E. Merkurjev, S.V. Voronova, O. V. Lobach, R. V. Lobach
{"title":"Automation of Measurements of Parameters of the Heat Flux Sensor","authors":"E. Merkurjev, S.V. Voronova, O. V. Lobach, R. V. Lobach","doi":"10.1109/SIBEDM.2006.231659","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231659","url":null,"abstract":"The subject of research is polysilicon thermal sensor of thermoelectric type based on profiled membrane. Accuracy and simplicity of measurement of parameters of such sensors plays very important role. The developed microprocessor measuring system allows determine output characteristics of heat flux sensor (HFS) with high accuracy and get reliable results. The modified measuring system allows estimate sensitivity of the sensor structure with higher accuracy. In work the variant of case registration of a thermal sensor control is offered. The thermal e.m.f. factor was experimentally determined with the help of test structure. It was shown that experimental value of the sensitivity of HFS is confirmed by early expected theoretically value of HFS sensitivity","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"88 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115883165","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"The Reliability Evaluation of Frequency Converter","authors":"N. Borodin, E.V. Vasilevich","doi":"10.1109/SIBEDM.2006.231666","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231666","url":null,"abstract":"The reliability evaluation of generation channel of the independent generation system of alternating current and constant frequency is presented. The ways of the channel reliability increase are analyzed","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"156 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121526394","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
V. Khoroshevsky, S.N. Mamoilenko, M. Kurnosov, N.A. Medvedeva
{"title":"Space-Distributed Multi-Cluster Computer System for Training in Parallel Computational Technologies","authors":"V. Khoroshevsky, S.N. Mamoilenko, M. Kurnosov, N.A. Medvedeva","doi":"10.1109/SIBEDM.2006.230966","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.230966","url":null,"abstract":"Cluster computer systems have obtained wide spread occurrence. Nowadays increasing necessity of training high qualified specialists in parallel computational technologies is felt. The article shows the architecture of the space-distributed cluster computer system and explains the advantages of using it in Siberian State University for Telecommunications and Informatics for training students in parallel computational technologies","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117235020","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"EUV Source Radiated from Pinch Plasma for Semiconductor Manufacturing","authors":"C.H. Zhang, S. Katsuki, H. Akiyama, D.G. Xu","doi":"10.1109/SIBEDM.2006.231991","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231991","url":null,"abstract":"At present, and for the last several decades, optical projection lithography has been the lithographic technique used in the high-volume manufacture of integrated circuits. The elementary line width of semiconductor device is now 90 nm, the extreme ultraviolet lithography (EUVL) with a wavelength in the range of 10 to 14 nm is vying to become the choice of the semiconductor industry for the so-called next generation of lithography that will enable future generations of integrated circuits to be printed with feature sizes of 45 nm and below around 2010. Plasma EUV source is regarded as the most promising source of EUV radiation, and a heated competition is underway over the world. The top priority issue for implementing EUVL is to upgrade the EUV power extensively. In the development of our Z-pinch plasma EUV source, xenon gas is used for the target. The Z-pinch plasma was driven by pulsed current with amplitude of 30 kA and pulse duration of 100 ns. Pinhole imaging, EUV spectrograph and in-band EUV energy monitor were used to characterize the EUV emission from the Z-pinch discharge plasma. In order to improve the convention efficiency (CE) from input electric energy to EUV radiation, also a solid tin rod was used as target material. The experimental analyses have demonstrated the CE was as high as 1.5%","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115779004","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"The Hardware of the Contactless Optical Length Meter","authors":"D.D. Gavrilov, E. V. Sypin, E. S. Povernov","doi":"10.1109/SIBEDM.2006.231662","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231662","url":null,"abstract":"The article is devoted to a problem of contactless measurement of a glass-fibre thread length. Also the principle of the optical sensor activity is considered","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130722660","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Laboratory Educational Complex with the Opportunity of the Remote Internet Access","authors":"A. Novikov, E. S. Povernov, E. V. Sypin","doi":"10.1109/SIBEDM.2006.230596","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.230596","url":null,"abstract":"Article was described the basic concept and the description developed a laboratory complex with an opportunity of the removed Internet considered. Its features, the basic advantages and advantages are resulted. Directions of the subsequent works are marked","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128256007","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Increasing Efficiency of a Chemical-Mechanical Polishing of the Silicon Wafer","authors":"V. Khmelev, A. Shalunov, E.S. Smerdina","doi":"10.1109/SIBEDM.2006.231297","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231297","url":null,"abstract":"The present paper is concerned with the reasons of increasing the efficiency of one of the basic processes in manufacturing of semiconductors -chemical-mechanical polishing (CMP). The promising researches-and-experiments based way of the above problem solution by the application of ultrasonic spraying of a polishing liquid is offered. The paper reports the design which allows to embed the ultrasonic apparatus in the present equipment for CMP process","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"48 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117093981","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
{"title":"Ultrasonic Drying and Presowing Treatment of Seeds","authors":"V. Khmelev, A. Lebedev, M. V. Khmelev","doi":"10.1109/SIBEDM.2006.231294","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231294","url":null,"abstract":"The article is devoted to the application of ultrasonic technologies for agriculture needs. Application of high intensity ultrasonic oscillations for presowing treatment of seeds with the purpose to increase its germination and productivity is described. The ultrasonic dryer for drying grain, vegetables and fruit with high technical and operational performances is presented","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121751708","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
V. Khmelev, S. N. Tsyganok, A. Lebedev, I. I. Savin
{"title":"Transducers of High Intensity for Gas Media","authors":"V. Khmelev, S. N. Tsyganok, A. Lebedev, I. I. Savin","doi":"10.1109/SIBEDM.2006.231293","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231293","url":null,"abstract":"The paper is devoted to practical problems of development and projection of piezoelectric transducers for gas media. Authors confirm effectiveness of application of the created piezoelectric phased focalizing emitter using an example of process of drying of linen in drum-type washing machines","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131058846","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
V. Khmelev, A. N. Slivin, R. Barsukov, S. N. Tsyganok, I. I. Savin, A. Shalunov, S. V. Levin, A. D. Abramov
{"title":"Measurement of Parameters and Automatic Selection of Optimal Modes During Ultrasonic Welding of Thermoplastic Materials","authors":"V. Khmelev, A. N. Slivin, R. Barsukov, S. N. Tsyganok, I. I. Savin, A. Shalunov, S. V. Levin, A. D. Abramov","doi":"10.1109/SIBEDM.2006.231656","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231656","url":null,"abstract":"Article is devoted to research of changes of electric parameters of ultrasonic oscillatory systems (UOS) during ultrasonic welding of thermoplastic materials. In this article the basic problems interfering development of systems of automatic definition of quality of ultrasonic welding are analyzed. The technique performance researches which are directed on improvement of quality of welded connection at ultrasonic welding of thermoplastic materials, is described","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"36 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131065670","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}