Plasma Processes and Polymers最新文献

{"title":"Evidence for molecular tungsten ionic species presence in impurity-seeded hydrogen plasma in contact with W surfaces","authors":"Silviu Daniel Stoica, Cristina Craciun, Tomy Acsente, Bogdana Mitu, Gheorghe Dinescu","doi":"10.1002/ppap.202300227","DOIUrl":"https://doi.org/10.1002/ppap.202300227","url":null,"abstract":"We performed an investigation of tungsten ionic species presence in hydrogen plasmas in contact with a tungsten surface, both in the presence of air impurities and when injected with argon. The study was carried out in a magnetron sputtering system complemented with mass spectrometry diagnostics. Our findings reveal that these plasmas encompass a diverse range of tungsten molecular ionic species in the mass range of 180–250 amu, broadly described as WH_<i>x</i>N_<i>y</i>O_<i>z</i>⁺ (<i>x</i> = 0–3; <i>y</i> = 0–2; <i>z</i> = 0–3). The validity of these results was further confirmed through dedicated mass spectrometry investigations involving tungsten sputtering discharges in argon–nitrogen and argon–oxygen mixtures.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"17 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-02-08","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139760290","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Outside Front Cover: Plasma Process. Polym. 2/2024","authors":"Jie Pan, Bin Li, Liguang Dou, Yuan Gao, Pengchen He, Tao Shao","doi":"10.1002/ppap.202370029","DOIUrl":"https://doi.org/10.1002/ppap.202370029","url":null,"abstract":"<b>Outside Front Cover</b>: Plasma catalysis is a crucial and promising approach in greenhouse gas conversion. We investigate the synergistic interaction between plasma and Co-based catalysts in the CO₂ hydrogenation to CH₃OH system. The research reveals that plasma treatment increases the concentration of surface oxygen vacancies in the H₂/Ar-CoO catalyst, facilitating the adsorption and transformation of oxygen-containing groups. Moreover, the addition of H₂O also cooperates with the catalyst to achieve the maximum CH₃OH yield.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"74 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-02-07","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139760287","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Plasma polymerization of isopentyl nitrite at atmospheric pressure: Gas phase analysis and surface chemistry","authors":"Yong Wang, Alexander J. Robson, Stephane Simon, Robert D. Short, James W. Bradley","doi":"10.1002/ppap.202300162","DOIUrl":"https://doi.org/10.1002/ppap.202300162","url":null,"abstract":"Nitric oxide (NO)-releasing coatings have promising potential for biomedical applications notably in implant safety and wound dressing by promoting healing and reducing bacterial growth. Yet, the production of NO-films remains difficult through classic approaches. In this study, plasma polymerized NO-coatings are produced using a helium-isopentyl nitrite mixture under two power settings and deposited on aluminum samples. Analyses of the plasma phase by mass spectroscopy reveal the presence of nitrosoxy groups (O–N═O) in monomer and quasi-monomer at low power, and a higher fragmentation rate at high power. Static and no-static samples are made and analyzed by X-ray photoelectron spectroscopy showing the presence of these group for both power conditions, with a better retention on the sample's center for the latest.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"1 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-01-29","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139647669","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Sterilization effect and mechanism exploration of a mode-combination method on Staphylococcus aureus in thick ice layers in a large sealed freezer","authors":"Min Chen, Dingxin Liu, Zifeng Wang, Jishen Zhang, Jiao Lin, Pengyu Zhao, Tianhui Li, Hao Zhang, Li Guo, Mingzhe Rong","doi":"10.1002/ppap.202300221","DOIUrl":"https://doi.org/10.1002/ppap.202300221","url":null,"abstract":"Cold-chain transport is a crucial cross-regional transmission pathway for severe acute respiratory syndrome coronavirus 2 and other microorganisms. In this study, the mode-combination method is adopted for sterilization in a 1.138 m³ freezer by mixing effluent gases of NO_<i>x</i> and O₃ mode air discharges. The mixed gas can effectively inactivate <i>Staphylococcus aureus</i> in 10 mm ice within 3 h, which significantly surpasses O₃ gas. Moreover, the inactivation effect of the mixed gas can penetrate deep into ice, contrasting with the surface effect of O₃ gas. This disparity is linked to the difference in penetration depth of strong oxidizing long-lived reactive species. This study validates the sterilization efficacy of cold atmospheric plasma in practical cold-chain environment, critical for curbing infectious disease transmission.