Philosophical Magazine Part B最新文献

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Excitonic contribution to photoluminescence in amorphous semiconductors 非晶半导体中激子对光致发光的贡献
Philosophical Magazine Part B Pub Date : 2002-05-01 DOI: 10.1080/13642810208224374
Jai Singh, T. Aoki, K. Shimakawa
{"title":"Excitonic contribution to photoluminescence in amorphous semiconductors","authors":"Jai Singh, T. Aoki, K. Shimakawa","doi":"10.1080/13642810208224374","DOIUrl":"https://doi.org/10.1080/13642810208224374","url":null,"abstract":"Abstract Applying the effective-mass approach, the energy eigenvalues of excitonic states in amorphous semiconductors are derived. It is shown that Wannier–Mott-type excitons can indeed be formed in amorphous solids. The results show that the occurrence of the double photoluminescence (PL) lifetime distribution peak, fast and slow, in hydrogenated amorphous silicon (a-Si: H) and hydrogenated amorphous germanium (a-Ge: H) can unambiguously be assigned to radiative recombinations from singlet and triplet excitonic states respectively. The dependence of PL peaks on the temperature and generation rate in a-Si: H and a-Ge: H is also discussed. The approach is general and simple and can be applied to study the charge-carrier transport and PL properties in any amorphous solid.","PeriodicalId":20016,"journal":{"name":"Philosophical Magazine Part B","volume":"281 1 1","pages":"855 - 871"},"PeriodicalIF":0.0,"publicationDate":"2002-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"86574714","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 12
Characteristics of SrTiO3 thin films deposited on Si by rf magnetron sputtering at various substrate temperatures 不同衬底温度下射频磁控溅射沉积在Si上的SrTiO3薄膜的特性
Philosophical Magazine Part B Pub Date : 2002-05-01 DOI: 10.1080/13642810208218351
Zhongchun Wang, V. Kugler, U. Helmersson, E. Evangelou, Nikos Konofaos, S. Nakao, P. Jin
{"title":"Characteristics of SrTiO3 thin films deposited on Si by rf magnetron sputtering at various substrate temperatures","authors":"Zhongchun Wang, V. Kugler, U. Helmersson, E. Evangelou, Nikos Konofaos, S. Nakao, P. Jin","doi":"10.1080/13642810208218351","DOIUrl":"https://doi.org/10.1080/13642810208218351","url":null,"abstract":"Abstract SrTiO3 (STO) thin films were deposited on p-type Si(100) substrates by rf magnetron sputtering at various substrate temperatures, and their structural and electrical properties were investigated without post-deposition annealing. The thickness of the films was in the range from 300 to 500 nm while the deposition temperature was varied between room temperature and 550°C. Compositional and structural characterizations included X-ray diffraction, Rutherford back-scattering spectroscopy and variable-angle spectroscopic ellipsometry. Metal-insulator-semiconductor diodes with the configuration of Al/STO/p-Si/Al were fabricated and characterized by capacitance-voltage, current-voltage and admittance spectroscopy measurements. Depending on the substrate temperatures, the dielectric constant of the films varied between 60 and 120 and the loss factor between 0.019 and 0.051 at 100 kHz. All films showed high charge storage capacity, varying between 1.9 and 3μm cm−2. However, the films deposited at 200°C showed the lowest density of bulk trapped charges (150 nC cm−2) and interface states ((1.2–6.1) × 1011 cm−2 eV−1), and are therefore considered to be the most suitable for device applications.","PeriodicalId":20016,"journal":{"name":"Philosophical Magazine Part B","volume":"8 1","pages":"891 - 903"},"PeriodicalIF":0.0,"publicationDate":"2002-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"80865027","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 12
An approximate calculation for transport in magnetic tunnel junctions in the presence of localized states 局域态存在下磁隧道结输运的近似计算
Philosophical Magazine Part B Pub Date : 2002-05-01 DOI: 10.1080/13642810208224366
P. Levy, Kuising Wang, P. Dederichs, C. Heide, Shufeng Zhang, L. Szunyogh
