Willem Van Roy, Bernard Nisol, Bastien Duckert, Anja Vanleenhove, Annelies Delabie
{"title":"Impact of open-air processing on atmospheric pressure plasma deposition of poly(ethylene oxide) coatings for antifouling applications","authors":"Tijs Dekoster, Rita Vos, Karolien Jans, Willem Van Roy, Bernard Nisol, Bastien Duckert, Anja Vanleenhove, Annelies Delabie","doi":"10.1002/ppap.202400019","DOIUrl":"https://doi.org/10.1002/ppap.202400019","url":null,"abstract":"Atmospheric pressure plasma deposition (APPD) of poly(ethylene oxide) (PEO)-like antifouling coatings provides an attractive way to reduce biofouling for reliable biosensor operation. Cold atmospheric pressure plasma jets are designed to operate in open air. This paper demonstrates the impact of open-air processing on the composition and properties of PEO-like coatings by APPD with vinyl ether precursors. The open-air environment inhibits polymerization as indicated by low deposition rates, oxygen incorporation in the coatings, and instability of the coatings in water. The composition and stability of the coatings improve by appropriate nozzle design and by deposition in an environment with lower air content. The resulting PEO-like coatings are stable and antifouling for an antibody solution and inhibit adhesion of human fibroblast cells.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"39 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-03-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140301408","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Revisiting the application of molecular probe diagnostics on quantifying aqueous OH radicals in plasma–liquid systems 重新审视分子探针诊断法在等离子体-液体系统中量化水性 OH 自由基方面的应用
IF 3.5 3区 物理与天体物理
Plasma Processes and Polymers Pub Date : 2024-03-26 DOI: 10.1002/ppap.202300229
Qingjin Tang, Mingjia Zhang, Binhong Wu, Xin Wang, Xin Tu, Kostya (Ken) Ostrikov, Linsheng Liu, Qiang Chen
{"title":"Revisiting the application of molecular probe diagnostics on quantifying aqueous OH radicals in plasma–liquid systems","authors":"Qingjin Tang, Mingjia Zhang, Binhong Wu, Xin Wang, Xin Tu, Kostya (Ken) Ostrikov, Linsheng Liu, Qiang Chen","doi":"10.1002/ppap.202300229","DOIUrl":"https://doi.org/10.1002/ppap.202300229","url":null,"abstract":"We revisit one of the most used techniques for quantifying the aqueous OH radicals (OH<sub>aq</sub>) in plasma–liquid systems, the molecular probe method which obtains the [OH<sub>aq</sub>] by measuring a stable material formed through a rapid reaction between the molecular probe and the OH<sub>aq</sub>. In this study, we used disodium terephthalate (NaTA) as the molecular probe; the experimental results with a theoretical analysis suggest that to obtain the correct OH<sub>aq</sub> concentration, the concentration of the molecular probe should be greater than a certain value, which depends on the types of the plasma–liquid systems. However, this is not the case in most of the existing reports in which the NaTA is often much less than the requisite value.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"234 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-03-26","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140301602","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Quasi‐atomic layer etching of silicon with surface chlorination and removal using Ar or He plasmas 利用氩或氦等离子体对硅进行准原子层蚀刻，并进行表面氯化和清除
IF 3.5 3区 物理与天体物理
Plasma Processes and Polymers Pub Date : 2024-03-23 DOI: 10.1002/ppap.202400016
Namgun Kim, Whan Kyun Kim, Dongjun Shin, Jong Kyu Kim, Chan Min Lee, Kuk Han Yoon, Youngju Ko, Heeyeop Chae
{"title":"Quasi‐atomic layer etching of silicon with surface chlorination and removal using Ar or He plasmas","authors":"Namgun Kim, Whan Kyun Kim, Dongjun Shin, Jong Kyu Kim, Chan Min Lee, Kuk Han Yoon, Youngju Ko, Heeyeop Chae","doi":"10.1002/ppap.202400016","DOIUrl":"https://doi.org/10.1002/ppap.202400016","url":null,"abstract":"A comparative study of argon (Ar) and helium (He) plasmas is conducted in quasi‐atomic layer etching (ALE) processes for silicon (Si). The ALE window is identified to be between 35 and 55 V for Ar and 25–45 V for He, with an etch per cycle of 6.0 Å/cycle for Ar and 7.5 Å/cycle for He. Thirty percent thicker chlorination layers are observed with Cl<jats:sub>2</jats:sub>/He ALE than with Cl<jats:sub>2</jats:sub>/Ar ALE in the chlorination step. The penetration depth of He ions is twice that of Ar ions, with a standard deviation of 4.5 times greater. This study demonstrates that He ions in the removal steps considerably affect the subsequent modification steps in Si ALE.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"132 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-03-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140196910","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Characteristics and performance of an integrated coplanar dielectric barrier discharge device for hand hygiene 用于手部卫生的集成共面介质阻挡放电装置的特性和性能
