IEEE 1989 International Conference on Plasma Science最新文献_第9页

Microsources of intense fusion in focused discharges of plasma focus 等离子体聚焦放电中强聚变的微源

IEEE 1989 International Conference on Plasma Science Pub Date : 1989-05-22 DOI: 10.1109/PLASMA.1989.166140

A. Bortolotti, J. Brzosko, A. Fuschini, V. Nardi, C. Powell

引用次数: 0

Computer simulations of finite plasmas convected across magnetized plasmas 有限等离子体在磁化等离子体间对流的计算机模拟

IEEE 1989 International Conference on Plasma Science Pub Date : 1989-05-22 DOI: 10.1109/PLASMA.1989.166115

M. Galvez, C. Barnes, G. Gisler

{"title":"Computer simulations of finite plasmas convected across magnetized plasmas","authors":"M. Galvez, C. Barnes, G. Gisler","doi":"10.1109/PLASMA.1989.166115","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.166115","url":null,"abstract":"Summary form only. A two-dimensional electrostatic particle-in-cell code has been used to simulate the convection of a finite slab of neutral plasma across a uniform magnetic field. The simulations show that the plasma is convected with a velocity that approaches the injection velocity for denser plasmas. The plasma loses p/sub y/ momentum with distance due to erosion effects. Three mechanisms that cause erosion of the plasma have been identified: (1) the erosion of the charge layers due to the velocity shear, (2) the erosion of the charge layers due to their expansion along the magnetic field lines, and (3) the erosion of the head of the stream due to Larmor-radius effects. The simulations have also shown that these erosions have greater effect for denser plasmas. The electron charge layer is subject to the dicotron instability: the head of the stream broadens and shows a flutelike instability, and the tail of the stream narrows due to electric field fringe effects. When the plasma streams across a magnetized plasma, these erosion effects are diminished due to the short circuiting of the electric field by the background plasma. However, the convection velocity decreases with distance until the plasma stream is stopped.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"21 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"134115971","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 8

High current proton beams in multi-stage linear induction accelerators 多级直线感应加速器中的大电流质子束

IEEE 1989 International Conference on Plasma Science Pub Date : 1989-05-22 DOI: 10.1109/PLASMA.1989.166077

C. Golkowski, G. Kerslick, J. Nation

引用次数: 0

Performance of laser activated semiconductor opening switches 激光激活半导体开路开关的性能

IEEE 1989 International Conference on Plasma Science Pub Date : 1989-05-22 DOI: 10.1109/PLASMA.1989.166195

E. Chauchard, C. C. Kung, C. H. Lee, M. Rhee

{"title":"Performance of laser activated semiconductor opening switches","authors":"E. Chauchard, C. C. Kung, C. H. Lee, M. Rhee","doi":"10.1109/PLASMA.1989.166195","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.166195","url":null,"abstract":"The authors report on the high-voltage operation of GaAs switches. The switches used were intrinsic GaAs and Cr:GaAs of bulk devices of millimeter sizes. The range of bias voltage applied was 500 V to 2 kV. The light source was a Q-switched Nd:YAG laser with 10-ns pulse duration. The closing and opening speeds of the Cr:GaAs switches were limited by the risetime and falltime of the laser pulse. Typical off-resistances when the laser light illumination was turned off were higher than 20 M Omega , whereas the on-resistances with laser illumination can be as low as 1 Omega . Such a large ratio of off-resistance to on-resistance allowed a switching efficiency of better than 99%. In the most practical inductive storage systems, the peak power transferred to the load is restricted by the switch opening time. The voltage multiplication can be achieved by the long duration of the current charging cycle, which in the case of the semiconductor switch is limited by the pulse duration of existing lasers. In order to remedy these two limitations, the authors are developing a laser system capable of delivering a laser pulse of several tens of nanoseconds and a very fast falltime.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"132546651","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Time-resolved diode current density measurements for the Recirculating Linac injector 时间分辨二极管电流密度测量的再循环直线加速器注入

IEEE 1989 International Conference on Plasma Science Pub Date : 1989-05-22 DOI: 10.1109/PLASMA.1989.166079

M. Haworth, D. Smith, M. Mazarakis, J. Poukey, D. E. Hasti, L. Bennett, S. Lucero

引用次数: 0

2-D magnetohydrodynamic model for a dense helium plasma focus 致密氦等离子体焦点的二维磁流体动力学模型