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"39 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-01-23","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139554155","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Ion chemistry and ionic thin film deposition from HMDS-photochemistry induced by VUV-radiation from an atmospheric plasma","authors":"Tristan Winzer, Jan Benedikt","doi":"10.1002/ppap.202300226","DOIUrl":"https://doi.org/10.1002/ppap.202300226","url":null,"abstract":"Injection of precursor molecules into a plasma often results in particle generation or deposition in the source, compromising film quality and plasma operation. We present here a study of ion chemistry and ionic film deposition from hexamethyldisilane (HMDS) using a novel device utilizing vacuum ultraviolet (VUV)-radiation from a remote atmospheric plasma. Infrared spectroscopy showed that <mjx-container aria-label=\"SiO Subscript 2\" ctxtmenu_counter=\"0\" ctxtmenu_oldtabindex=\"1\" jax=\"CHTML\" role=\"application\" sre-explorer- style=\"font-size: 103%; position: relative;\" tabindex=\"0\"><mjx-math aria-hidden=\"true\" location=\"graphic/ppap202300226-math-0001.png\"><mjx-semantics><mjx-mrow><mjx-msub data-semantic-children=\"0,1\" data-semantic- data-semantic-role=\"unknown\" data-semantic-speech=\"SiO Subscript 2\" data-semantic-type=\"subscript\"><mjx-mtext data-semantic-annotation=\"clearspeak:unit\" data-semantic-font=\"normal\" data-semantic- data-semantic-parent=\"2\" data-semantic-role=\"unknown\" data-semantic-type=\"text\"><mjx-c></mjx-c><mjx-c></mjx-c><mjx-c></mjx-c></mjx-mtext><mjx-script style=\"vertical-align: -0.15em;\"><mjx-mn data-semantic-annotation=\"clearspeak:simple\" data-semantic-font=\"normal\" data-semantic- data-semantic-parent=\"2\" data-semantic-role=\"integer\" data-semantic-type=\"number\" size=\"s\"><mjx-c></mjx-c></mjx-mn></mjx-script></mjx-msub></mjx-mrow></mjx-semantics></mjx-math><mjx-assistive-mml aria-hidden=\"true\" display=\"inline\" unselectable=\"on\"><math altimg=\"urn:x-wiley:16128850:media:ppap202300226:ppap202300226-math-0001\" location=\"graphic/ppap202300226-math-0001.png\" xmlns=\"http://www.w3.org/1998/Math/MathML\"><semantics><mrow><msub data-semantic-=\"\" data-semantic-children=\"0,1\" data-semantic-role=\"unknown\" data-semantic-speech=\"SiO Subscript 2\" data-semantic-type=\"subscript\"><mtext data-semantic-=\"\" data-semantic-annotation=\"clearspeak:unit\" data-semantic-font=\"normal\" data-semantic-parent=\"2\" data-semantic-role=\"unknown\" data-semantic-type=\"text\">SiO</mtext><mn data-semantic-=\"\" data-semantic-annotation=\"clearspeak:simple\" data-semantic-font=\"normal\" data-semantic-parent=\"2\" data-semantic-role=\"integer\" data-semantic-type=\"number\">2</mn></msub></mrow>${text{SiO}}_{2}$</annotation></semantics></math></mjx-assistive-mml></mjx-container>-like films were obtained at the lowest admixture, where impurities are more important and VUV-photons reach the substrate, while only slightly oxidized films were deposited at high admixtures. Photoionization mainly forms the monomer ion due to collisional stabilization and possibly slow polymerization reactions as found by ion mass spectrometry. The more detailed photochemistry of HMDS-related ions is discussed based on mass spectra for different admixtures.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"58 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-01-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139553926","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Challenges in scaling of IPVD deposited Ta barriers on OSG low-k films: Carbonization of Ta by CHx radicals generated through VUV-induced decomposition of carbon-containing groups","authors":"Alexey N. Ryabinkin, Alexey S. Vishnevskiy, Sergej Naumov, Alexander O. Serov, Konstantin I. Maslakov, Dmitry S. Seregin, Dmitry A. Vorotyntsev, Alexander F. Pal, Tatyana V. Rakhimova, Konstantin A. Vorotilov, Mikhail R. Baklanov","doi":"10.1002/ppap.202300206","DOIUrl":"https://doi.org/10.1002/ppap.202300206","url":null,"abstract":"The effect of vacuum ultraviolet (VUV) radiation during ionized physical vapor deposition (IPVD) of tantalum barriers on various porous organosilicate glass low-<i>k</i> SiCOH films is studied using advanced diagnostics and quantum chemical calculations. VUV photons break the Si–C bonds, releasing hydrocarbon radicals from the pore surfaces. These radicals, trapped in pores that are partially sealed by tantalum deposition, can either react with tantalum to form carbide-like compounds, TaC_<i>x</i>, or be redeposited in the pores as CH_<i>x</i> polymers. This is evidenced by a decrease in CH₃ groups that correlates with an increase in TaC_<i>x</i>. The formation of TaC_<i>x</i> poses a significant challenge in the back end of line (BEOL) technology when reducing the barrier thickness.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"15 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-01-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139562426","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Plasma activated-water stimulates aged pepper seeds and promotes seedling growth","authors":"Dingmeng Guo, Hongxia Liu, Xiaoning Zhang, Chenlu Xiong","doi":"10.1002/ppap.202300173","DOIUrl":"https://doi.org/10.1002/ppap.202300173","url":null,"abstract":"This study conducted an activation experiment on tap water using a self-designed dielectric barrier discharge plasma field. Aged pepper seeds and seedlings were chosen as the investigation's subjects to assess plasma-activated water (PAW's) effects on aged seed germination, seedling growth, and their respective qualities. PAW cultivation led to notable improvements in pepper seeds' germination potential and rate, with increases of 18.0% and 28.3%, respectively. Moreover, the vitality index exhibited a remarkable rise of 250.0%. Concurrently, seedlings treated with PAW exhibited significant growth enhancements, with root length, root number, stem length, and leaf area increasing by 138.6%, 69.2%, 47.9%, and 28.4 cm², respectively. Additionally, PAW treatment induces changes in endogenous substances and enzyme activities in seeds and seedlings.