{"title":"An approximate calculation for transport in magnetic tunnel junctions in the presence of localized states","authors":"P. Levy, Kuising Wang, P. Dederichs, C. Heide, Shufeng Zhang, L. Szunyogh","doi":"10.1080/13642810208224366","DOIUrl":"https://doi.org/10.1080/13642810208224366","url":null,"abstract":"Abstract In conventional calculations of transport in magnetic tunnel junctions, one usually assumes that the transverse momentum of the tunnelling electrons is conserved and that the itinerant electron states are orthogonal to localized states. However, in most of the junctions studied, there is diffuse scattering in both the bulk of the electrodes and the barrier so that the transverse momentum is not conserved, and there are processes that couple localized states at the electrode-barrier interface to the itinerant states in the bulk of the electrodes. While it is in principle possible to include these effects, it leads to lengthy calculations. Here we propose an approximate scheme in which we do not take explicit account of either of the effects mentioned above, but in which we calculate the tunnelling through all the states that exist at the electrode-barrier interfaces. We compare the k∥-resolved density of states and tunnelling currents across a junction in our approximate scheme with that found using the Landauer formalism in the ballistic limit.","PeriodicalId":20016,"journal":{"name":"Philosophical Magazine Part B","volume":"70 1","pages":"763 - 769"},"PeriodicalIF":0.0,"publicationDate":"2002-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"83871618","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 6
Application of the full-potential linear augmented-plane-wave method to the study of electronic properties in semiconductors with d valence electrons 全势线性增强平面波方法在含d价电子半导体电子性质研究中的应用
Philosophical Magazine Part B Pub Date : 2002-05-01 DOI: 10.1080/13642810208224369
A. Zaoui, F. H. Hassan
{"title":"Application of the full-potential linear augmented-plane-wave method to the study of electronic properties in semiconductors with d valence electrons","authors":"A. Zaoui, F. H. Hassan","doi":"10.1080/13642810208224369","DOIUrl":"https://doi.org/10.1080/13642810208224369","url":null,"abstract":"Abstract The present paper aims to study the electronic structure of semiconductors with d valence electrons such as CuX (X = Cl, Br or I). The full-potential linearized augmented-plane-wave method has been employed within the generalized gradient approximation for the exchange-correlation potential. The structural parameters have been obtained for the fundamental state of each CuX. Also, the role of d electrons and the contribution of every atomic orbital to the electronic structure are detailed and explained. From the obtained band structures, the electron (hole) valence and conduction effective masses are deduced. Our findings are compared with experimental and previous theoretical studies.","PeriodicalId":20016,"journal":{"name":"Philosophical Magazine Part B","volume":"18 1","pages":"791 - 800"},"PeriodicalIF":0.0,"publicationDate":"2002-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85257390","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 9
The Hubbard model, spin degeneracy and Ising spins 哈伯德模型,自旋简并和伊辛自旋
Philosophical Magazine Part B Pub Date : 2002-05-01 DOI: 10.1080/13642810208224373
K. Ziegler
{"title":"The Hubbard model, spin degeneracy and Ising spins","authors":"K. Ziegler","doi":"10.1080/13642810208224373","DOIUrl":"https://doi.org/10.1080/13642810208224373","url":null,"abstract":"Abstract The Hubbard model is used as a starting point for a study of an electronic system with spin ½. Using a functional integral representation at half-filling it is demonstrated that the spin degeneracy is equivalent to dynamic Ising spins coupled to the fermions. A magnetic phase transition of the model is related to a transition of the Ising spins from a paramagnetic to an antiferromagnetic phase. A metal-insulator transition in the paramagnetic phase can be described within this approach by the Green's function of non-interacting fermions, coupled to Ising spins. This picture is compared with the earlier Ising spin representation of the Hubbard model by Hirsch and discussed in terms of a small hopping amplitude.","PeriodicalId":20016,"journal":{"name":"Philosophical Magazine Part B","volume":"309 1","pages":"839 - 853"},"PeriodicalIF":0.0,"publicationDate":"2002-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"85428090","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