IEEE 1989 International Conference on Plasma Science Pub Date : 1989-05-22 DOI: 10.1109/PLASMA.1989.166131

F. Begay, I. Lindemuth

引用次数: 0

Radial ion diffusion induced by cyclotron resonance heating at the thermal barrier region in the Phaedrus-B tandem mirror 费德鲁斯- b串联反射镜热障区回旋共振加热诱导的径向离子扩散

IEEE 1989 International Conference on Plasma Science Pub Date : 1989-05-22 DOI: 10.1109/PLASMA.1989.166172

Y. Wen, D. Brouchous, M. Ichimura, R. Breun, N. Hershkowitz, P. Probert, R. Majeski, T. Intrator, D. Roberts, D. Keil

{"title":"Radial ion diffusion induced by cyclotron resonance heating at the thermal barrier region in the Phaedrus-B tandem mirror","authors":"Y. Wen, D. Brouchous, M. Ichimura, R. Breun, N. Hershkowitz, P. Probert, R. Majeski, T. Intrator, D. Roberts, D. Keil","doi":"10.1109/PLASMA.1989.166172","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.166172","url":null,"abstract":"Experiments with and without ion cyclotron resonance (1.275 MHz, fundamental ion cyclotron frequency of hydrogen plasma) as the thermal-barrier region have been carried out by varying the thermal-barrier magnetic field strength. Radial density profiles, potential profiles, and currents have been measured, as well as the fueling at the thermal-barrier region. The density at the plasma edge increased and the potential at the plasma edge decreased as the B field was decreased to bring the resonance into the thermal-barrier cell in both a balanced and imbalanced gas-puffing case. The data indicated that a possible mechanism is that ions can escape from the confinement region along the open resonance surface (the same as the mod-B surfaces) because the turning point of the trapped ions has a tendency to center on mod-B surfaces. An increasing potential observed in the present experiments in the edge region of the plasma with increasing B field may be related to the higher degree of fluctuation of radial current to the collector.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133911534","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 0

Operation of an intense ion beam diode at high repetition rate 高重复频率下强离子束二极管的工作

IEEE 1989 International Conference on Plasma Science Pub Date : 1989-05-22 DOI: 10.1109/PLASMA.1989.166082

W. A. Noonan, S. Glidden, J. Greenly, D. Hammer, K. Jain, N. Qi, L. Brissette

{"title":"Operation of an intense ion beam diode at high repetition rate","authors":"W. A. Noonan, S. Glidden, J. Greenly, D. Hammer, K. Jain, N. Qi, L. Brissette","doi":"10.1109/PLASMA.1989.166082","DOIUrl":"https://doi.org/10.1109/PLASMA.1989.166082","url":null,"abstract":"A magnetically insulated ion diode with a plasma anode has been operated on a pulsed power system capable of up to 1-kHz repetition rate in bursts of a few pulses. The authors discuss results on diode operating characteristics as a function of anode plasma parameters and insulating magnetic field strength and results on ion beam extraction in single-shot mode. The plasma anode ion source originates as an annular puff of H/sub 2/, C/sub 2/H/sub 2/, or other gas, which is preionized and then inductively broken down by a 1- mu s-risetime magnetic field coil. The plasma is then magnetically driven toward a magnetically insulated high voltage gap. Ion diode operation depends critically on the gas puff pressure and the relative timing between initiation of the main plasma driver pulse and the arrival of the high-voltage pulse at the ion diode. Single-shot and high-repetition-rate results have been compared, and the dependence of diode operation on other diode conditions (e.g. gas puff pressure and magnetic insulation field strength) has been investigated. Anode plasma temperature and density have been measured in hydrogen plasmas using spectroscopic techniques.<<ETX>>","PeriodicalId":165717,"journal":{"name":"IEEE 1989 International Conference on Plasma Science","volume":"111 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"1989-05-22","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"133253229","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}

引用次数: 1

X-ray laser based on channel radiation 基于通道辐射的x射线激光器

IEEE 1989 International Conference on Plasma Science Pub Date : 1989-05-22 DOI: 10.1109/PLASMA.1989.166221

N. Rostoker, M. Strauss

引用次数: 0

A 0.1 TW gas-breakdown plasma-anode ion diode 0.1 TW气体击穿等离子体阳极离子二极管

IEEE 1989 International Conference on Plasma Science Pub Date : 1989-05-22 DOI: 10.1109/PLASMA.1989.166043

A. Dunning, J. Greenly, G. Rondeau

引用次数: 0