International Workshops and Tutorials on Electron Devices and Materials最新文献

筛选
英文 中文
Automation of Measurements of Parameters of the Heat Flux Sensor 热通量传感器参数测量的自动化
International Workshops and Tutorials on Electron Devices and Materials Pub Date : 2006-07-01 DOI: 10.1109/SIBEDM.2006.231659
E. Merkurjev, S.V. Voronova, O. V. Lobach, R. V. Lobach
{"title":"Automation of Measurements of Parameters of the Heat Flux Sensor","authors":"E. Merkurjev, S.V. Voronova, O. V. Lobach, R. V. Lobach","doi":"10.1109/SIBEDM.2006.231659","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231659","url":null,"abstract":"The subject of research is polysilicon thermal sensor of thermoelectric type based on profiled membrane. Accuracy and simplicity of measurement of parameters of such sensors plays very important role. The developed microprocessor measuring system allows determine output characteristics of heat flux sensor (HFS) with high accuracy and get reliable results. The modified measuring system allows estimate sensitivity of the sensor structure with higher accuracy. In work the variant of case registration of a thermal sensor control is offered. The thermal e.m.f. factor was experimentally determined with the help of test structure. It was shown that experimental value of the sensitivity of HFS is confirmed by early expected theoretically value of HFS sensitivity","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"88 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115883165","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
The Reliability Evaluation of Frequency Converter 变频器的可靠性评估
International Workshops and Tutorials on Electron Devices and Materials Pub Date : 2006-07-01 DOI: 10.1109/SIBEDM.2006.231666
N. Borodin, E.V. Vasilevich
{"title":"The Reliability Evaluation of Frequency Converter","authors":"N. Borodin, E.V. Vasilevich","doi":"10.1109/SIBEDM.2006.231666","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231666","url":null,"abstract":"The reliability evaluation of generation channel of the independent generation system of alternating current and constant frequency is presented. The ways of the channel reliability increase are analyzed","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"156 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121526394","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Space-Distributed Multi-Cluster Computer System for Training in Parallel Computational Technologies 用于并行计算技术训练的空间分布多集群计算机系统
International Workshops and Tutorials on Electron Devices and Materials Pub Date : 2006-07-01 DOI: 10.1109/SIBEDM.2006.230966
V. Khoroshevsky, S.N. Mamoilenko, M. Kurnosov, N.A. Medvedeva
{"title":"Space-Distributed Multi-Cluster Computer System for Training in Parallel Computational Technologies","authors":"V. Khoroshevsky, S.N. Mamoilenko, M. Kurnosov, N.A. Medvedeva","doi":"10.1109/SIBEDM.2006.230966","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.230966","url":null,"abstract":"Cluster computer systems have obtained wide spread occurrence. Nowadays increasing necessity of training high qualified specialists in parallel computational technologies is felt. The article shows the architecture of the space-distributed cluster computer system and explains the advantages of using it in Siberian State University for Telecommunications and Informatics for training students in parallel computational technologies","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"35 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117235020","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 2
EUV Source Radiated from Pinch Plasma for Semiconductor Manufacturing 半导体制造用夹尖等离子体辐射的极紫外光源
International Workshops and Tutorials on Electron Devices and Materials Pub Date : 2006-07-01 DOI: 10.1109/SIBEDM.2006.231991
C.H. Zhang, S. Katsuki, H. Akiyama, D.G. Xu