High-flux current effects in interfacial reactions in Au–Al multilayers 高通量电流对Au-Al多层界面反应的影响
Philosophical Magazine Part B Pub Date : 2002-05-01 DOI: 10.1080/13642810208218356
N. Bertolino, J. Garay, Umberto Anselmi-Tamburini, Z. Munir
{"title":"High-flux current effects in interfacial reactions in Au–Al multilayers","authors":"N. Bertolino, J. Garay, Umberto Anselmi-Tamburini, Z. Munir","doi":"10.1080/13642810208218356","DOIUrl":"https://doi.org/10.1080/13642810208218356","url":null,"abstract":"Abstract The influence of high dc currents (up to 1019 A cm−2) on the interaction between thin Au-Al layers was investigated over the temperature range 400-500°C. In contrast with earlier diffusion couple results, only four of the five intermetalllic compounds in this system were observed, in both the absence and the presence of a current at all levels. The intermetallics Au5 Al2 and Au2 Al were the dominant products while AuAl and AuAl2 were relatively insignificant. The latter showed little change, growing only to a total thickness of a few micrometres, regardless of the magnitude of the current density and time of annealing. While the sequence of formation of the different intermetallics was not affected by the current, the incubation time and rate of growth of the layers were strongly influenced. The incubation time for the appearance of a measurable product layer was markedly reduced by the current, by nearly two orders of magnitude in some cases. The effect of the current on the nucleation of the product phases was investigated through the use of ‘pre-nucleated’ samples. The results are discussed in light of the effect of the current on atomic flux (electromigration) and on the formation of defects and compared with recent observations on field effects in multilayer systems.","PeriodicalId":20016,"journal":{"name":"Philosophical Magazine Part B","volume":"1 1","pages":"969 - 985"},"PeriodicalIF":0.0,"publicationDate":"2002-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"79711339","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 31
Electronic transport properties in the liquid 3d transition-metal series 液态三维过渡金属系列中的电子输运性质
Philosophical Magazine Part B Pub Date : 2002-05-01 DOI: 10.1080/13642810208218350
H. Zrouri, J. Hugel, C. Chaib, J. Gasser, L. Roubi
{"title":"Electronic transport properties in the liquid 3d transition-metal series","authors":"H. Zrouri, J. Hugel, C. Chaib, J. Gasser, L. Roubi","doi":"10.1080/13642810208218350","DOIUrl":"https://doi.org/10.1080/13642810208218350","url":null,"abstract":"Abstract The resistivities and thermopowers of the liquid 3d transition-metal series have been investigated within Ziman's formula based on a spin-polarized approach. This implies the existence of atomic magnetic moments and the use of a two-band conduction model for the resistivity. The calculated resistivities are the lowest obtained until now within the Ziman scheme and better agreement with experiment has been found than with the classical non-polarized calculations. In spite of the improvement with respect to the non-magnetic results, the thermoelectric power values do not attain the degree of agreement observed for the resistivities.","PeriodicalId":20016,"journal":{"name":"Philosophical Magazine Part B","volume":"11 1","pages":"875 - 889"},"PeriodicalIF":0.0,"publicationDate":"2002-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"78352298","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
An experimental determination of the fractal dimension at the metal—insulator transition in germanium ‘doped’ by radiation defects 辐射缺陷掺杂锗中金属-绝缘体跃迁分形维数的实验测定
Philosophical Magazine Part B Pub Date : 2002-05-01 DOI: 10.1080/13642810208218355
S. A. El-Hakim