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"7 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-01-21","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139553879","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Cold atmospheric-pressure plasma selectively inhibits glioblastoma via DNA damage and AKT dephosphorylation in vitro and in vivo","authors":"Yinan Chen, Xiaolong Qiao, Changqing Liu, Jin Zhang, Tao Sun, Ling Kong, Xinru Zhang, Wencheng Song, Chuandong Cheng, Guohua Ni","doi":"10.1002/ppap.202300210","DOIUrl":"https://doi.org/10.1002/ppap.202300210","url":null,"abstract":"In this work, the effects of cold atmospheric-pressure plasma (CAP) on glioblastoma are evaluated comprehensively. After CAP treatment, U251 cell viability, migration, and invasion functions were inhibited, while an appropriate dose of CAP had no inhibitory effect on human brain glial cell line cells. Western blots indicated that expression of caspase-3 was upregulated with ki-67 expression downregulated. Moreover, mitochondrial membrane potential decreased, and energy metabolisms of U251 cells were influenced afterward. TUNEL assays and comet assays suggested the DNA damage of U251 cells after CAP treatment. Furthermore, as one of the DNA damage responses associated pathways, the AKT (AKT8 virus oncogene cellular homolog) signaling pathway was also indicated in the work. The findings raise great promise for clinical applications of CAP in glioblastoma treatments.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"9 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-01-17","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139501419","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Microscopic dynamics and mechanism of Trichel pulse discharge","authors":"Xinchen Jiang, Suikai Wang, Jing Ha, Fucheng Liu, Shoujie He, Qing Li","doi":"10.1002/ppap.202300196","DOIUrl":"https://doi.org/10.1002/ppap.202300196","url":null,"abstract":"The microscopic dynamics and formation mechanism of Trichel pulse discharge are investigated. A nonequal current transient effect exists in the Trichel pulse discharge. By reducing the limiting current resistance, the simulated current waveforms of Trichel pulse discharge are qualitatively and quantitatively consistent with those in the experiment. The dominant positive ions vary at different stages, which originate from the evolution of dominant reactions for the generation and consumption of charged particles. The existence of positive and negative charged layers results in the attenuation of the electric field at the rising edge of the Trichel pulse. The formation of the Trichel pulse originates from the changes in spatial charge density, resulting in alterations in the spatial electric field and ionization rate.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"143 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-01-15","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139475568","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

{"title":"Inactivation pathways of Escherichia coli and Staphylococcus aureusinduced by transient spark discharge in liquids","authors":"Aleksandra Lavrikova, Nitin Chandra Teja Dadi, Helena Bujdáková, Karol Hensel","doi":"10.1002/ppap.202300147","DOIUrl":"https://doi.org/10.1002/ppap.202300147","url":null,"abstract":"Cold plasma finds considerable interest in biodecontamination. A major issue is to elucidate the pathways of plasma–bacteria interaction. The present work aims at studying inactivation mechanisms for planktonic bacteria <i>Escherichia coli</i> and <i>Staphylococcus aureus</i> induced by cold plasma generated by a transient spark discharge. Changes in bacterial viability, metabolic activity, membrane integrity, intracellular reactive oxygen species level, and cell morphology reveal different patterns of cellular damage of the bacteria. Our results emphasize the importance of cell membrane integrity and maintenance of intracellular redox balatnce to resist plasma treatment. The physicochemical properties of the plasma-treated liquid (PTL) are monitored. Acidification and accumulation of various reactive species including •OH, H₂O₂, ONOOH, and NO₃⁻ in PTL play crucial roles in bacterial inactivation.","PeriodicalId":20135,"journal":{"name":"Plasma Processes and Polymers","volume":"16 1","pages":""},"PeriodicalIF":3.5,"publicationDate":"2024-01-09","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"139409144","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":3,"RegionCategory":"物理与天体物理","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}