{"title":"EUV Source Radiated from Pinch Plasma for Semiconductor Manufacturing","authors":"C.H. Zhang, S. Katsuki, H. Akiyama, D.G. Xu","doi":"10.1109/SIBEDM.2006.231991","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231991","url":null,"abstract":"At present, and for the last several decades, optical projection lithography has been the lithographic technique used in the high-volume manufacture of integrated circuits. The elementary line width of semiconductor device is now 90 nm, the extreme ultraviolet lithography (EUVL) with a wavelength in the range of 10 to 14 nm is vying to become the choice of the semiconductor industry for the so-called next generation of lithography that will enable future generations of integrated circuits to be printed with feature sizes of 45 nm and below around 2010. Plasma EUV source is regarded as the most promising source of EUV radiation, and a heated competition is underway over the world. The top priority issue for implementing EUVL is to upgrade the EUV power extensively. In the development of our Z-pinch plasma EUV source, xenon gas is used for the target. The Z-pinch plasma was driven by pulsed current with amplitude of 30 kA and pulse duration of 100 ns. Pinhole imaging, EUV spectrograph and in-band EUV energy monitor were used to characterize the EUV emission from the Z-pinch discharge plasma. In order to improve the convention efficiency (CE) from input electric energy to EUV radiation, also a solid tin rod was used as target material. The experimental analyses have demonstrated the CE was as high as 1.5%","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"38 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"115779004","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
The Hardware of the Contactless Optical Length Meter 非接触式光学长度计的硬件设计
International Workshops and Tutorials on Electron Devices and Materials Pub Date : 2006-07-01 DOI: 10.1109/SIBEDM.2006.231662
D.D. Gavrilov, E. V. Sypin, E. S. Povernov
{"title":"The Hardware of the Contactless Optical Length Meter","authors":"D.D. Gavrilov, E. V. Sypin, E. S. Povernov","doi":"10.1109/SIBEDM.2006.231662","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231662","url":null,"abstract":"The article is devoted to a problem of contactless measurement of a glass-fibre thread length. Also the principle of the optical sensor activity is considered","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"1 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"130722660","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Laboratory Educational Complex with the Opportunity of the Remote Internet Access 以远程互联网接入为契机的实验室教育综合体
International Workshops and Tutorials on Electron Devices and Materials Pub Date : 2006-07-01 DOI: 10.1109/SIBEDM.2006.230596
A. Novikov, E. S. Povernov, E. V. Sypin
{"title":"Laboratory Educational Complex with the Opportunity of the Remote Internet Access","authors":"A. Novikov, E. S. Povernov, E. V. Sypin","doi":"10.1109/SIBEDM.2006.230596","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.230596","url":null,"abstract":"Article was described the basic concept and the description developed a laboratory complex with an opportunity of the removed Internet considered. Its features, the basic advantages and advantages are resulted. Directions of the subsequent works are marked","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"5 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"128256007","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 0
Increasing Efficiency of a Chemical-Mechanical Polishing of the Silicon Wafer 提高硅片化学机械抛光效率的研究
International Workshops and Tutorials on Electron Devices and Materials Pub Date : 2006-07-01 DOI: 10.1109/SIBEDM.2006.231297
V. Khmelev, A. Shalunov, E.S. Smerdina
{"title":"Increasing Efficiency of a Chemical-Mechanical Polishing of the Silicon Wafer","authors":"V. Khmelev, A. Shalunov, E.S. Smerdina","doi":"10.1109/SIBEDM.2006.231297","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231297","url":null,"abstract":"The present paper is concerned with the reasons of increasing the efficiency of one of the basic processes in manufacturing of semiconductors -chemical-mechanical polishing (CMP). The promising researches-and-experiments based way of the above problem solution by the application of ultrasonic spraying of a polishing liquid is offered. The paper reports the design which allows to embed the ultrasonic apparatus in the present equipment for CMP process","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"48 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"117093981","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 1