IF 3.5 3区 物理与天体物理
Plasma Processes and Polymers Pub Date : 2024-03-22 DOI: 10.1002/ppap.202400011
Shiyun Liu, Haosheng Jin, Yunyang Lu, Li Wan, Danhua Mei, Zhi Fang
{"title":"Characteristics and performance of an integrated coplanar dielectric barrier discharge device for hand hygiene","authors":"Shiyun Liu, Haosheng Jin, Yunyang Lu, Li Wan, Danhua Mei, Zhi Fang","doi":"10.1002/ppap.202400011","DOIUrl":"https://doi.org/10.1002/ppap.202400011","url":null,"abstract":"A touchable plasma device based on coplanar dielectric barrier discharge (CDBD) is designed for hand hygiene. The biological safety is evaluated from the aspects of electrical and thermal properties. The peak value of current through the human body (~3.5 mA) and the highest device surface temperature (~40°C) are lower than the threshold of perception current and thermal damage temperature, respectively. The typical bacteria that are present on our hands in daily life <jats:italic>Escherichia coli</jats:italic> and <jats:italic>Staphylococcus aureus</jats:italic> are selected to verify the sterilization performance of the device. The results of human contact safety evaluation and sterilization test have demonstrated that this proposed CDBD device is reliable and user‐friendly for applications in hand hygiene.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"101 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-03-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140196907","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Issue Information: Plasma Process. Polym. 3/2024 发行信息：等离子工艺。Polym.3/2024
IF 3.5 3区 物理与天体物理
Plasma Processes and Polymers Pub Date : 2024-03-07 DOI: 10.1002/ppap.202370032
{"title":"Issue Information: Plasma Process. Polym. 3/2024","authors":"","doi":"10.1002/ppap.202370032","DOIUrl":"https://doi.org/10.1002/ppap.202370032","url":null,"abstract":"","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"110 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140071893","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Outside Front Cover: Plasma Process. Polym. 3/2024 封面外页：等离子工艺Polym.3/2024
IF 3.5 3区 物理与天体物理
Plasma Processes and Polymers Pub Date : 2024-03-07 DOI: 10.1002/ppap.202370031
Menghao Tan, Wei Chen, Mengchao Li, Qianqian Luo, Yujun Xiao, Fang Liu, Xingquan Wang, Zhiqiang Gao, Xiaopeng Chang, Teng Gong, Jun Huang, Kostya (Ken) Ostrikov
{"title":"Outside Front Cover: Plasma Process. Polym. 3/2024","authors":"Menghao Tan, Wei Chen, Mengchao Li, Qianqian Luo, Yujun Xiao, Fang Liu, Xingquan Wang, Zhiqiang Gao, Xiaopeng Chang, Teng Gong, Jun Huang, Kostya (Ken) Ostrikov","doi":"10.1002/ppap.202370031","DOIUrl":"https://doi.org/10.1002/ppap.202370031","url":null,"abstract":"","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"121 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-03-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"140071895","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Hydrophobic glass and paper coatings based on plasma polymerized vegetable oils using a novel atmospheric pressure plasma concept 基于等离子聚合植物油的疏水玻璃和纸张涂层，采用新型常压等离子概念
IF 3.5 3区 物理与天体物理
Plasma Processes and Polymers Pub Date : 2024-02-20 DOI: 10.1002/ppap.202300224
Martin Bellmann, Amelia Loesch‐Zhang, Dennis M. J. Möck, Jörn Appelt, Andreas Geissler, Wolfgang Viöl
{"title":"Hydrophobic glass and paper coatings based on plasma polymerized vegetable oils using a novel atmospheric pressure plasma concept","authors":"Martin Bellmann, Amelia Loesch‐Zhang, Dennis M. J. Möck, Jörn Appelt, Andreas Geissler, Wolfgang Viöl","doi":"10.1002/ppap.202300224","DOIUrl":"https://doi.org/10.1002/ppap.202300224","url":null,"abstract":"Atmospheric pressure plasma polymerization represents a promising coating technology, addressing drawbacks of traditional processes (solvent use, multistep procedures, etc.) while enabling deposition of thin cross‐linked polymer layers with high contour fidelity. We address technological challenges with a novel plasma device that integrates multiple plasma source benefits and investigate the suitability of two plant‐based precursors, chia and tung oil, for plasma polymerization to hydrophobize glass and paper. Chia oil enables the deposition of thin, covalently bonded hydrophobic polymer layers. Such coatings have diverse applications especially inside the paper industry, where water repellents in the form of internal and surface sizing have always been an essential functionalization step. Using bio‐based precursors and reducing extra chemicals contributes to substituting fossil‐based or harmful substances.