非晶半导体中激子对光致发光的贡献

Jai Singh, T. Aoki, K. Shimakawa
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引用次数: 12

摘要

应用有效质量方法,推导了非晶半导体中激子态的能量特征值。结果表明,在非晶固体中确实可以形成wannier - mott型激子。结果表明,氢化非晶硅(a-Si: H)和氢化非晶锗(a-Ge: H)的双光致发光(PL)寿命分布峰的快速和慢速,可以明确地分别归因于单重态和三重态激子态的辐射重组。还讨论了在a-Si: H和a-Ge: H中PL峰与温度和生成速率的关系。该方法简单、通用,可用于研究任何非晶固体中的载流子输运和PL性质。
本文章由计算机程序翻译,如有差异,请以英文原文为准。
Excitonic contribution to photoluminescence in amorphous semiconductors
Abstract Applying the effective-mass approach, the energy eigenvalues of excitonic states in amorphous semiconductors are derived. It is shown that Wannier–Mott-type excitons can indeed be formed in amorphous solids. The results show that the occurrence of the double photoluminescence (PL) lifetime distribution peak, fast and slow, in hydrogenated amorphous silicon (a-Si: H) and hydrogenated amorphous germanium (a-Ge: H) can unambiguously be assigned to radiative recombinations from singlet and triplet excitonic states respectively. The dependence of PL peaks on the temperature and generation rate in a-Si: H and a-Ge: H is also discussed. The approach is general and simple and can be applied to study the charge-carrier transport and PL properties in any amorphous solid.
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