Ultrasonic Drying and Presowing Treatment of Seeds 种子的超声波干燥和播前处理
International Workshops and Tutorials on Electron Devices and Materials Pub Date : 2006-07-01 DOI: 10.1109/SIBEDM.2006.231294
V. Khmelev, A. Lebedev, M. V. Khmelev
{"title":"Ultrasonic Drying and Presowing Treatment of Seeds","authors":"V. Khmelev, A. Lebedev, M. V. Khmelev","doi":"10.1109/SIBEDM.2006.231294","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231294","url":null,"abstract":"The article is devoted to the application of ultrasonic technologies for agriculture needs. Application of high intensity ultrasonic oscillations for presowing treatment of seeds with the purpose to increase its germination and productivity is described. The ultrasonic dryer for drying grain, vegetables and fruit with high technical and operational performances is presented","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"10 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"121751708","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 7
Transducers of High Intensity for Gas Media 气体介质用高强度换能器
International Workshops and Tutorials on Electron Devices and Materials Pub Date : 2006-07-01 DOI: 10.1109/SIBEDM.2006.231293
V. Khmelev, S. N. Tsyganok, A. Lebedev, I. I. Savin
{"title":"Transducers of High Intensity for Gas Media","authors":"V. Khmelev, S. N. Tsyganok, A. Lebedev, I. I. Savin","doi":"10.1109/SIBEDM.2006.231293","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231293","url":null,"abstract":"The paper is devoted to practical problems of development and projection of piezoelectric transducers for gas media. Authors confirm effectiveness of application of the created piezoelectric phased focalizing emitter using an example of process of drying of linen in drum-type washing machines","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"34 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131058846","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 3
Measurement of Parameters and Automatic Selection of Optimal Modes During Ultrasonic Welding of Thermoplastic Materials 热塑性材料超声焊接参数测量及最佳模式的自动选择
International Workshops and Tutorials on Electron Devices and Materials Pub Date : 2006-07-01 DOI: 10.1109/SIBEDM.2006.231656
V. Khmelev, A. N. Slivin, R. Barsukov, S. N. Tsyganok, I. I. Savin, A. Shalunov, S. V. Levin, A. D. Abramov
{"title":"Measurement of Parameters and Automatic Selection of Optimal Modes During Ultrasonic Welding of Thermoplastic Materials","authors":"V. Khmelev, A. N. Slivin, R. Barsukov, S. N. Tsyganok, I. I. Savin, A. Shalunov, S. V. Levin, A. D. Abramov","doi":"10.1109/SIBEDM.2006.231656","DOIUrl":"https://doi.org/10.1109/SIBEDM.2006.231656","url":null,"abstract":"Article is devoted to research of changes of electric parameters of ultrasonic oscillatory systems (UOS) during ultrasonic welding of thermoplastic materials. In this article the basic problems interfering development of systems of automatic definition of quality of ultrasonic welding are analyzed. The technique performance researches which are directed on improvement of quality of welded connection at ultrasonic welding of thermoplastic materials, is described","PeriodicalId":151587,"journal":{"name":"International Workshops and Tutorials on Electron Devices and Materials","volume":"36 1","pages":"0"},"PeriodicalIF":0.0,"publicationDate":"2006-07-01","publicationTypes":"Journal Article","fieldsOfStudy":null,"isOpenAccess":false,"openAccessPdf":"","citationCount":null,"resultStr":null,"platform":"Semanticscholar","paperid":"131065670","PeriodicalName":null,"FirstCategoryId":null,"ListUrlMain":null,"RegionNum":0,"RegionCategory":"","ArticlePicture":[],"TitleCN":null,"AbstractTextCN":null,"PMCID":"","EPubDate":null,"PubModel":null,"JCR":null,"JCRName":null,"Score":null,"Total":0}
引用次数: 4
0
×
引用
GB/T 7714-2015
复制
MLA
复制
APA
复制
导出至
BibTeX EndNote RefMan NoteFirst NoteExpress
×
提示
您的信息不完整,为了账户安全,请先补充。
现在去补充
×
提示
您因"违规操作"
具体请查看互助需知
我知道了
×
提示
确定
请完成安全验证×
相关产品
×
本文献相关产品
联系我们:info@booksci.cn Book学术提供免费学术资源搜索服务,方便国内外学者检索中英文文献。致力于提供最便捷和优质的服务体验。 Copyright © 2023 布克学术 All rights reserved.
京ICP备2023020795号-1
ghs 京公网安备 11010802042870号
Book学术文献互助
Book学术文献互助群
群 号:481959085
Book学术官方微信