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"3 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-02-20","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139953573","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Electro-polymerization of polypyrroles, comparison among electrochemistry, glow, and arc discharges 聚吡咯的电聚合，电化学、辉光和电弧放电之间的比较
IF 3.5 3区 物理与天体物理
Plasma Processes and Polymers Pub Date : 2024-02-19 DOI: 10.1002/ppap.202300199
Rosario Ramírez, Fernando G. Flores-Nava, Elena Colín-Orozco, J. Cuauhtémoc Palacios, M. Guadalupe Olayo, Adriana Ventolero, Guillermo J. Cruz
{"title":"Electro-polymerization of polypyrroles, comparison among electrochemistry, glow, and arc discharges","authors":"Rosario Ramírez, Fernando G. Flores-Nava, Elena Colín-Orozco, J. Cuauhtémoc Palacios, M. Guadalupe Olayo, Adriana Ventolero, Guillermo J. Cruz","doi":"10.1002/ppap.202300199","DOIUrl":"https://doi.org/10.1002/ppap.202300199","url":null,"abstract":"This work presents a comparison between electrochemical (Echem), plasma glow, and arc discharge polymerizations of pyrrole doped with iodine to correlate the energy of synthesis, chemical structure, and electrical conductivity of the polymers. Plasma glow discharges were used in the gas phase, electrochemistry in liquid, and arc discharges in a hybrid gas–liquid combination. Polypyrroles had structure and conductivity that varied with the synthesis parameters; Echem produced polymers with high carbonization and without the C≡N triple bonds resulting from the other syntheses. Conductivity divided the polymers in two: those synthesized in liquid were in the 0.01–1.0 S/m range, and those synthesized in gas were in the 10<sup>–9</sup>–10<sup>–7 </sup>S/m range, with differences of up to eight orders of magnitude due to the dopants and electrolytes.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"14 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-02-19","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139926233","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Improved corrosion resistance and cytotoxicity of nickel-based alloy using novel plasma processing technique 利用新型等离子加工技术提高镍基合金的耐腐蚀性和细胞毒性
IF 3.5 3区 物理与天体物理
Plasma Processes and Polymers Pub Date : 2024-02-16 DOI: 10.1002/ppap.202300151
Muhammad Yousaf, Tahir Iqbal, Muhammad Salim Mansha, Adnan Saeed, Muhammad Abrar, Sumera Afsheen, Irfan Ahmed, Abeer A. AlObaid, Basheer M. Al-Maswari, Muhammad Yasir
{"title":"Improved corrosion resistance and cytotoxicity of nickel-based alloy using novel plasma processing technique","authors":"Muhammad Yousaf, Tahir Iqbal, Muhammad Salim Mansha, Adnan Saeed, Muhammad Abrar, Sumera Afsheen, Irfan Ahmed, Abeer A. AlObaid, Basheer M. Al-Maswari, Muhammad Yasir","doi":"10.1002/ppap.202300151","DOIUrl":"https://doi.org/10.1002/ppap.202300151","url":null,"abstract":"In this study, we address challenges in the biocompatibility of nickel-based (NiCr) alloys, prevalent in the dental industry, due to toxic metal ion release impacting corrosion resistance and cytotoxicity. Employing magnetron sputtering and cathodic cage plasma nitriding (CCPN), a duplex plasma treatment (DPT) is introduced to the NiCr alloy. The novel approach enhances surface morphology, notably reducing ion leakage compared with untreated samples. Specifically, the CCPN-TiN-treated sample significantly improves corrosion resistance and minimizes metal ion leakage. This transformative DPT emerges as a promising solution for surface modification, particularly mitigating toxic ion leaching in aggressive electrolytes. This research demonstrates a major stride in enhancing NiCr alloy biocompatibility, emphasizing the vital role of innovative surface modification techniques for biomedical applications and challenges.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"5 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-02-16","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139926234","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
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