{"title":"An experimental determination of the fractal dimension at the metal—insulator transition in germanium ‘doped’ by radiation defects","authors":"S. A. El-Hakim","doi":"10.1080/13642810208218355","DOIUrl":"https://doi.org/10.1080/13642810208218355","url":null,"abstract":"Abstract This work deals with the determination of the magnitude of the fractal dimension, from the analysis of the temperature dependence of the dc conductivity in the temperature range 1.5–300 K in germanium, disordered by large fluences of fast reactor neutrons, with the radiation defect concentration making it an insulator near the metal–insulator transition. From the reduced activation energy method and the percolation theory of hopping conductivity, the dielectric constants of the samples are calculated. The localization radius is determined. The obtained fractal dimensions are found to satisfy the scaling theory. The value determined for the exponent t is 1.7.","PeriodicalId":20016,"journal":{"name":"Philosophical Magazine Part B","volume":"27 1","pages":"963 - 968"},"PeriodicalIF":0.0,"publicationDate":"2002-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75203036","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Electron-phonon interactions cause high-temperature superconductivity 电子-声子相互作用引起高温超导
Philosophical Magazine Part B Pub Date : 2002-05-01 DOI: 10.1080/13642810208218353
J. C. Phillips
{"title":"Electron-phonon interactions cause high-temperature superconductivity","authors":"J. C. Phillips","doi":"10.1080/13642810208218353","DOIUrl":"https://doi.org/10.1080/13642810208218353","url":null,"abstract":"Abstract What is the microscopic interaction responsible for high temperature superconductivity? Here data on temporal relaxation of T c and the room temperature conductivity in YBa2Cu3O6+x after abrupt alteration by light pulses or pressure changes are analysed. The analysis proves, independently of microscopic details, that only electron-phonon interactions can cause high-temperature superconductivity in the cuprates; all other dynamic interactions are excluded by experiment.","PeriodicalId":20016,"journal":{"name":"Philosophical Magazine Part B","volume":"10 1","pages":"931 - 942"},"PeriodicalIF":0.0,"publicationDate":"2002-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"88839969","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
Magnetotransport of compounds in the U–Ge system U-Ge体系中化合物的磁输运
Philosophical Magazine Part B Pub Date : 2002-05-01 DOI: 10.1080/13642810208224371
R. Troć, H. Noël, P. Boulet
{"title":"Magnetotransport of compounds in the U–Ge system","authors":"R. Troć, H. Noël, P. Boulet","doi":"10.1080/13642810208224371","DOIUrl":"https://doi.org/10.1080/13642810208224371","url":null,"abstract":"Abstract The recent more thorough reinvestigation of the U–Ge system has finally established the existence of five compounds with the chemical formulae U5Ge4, UGe, U3Ge5, UGe2 and UGe3. Here we add another compound UGe2-x, existing in a homogeneity range of 0.30 < x > 0.35, and crystallizing in the defect tetragonal ThSi2-type structure. This compound is a ferromagnet with T c = 47 K. For all these compounds we have revised earlier measured magnetic properties and measured (often for the first time) the magnetotransport properties such as the electrical resistivity at 0T and in applied magnetic fields up to 8 T. We have found no superconducting properties for U5Ge4 down to 20 mK, which was claimed earlier. The most striking features found for both ferromagnets UGe2-x (ThSi2-type phase) and UGe2 (ZrGa2-type phase) are their temperature dependences of the magnetoresistivity (MR). At low temperatures the MRs for both these phases are large and positive which, above 10 and 15 K respectively, change sign to negative. The largest negative values of MR were found not at the corresponding Tc values but at the characteristic temperature T', which is an inflection point T iof the ρ(T) curve; this is attributed to be a measure of the spin fluctuation temperature Tsf.","PeriodicalId":20016,"journal":{"name":"Philosophical Magazine Part B","volume":"22 1","pages":"805 - 824"},"PeriodicalIF":0.0,"publicationDate":"2002-05-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"75032907","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 16
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